10th Annual Symposium on Microlithography: September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1991
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
1496 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | V, 315 S. Ill., graph. Darst. |
| ISBN: | 0819406058 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV008282678 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 931020s1991 ad|| |||| 10||| engod | ||
| 020 | |a 0819406058 |9 0-8194-0605-8 | ||
| 035 | |a (OCoLC)507136390 | ||
| 035 | |a (DE-599)BVBBV008282678 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-83 | ||
| 050 | 0 | |a TR940 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 084 | |a ELT 285f |2 stub | ||
| 111 | 2 | |a Symposium on Microlithography |n 10 |d 1990 |c Sunnyvale, Calif. |j Verfasser |0 (DE-588)5051666-8 |4 aut | |
| 245 | 1 | 0 | |a 10th Annual Symposium on Microlithography |b September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| 246 | 1 | 3 | |a Tenth Annual Symposium on Microlithography |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1991 | |
| 300 | |a V, 315 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 1496 | |
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Microlithography |v Congresses | |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1990 |z Sunnyvale Calif. |2 gnd-content | |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 830 | 0 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 1496 |w (DE-604)BV000010887 |9 1496 | |
| 856 | 4 | 2 | |m Digitalisierung TU Muenchen |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005472742&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-005472742 | ||
Datensatz im Suchindex
| _version_ | 1804122680274714624 |
|---|---|
| adam_text | TENTH ANNUAL SYMPOSIUM ON MICROLITHOGRAPHY
Volume
1496
CONTENTS
Conference Committee
..................................................................
v
SESSION
1
KEYNOTE
1496-01
Competitiveness
C. E. Minihan, Etec Systems,
Inc
......................................................... 2
SESSION
2
PHASE-SHIFT MASKS
1496-02
What IS a phase-shifting mask?
M. D. Levenson, Phase
&
Amplitude, Consultants
.......................................... 20
1496-12
Chrome less phase-shifted masks: a new approach to phase-shifting masks
K. K. Toh, G. T.
Dao,
R.
Singh,
H.
Gaw, Intel Corp
........................................27
1496-13
Phase-shifting and other challenges in optical mask technology
B. J. Lin, IBM Corp
...................................................................54
1496-14
Modeling phase-shifting masks
A. R. Neureuther, Univ. of California/Berkeley
............................................80
SESSION
3
E-BEAM/LASER LITHOGRAPHY
1496-22
Hitachi
е
-beam lithography tools for advanced applications
W. V. Colbran, Nissei Sangyo America
...................................................90
1496-03
Photomask fabrication utilizing a Philips/Cambridge vector scan
е
-beam system
B. C. McCutchen,
Western Digital Corp
..................................................97
1496-10
EBES4: mask/reticle writer for the 90 s
G. C. Chen,
Lepton, Inc...............................................................
107
1496-04
Е
-beam data compaction method for large-capacity mask ROM production
T. Kanemara, T. Nakajima, T. Igarashi, R. Masuda,
N.
Orita, NEC Corp. (Japan)
...............118
1496-05
Performance appraisal of the ATEQCORE^SOO in production
M. L. Mechtenberg, L. J. Watson, DuPont Photomasks,
Inc
................................. 124
1496-
11 Metamorphosis of laser writer
M. A. Wilson, Align-Rite Ltd. (UK)
.................................................... 156
1496-06
Proximity effect correction on MEBES for
lx
mask fabrication:
lithography issues and tradeoffs at
0.25
micron
A. Muray, R. L. Dean, Etec Systems,
Inc
................................................. 171
1496-07
5X reticle fabrication using MEBES multiphase virtual address and AZ5206 resist
K. S. Milner, P. S.
Chipman,
DuPont Photomasks,
Inc
...................................... 180
SESSION
4
METROLOGY
1496-15
Capability assessment and comparison of the Nikon 2i, Nikon
Зі,
and IMS-2000
registration measurement devices
R. K. Henderson, DuPont Photomasks,
Inc
............................................... 198
1496-16
Improving submkron CD measurements through optimum operating points
M. V .
Dusa,
SEEQTechnology. Inc.; K. Roth,
С
Jung, Leica Mikroskopie und
Systeme GmbH (FRG)................................................................217
(continued)
SPIE Vol. 1496 Wth
Annual Symposium on
Microhthography 11990) /
iii
TENTH ANNUAL SYMPOSIUM ON MICROLITHOGRAPHY
Volume
1496
1496-17
Application of a reduced area electrical test pattern to precise pattern
registration measurements
J. P. Rominger,
Ultratech
Stepper Corp
..................................................224
SESSION
5
ADVANCED MASK TECHNOLOGY
1496-09
Sophisticated masks
R. F. Pease, Stanford Univ.; G. Owen, Hewlett-Packard Co.; R. Browning, R. L. Hsieh, Y. Lee,
N.
