Technology and applications of ion beams: conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK
Gespeichert in:
| Weitere Verfasser: | |
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| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Oxford u.a.
Pergamon Press
1993
|
| Schriftenreihe: | Vacuum
44,3/4 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben. - Einzelaufnahme eines Zs.-Bandes |
| Beschreibung: | S. 165 - 416 Ill., graph. Darst. |
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| 245 | 1 | 0 | |a Technology and applications of ion beams |b conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK |c guest eds.: Roger Smith ... |
| 264 | 1 | |a Oxford u.a. |b Pergamon Press |c 1993 | |
| 300 | |a S. 165 - 416 |b Ill., graph. Darst. | ||
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Datensatz im Suchindex
| _version_ | 1804123261039017984 |
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| adam_text | VACUUM
SURFACE ENGINEERING, SURFACE INSTRUMENTATION
&
VACUUM TECHNOLOGY
Volume 44/numbers 3/4/IVIarch/April
1993
Contents
TECHNOLOGY AND APPLICATIONS OF ION BEAMS
Conference of The Atomic Collisions in Solids Group
of The Institute of Physics
7-10
April
1992,
Loughborough University of Technology, UK
AUTHORS
A Webb
ARTICLES
165
Introduction
J S
С МсКее
and M S Mathur
D Panknin, E
Wieser,
К
Wollschläger,
R
Grötzschel and
W Skorupa
MBH
Bréese,
G W Grime and F
Watt
F
E
Cecil,
H
Liu and
J
S Yan
W
К
Schulte,
H
Ebbing,
H
W
Becker,
M Berheide, M
Buschmann, C
Angulo,
C Rolfs, G
Amsel,
I Trimaille,
G
Battistig,
G E
Mitchell
and
J S
Schweitzer
R P Howson, H A Ja fer and A G
Spencer
A M
Barklund,
S
Berg,
I V Katardjiev,
C Nender and P
Carlsson
J Ishikawa, H Tsuji, Y Okada, M Shinoda
and Y Gotoh
I Neshev, R G Vichev, S Tzanev and
S S Todorov
A M Ektessabi, S Sato, H Kitamura
and Y Masaki
J K Y
Wong,
J
A Miner,
A B Danilin,
I V Charniy and L A Charniy
A Chew
and D E Sykes
G
W
Hall,
R P Howson
and A Chew
R
van Roijen
and C
W
T
Bulle-Lieuwma
V J
Uw.
G A C
Jones,
D
A Ritchie
and M
Tewordt
R
В
Jackman
167
Laboratory based space experiments using an ion
implanter
171
Investigation of ¡on beam synthesized FeSband the
α->(3-
phase transformation
175
Advances of nuclear microscopy in microelectronics analysis
181
Recent measurements of nuclear reaction cross-sections with
ion beams at very low energies
185
High resolution depth profiling in near-surface regions of
solids by narrow nuclear reaction resonances below
0.5
MeV
with low energy spread proton beams
191
Reactive ion-plating at low ion energies with an unbalanced
magnetron
197
Ion-assisted selective deposition of aluminium for via-hole
interconnections
203
Radio frequency plasma sputter type heavy negative ion
source
209
Sputtering of NiTi alloys: a comparison of experiment and
simulation
213
Simulation of ion beam assisted deposition—a comparison
with experimental results
219
The anomalous depth distribution of low dose oxygen and
nitrogen ions implanted into silicon
223
SIMS analysis using molecular ions for the study of boron
precipitation in silicon
227
Reactive unbalanced magnetron sputtering of hydrogenated
amorphous silicon and silicon oxide
231
Damage caused by Cl2 based dry etching of Ill-V materials
233
Chloromethane-based reactive ion etching of Ill-V semi¬
conductor materials
239
Ion beam-assisted etching of semiconductors: surface
chemistry vs surface physics
DAO Hop·,
G J Monnington, S S
Gill,
245
N
Borsing,
J
A Smith
and J
A
Rees
D
Marthall
and R B Jackman
249
J
Beekman
and R B Jackman
257
H F Sahafi, G F Goldsplnk, A
P
Webb
263
and M A Carter
P D
Townsend
267
P
Hoffmann and F
Heinrich 271
F
Heinrich
and P
Hoffmann
275
M
J
Rodman,
P J
Chandler, L Zhang,
281
J H Sharp, P D Townsend and
AI Ferguson
C J Sofield, S Sugden, J
Ing,
L B Bridwell and Y Q
Wang
A Kolitsch, E Hentschel and
291
E
Richter
R A
Swady,
H A Ja
fer
and
297
R P Howson
G Carter,
M J Nobes and I V Katardjiev
303
R Smith, D J
O Connor and
311
EI von-Nagy Felsobuki
M Jaraiz, J
Arias,
L
A Bailón
and
321
J J
Barbolla
I R Chakarov and R P
Webb
325
R Badheka, J A
Van den Berg,
D G
Armour
331
and
M
Wadsworth
M M
Jakaś
337
H
Bergsaker, F
Lama, R
Smith and
341
R
Webb
P D
Prewett
345
R J
Young
353
J
Ishikawa,
Y Gotoh,
N
Fukayama,
357
Y
Ogata, K
Yoshida and H Tsuji
В
Khamsehpour and
S T Davies
361
A Markwřtz,
H
Baumann,
E
F Krimmel,
367
M
Rose,
К
Bethge,
P Misaelides and
S Logothetidis
G
