10th Annual Symposium on Microlithography: September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California
Saved in:
| Corporate Author: | |
|---|---|
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
1991
|
| Series: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
1496 |
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Item Description: | Literaturangaben |
| Physical Description: | V, 315 S. Ill., graph. Darst. |
| ISBN: | 0819406058 |
Staff View
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Record in the Search Index
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|---|---|
| adam_text | TENTH ANNUAL SYMPOSIUM ON MICROLITHOGRAPHY
Volume
1496
CONTENTS
Conference Committee
..................................................................
v
SESSION
1
KEYNOTE
1496-01
Competitiveness
C. E. Minihan, Etec Systems,
Inc
......................................................... 2
SESSION
2
PHASE-SHIFT MASKS
1496-02
What IS a phase-shifting mask?
M. D. Levenson, Phase
&
Amplitude, Consultants
.......................................... 20
1496-12
Chrome less phase-shifted masks: a new approach to phase-shifting masks
K. K. Toh, G. T.
Dao,
R.
Singh,
H.
Gaw, Intel Corp
........................................27
1496-13
Phase-shifting and other challenges in optical mask technology
B. J. Lin, IBM Corp
...................................................................54
1496-14
Modeling phase-shifting masks
A. R. Neureuther, Univ. of California/Berkeley
............................................80
SESSION
3
E-BEAM/LASER LITHOGRAPHY
1496-22
Hitachi
е
-beam lithography tools for advanced applications
W. V. Colbran, Nissei Sangyo America
...................................................90
1496-03
Photomask fabrication utilizing a Philips/Cambridge vector scan
е
-beam system
B. C. McCutchen,
Western Digital Corp
..................................................97
1496-10
EBES4: mask/reticle writer for the 90 s
G. C. Chen,
Lepton, Inc...............................................................
107
1496-04
Е
-beam data compaction method for large-capacity mask ROM production
T. Kanemara, T. Nakajima, T. Igarashi, R. Masuda,
N.
Orita, NEC Corp. (Japan)
...............118
1496-05
Performance appraisal of the ATEQCORE^SOO in production
M. L. Mechtenberg, L. J. Watson, DuPont Photomasks,
Inc
................................. 124
1496-
11 Metamorphosis of laser writer
M. A. Wilson, Align-Rite Ltd. (UK)
.................................................... 156
1496-06
Proximity effect correction on MEBES for
lx
mask fabrication:
lithography issues and tradeoffs at
0.25
micron
A. Muray, R. L. Dean, Etec Systems,
Inc
................................................. 171
1496-07
5X reticle fabrication using MEBES multiphase virtual address and AZ5206 resist
K. S. Milner, P. S.
Chipman,
DuPont Photomasks,
Inc
...................................... 180
SESSION
4
METROLOGY
1496-15
Capability assessment and comparison of the Nikon 2i, Nikon
Зі,
and IMS-2000
registration measurement devices
R. K. Henderson, DuPont Photomasks,
Inc
............................................... 198
1496-16
Improving submkron CD measurements through optimum operating points
M. V .
Dusa,
SEEQTechnology. Inc.; K. Roth,
С
Jung, Leica Mikroskopie und
Systeme GmbH (FRG)................................................................217
(continued)
SPIE Vol. 1496 Wth
Annual Symposium on
Microhthography 11990) /
iii
TENTH ANNUAL SYMPOSIUM ON MICROLITHOGRAPHY
Volume
1496
1496-17
Application of a reduced area electrical test pattern to precise pattern
registration measurements
J. P. Rominger,
Ultratech
Stepper Corp
..................................................224
SESSION
5
ADVANCED MASK TECHNOLOGY
1496-09
Sophisticated masks
R. F. Pease, Stanford Univ.; G. Owen, Hewlett-Packard Co.; R. Browning, R. L. Hsieh, Y. Lee,
N.
I. Maluf,
С
N.
Berglund,
Stanford Univ
...............................................234
1496-08
Continuous flow manufacturing
G. H. Bowers, Jr., IBM Corp
...........................................................239
1496-18
Issues in the repair of x-ray masks
D. K. Stewart, J. A. Doherty, Micrion Corp
..............................................247
1496-19
Evaluation of a high-resolution negative-acting electron-beam resist GMC for
photomask manufacturing
W. Chen,
Du
Pont Photomasks, Inc.; A. E.
Novembre,
AT&T Bell Labs
......................266
1496-20
Improvements in sensitivity and discrimination capability of the PD reticle/mask
inspection system
J.
Saito,
Y.
Saijo, Horiba Ltd. Oapan)
....................................................284
1496-21
Pellicliiing technology
T. Yamauchi, Dai Nippon Printing Co., Ltd. (Japan)
.......................................302
Author Index
.......................................................................315
VBVol.
1496 1
0th Annual Symposium on MicroiithographyfJ
990)
|
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| genre | (DE-588)1071861417 Konferenzschrift 1990 Sunnyvale Calif. gnd-content |
| genre_facet | Konferenzschrift 1990 Sunnyvale Calif. |
| id | DE-604.BV008282678 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:17:43Z |
| institution | BVB |
| institution_GND | (DE-588)5051666-8 |
| isbn | 0819406058 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-005472742 |
| oclc_num | 507136390 |
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| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | V, 315 S. Ill., graph. Darst. |
| publishDate | 1991 |
| publishDateSearch | 1991 |
| publishDateSort | 1991 |
| publisher | SPIE |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Symposium on Microlithography 10 1990 Sunnyvale, Calif. Verfasser (DE-588)5051666-8 aut 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California Tenth Annual Symposium on Microlithography Bellingham, Wash. SPIE 1991 V, 315 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1496 Literaturangaben Microlithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1990 Sunnyvale Calif. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1496 (DE-604)BV000010887 1496 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005472742&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Microlithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)1071861417 |
| title | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_alt | Tenth Annual Symposium on Microlithography |
| title_auth | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_exact_search | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_full | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_fullStr | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_full_unstemmed | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_short | 10th Annual Symposium on Microlithography |
| title_sort | 10th annual symposium on microlithography september 26 27 1990 sunnyvale hilton sunnyvale california |
| title_sub | September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| topic | Microlithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Microlithography Congresses Fotolithografie Halbleitertechnologie Konferenzschrift 1990 Sunnyvale Calif. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005472742&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV000010887 |
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