I. Maluf,
С
N.
Berglund,
Stanford Univ
...............................................234
1496-08
Continuous flow manufacturing
G. H. Bowers, Jr., IBM Corp
...........................................................239
1496-18
Issues in the repair of x-ray masks
D. K. Stewart, J. A. Doherty, Micrion Corp
..............................................247
1496-19
Evaluation of a high-resolution negative-acting electron-beam resist GMC for
photomask manufacturing
W. Chen,
Du
Pont Photomasks, Inc.; A. E.
Novembre,
AT&T Bell Labs
......................266
1496-20
Improvements in sensitivity and discrimination capability of the PD reticle/mask
inspection system
J.
Saito,
Y.
Saijo, Horiba Ltd. Oapan)
....................................................284
1496-21
Pellicliiing technology
T. Yamauchi, Dai Nippon Printing Co., Ltd. (Japan)
.......................................302
Author Index
.......................................................................315
VBVol.
1496 1
0th Annual Symposium on MicroiithographyfJ
990)
|
| any_adam_object | 1 |
| author_corporate | Symposium on Microlithography Sunnyvale, Calif |
| author_corporate_role | aut |
| author_facet | Symposium on Microlithography Sunnyvale, Calif |
| author_sort | Symposium on Microlithography Sunnyvale, Calif |
| building | Verbundindex |
| bvnumber | BV008282678 |
| callnumber-first | T - Technology |
| callnumber-label | TR940 |
| callnumber-raw | TR940 |
| callnumber-search | TR940 |
| callnumber-sort | TR 3940 |
| callnumber-subject | TR - Photography |
| classification_rvk | ZN 4170 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)507136390 (DE-599)BVBBV008282678 |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Conference Proceeding Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01819nam a2200409 cb4500</leader><controlfield tag="001">BV008282678</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">931020s1991 ad|| |||| 10||| engod</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0819406058</subfield><subfield code="9">0-8194-0605-8</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)507136390</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV008282678</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TR940</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="111" ind1="2" ind2=" "><subfield code="a">Symposium on Microlithography</subfield><subfield code="n">10</subfield><subfield code="d">1990</subfield><subfield code="c">Sunnyvale, Calif.</subfield><subfield code="j">Verfasser</subfield><subfield code="0">(DE-588)5051666-8</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">10th Annual Symposium on Microlithography</subfield><subfield code="b">September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Tenth Annual Symposium on Microlithography</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">1991</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">V, 315 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE</subfield><subfield code="v">1496</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1990</subfield><subfield code="z">Sunnyvale Calif.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE</subfield><subfield code="v">1496</subfield><subfield code="w">(DE-604)BV000010887</subfield><subfield code="9">1496</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Digitalisierung TU Muenchen</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005472742&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-005472742</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1990 Sunnyvale Calif. gnd-content |
| genre_facet | Konferenzschrift 1990 Sunnyvale Calif. |
| id | DE-604.BV008282678 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:17:43Z |
| institution | BVB |
| institution_GND | (DE-588)5051666-8 |
| isbn | 0819406058 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-005472742 |
| oclc_num | 507136390 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | V, 315 S. Ill., graph. Darst. |
| publishDate | 1991 |
| publishDateSearch | 1991 |
| publishDateSort | 1991 |
| publisher | SPIE |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Symposium on Microlithography 10 1990 Sunnyvale, Calif. Verfasser (DE-588)5051666-8 aut 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California Tenth Annual Symposium on Microlithography Bellingham, Wash. SPIE 1991 V, 315 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1496 Literaturangaben Microlithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1990 Sunnyvale Calif. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1496 (DE-604)BV000010887 1496 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005472742&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Microlithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)1071861417 |
| title | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_alt | Tenth Annual Symposium on Microlithography |
| title_auth | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_exact_search | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_full | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_fullStr | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_full_unstemmed | 10th Annual Symposium on Microlithography September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| title_short | 10th Annual Symposium on Microlithography |
| title_sort | 10th annual symposium on microlithography september 26 27 1990 sunnyvale hilton sunnyvale california |
| title_sub | September 26 - 27, 1990, Sunnyvale Hilton, Sunnyvale, California |
| topic | Microlithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Microlithography Congresses Fotolithografie Halbleitertechnologie Konferenzschrift 1990 Sunnyvale Calif. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005472742&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV000010887 |
| work_keys_str_mv | AT symposiumonmicrolithographysunnyvalecalif 10thannualsymposiumonmicrolithographyseptember26271990sunnyvalehiltonsunnyvalecalifornia AT symposiumonmicrolithographysunnyvalecalif tenthannualsymposiumonmicrolithography |