Angel and Weilin Tu 371
Montaż
Ali
and R Smith
377
H A Ja fer and R P Howson 38i
Ion energy distributions
¡n
S¡CI4
and
Ar
/Ог
dry etching
discharges
Novel precursors for chemically assisted ion beam etching:
reactions of dichloroethane on GaAsClOO)
Chemical etching of GaAs with a novel low energy ion beam
source: a low damage process for device fabrication
Effect of flow rate on reactive ion etching of GaAs in
СН,/Н2
plasma
Waveguide lasers in insulators using ion implantation
Fragmentational collisions in reactive ion beam processing
Analysis and control of ion beam processing by optical
spectroscopy
Waveguide properties of He -implanted chromium doped
laser materials
285
Ion beam modification of polymers
Wear reduction by ion implantation-assisted deposition
The reactive sputtering of thin films of TiN at low target
voltages
The theory of ion beam polishing and machining
Trapping mechanisms in scattering of beams at grazing
incidence from crystals
Detailed computer simulation of damage accumulation in
ion irradiated crystalline targets
The effect of beam divergence on single crystal implant
profiles
Theoretical calculations of the broadening of dilute
Si, Al
and
Be doped
б
layers in GaAs during SIMS depth profiling
Computer simulation of growth during molecular-beam
epitaxy of metal-on-metal surfaces
A comparison of TRIM and molecular dynamics in
calculating the backscattering yield of carbon incident on
graphite
Focused ¡on beams
—
microfabrication methods and
applications (Invited)
Micro-machining using a focused ion beam
Profiles of ion beams extracted from impregnated-electrode-
type liquid-metal ¡on source with linear array emission
points
Drilling of fine apertures in thin metallic foils using a focused
ion beam
Nitrogen profiles of thin sputtered PVD silicon nitride films
Monitoring implant induced gate oxide stress potentials
The structure of small clusters ejected by ion bombardment
of solids
A low-voltage, high-current, ion-bombardment source using
magnetron principles
A S
Way
385
Quartz resonator techniques for simultaneous measurement
of
areal
mass density, lateral stress, and temperature in thin
films
A E
Waddilove, A Chew and
D
E Sykes
389
The effect of oxygen flooding on the secondary ion yields of
matrix and impurity species in InP and InGaAs
VACUUM NEWS
397
VACUUM DIARY
413
SOFTWARE SURVEY SECTION
і
AUTHOR INDEX
v
ISSN 0042-207X
VACUAV
44(3/4) 165-416 (1993)
Published by
PERGAMON PRESS
|
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| spelling | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK guest eds.: Roger Smith ... Oxford u.a. Pergamon Press 1993 S. 165 - 416 Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Vacuum 44,3/4 Literaturangaben. - Einzelaufnahme eines Zs.-Bandes Ionenstrahl (DE-588)4162347-2 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1992 Loughborough gnd-content Ionenstrahl (DE-588)4162347-2 s DE-604 Smith, Roger 1947- (DE-588)136841708 edt Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005890387&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK Ionenstrahl (DE-588)4162347-2 gnd |
| subject_GND | (DE-588)4162347-2 (DE-588)1071861417 |
| title | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK |
| title_auth | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK |
| title_exact_search | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK |
| title_full | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK guest eds.: Roger Smith ... |
| title_fullStr | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK guest eds.: Roger Smith ... |
| title_full_unstemmed | Technology and applications of ion beams conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK guest eds.: Roger Smith ... |
| title_short | Technology and applications of ion beams |
| title_sort | technology and applications of ion beams conference of the atomic collisions in solids group of the institute of physics 7 10 april 1992 loughborough university of technology uk |
| title_sub | conference of the Atomic Collisions in Solids Group of the Institute of Physics ; 7 - 10 April 1992, Loughborough University of Technology, UK |
| topic | Ionenstrahl (DE-588)4162347-2 gnd |
| topic_facet | Ionenstrahl Konferenzschrift 1992 Loughborough |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005890387&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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