Resists in microlithography and printing:
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Buch |
| Sprache: | English Czech |
| Veröffentlicht: |
Amsterdam u.a.
Elsevier
1993
|
| Ausgabe: | 2., rev. ed. |
| Schriftenreihe: | Materials science monographs
76 |
| Schlagworte: | |
| Beschreibung: | Aus dem Tschech. übers. - Literaturangaben |
| Beschreibung: | 376 S. Ill., graph. Darst. |
| ISBN: | 0444988467 |
Internformat
MARC
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| 100 | 1 | |a Bednář, Bohumil |e Verfasser |4 aut | |
| 240 | 1 | 0 | |a Litografické techniky |
| 245 | 1 | 0 | |a Resists in microlithography and printing |c Bohumil Bednář, Jaroslav Králíček and Jaromír Zachoval |
| 250 | |a 2., rev. ed. | ||
| 264 | 1 | |a Amsterdam u.a. |b Elsevier |c 1993 | |
| 300 | |a 376 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Materials science monographs |v 76 | |
| 500 | |a Aus dem Tschech. übers. - Literaturangaben | ||
| 650 | 7 | |a Circuits intégrés à grande échelle - Conception et construction |2 ram | |
| 650 | 7 | |a Circuits intégrés à très grande échelle - Conception et construction |2 ram | |
| 650 | 7 | |a Lithographie par faisceau d'électrons |2 ram | |
| 650 | 7 | |a Lithographie par faisceaux d'ions |2 ram | |
| 650 | 7 | |a Lithographie par rayons X |2 ram | |
| 650 | 7 | |a Microlithographie |2 ram | |
| 650 | 7 | |a Semiconducteurs - Conception et construction |2 ram | |
| 650 | 4 | |a Integrated circuits |x Very large scale integration |x Design and construction | |
| 650 | 4 | |a Lithography, Electron beam | |
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Semiconductors |x Design and construction | |
| 650 | 4 | |a X-ray lithography | |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Photoresist |0 (DE-588)4174545-0 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | 1 | |a Photoresist |0 (DE-588)4174545-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Králíček, Jaroslav |e Verfasser |4 aut | |
| 700 | 1 | |a Zachoval, Jaromír |e Verfasser |4 aut | |
| 830 | 0 | |a Materials science monographs |v 76 |w (DE-604)BV000008462 |9 76 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-005464916 | ||
Datensatz im Suchindex
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|---|---|
| any_adam_object | |
| author | Bednář, Bohumil Králíček, Jaroslav Zachoval, Jaromír |
| author_facet | Bednář, Bohumil Králíček, Jaroslav Zachoval, Jaromír |
| author_role | aut aut aut |
| author_sort | Bednář, Bohumil |
| author_variant | b b bb j k jk j z jz |
| building | Verbundindex |
| bvnumber | BV008272573 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4140 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)25552506 (DE-599)BVBBV008272573 |
| dewey-full | 621.381/52 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/52 |
| dewey-search | 621.381/52 |
| dewey-sort | 3621.381 252 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | 2., rev. ed. |
| format | Book |
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| id | DE-604.BV008272573 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:17:32Z |
| institution | BVB |
| isbn | 0444988467 |
| language | English Czech |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-005464916 |
| oclc_num | 25552506 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | 376 S. Ill., graph. Darst. |
| publishDate | 1993 |
| publishDateSearch | 1993 |
| publishDateSort | 1993 |
| publisher | Elsevier |
| record_format | marc |
| series | Materials science monographs |
| series2 | Materials science monographs |
| spelling | Bednář, Bohumil Verfasser aut Litografické techniky Resists in microlithography and printing Bohumil Bednář, Jaroslav Králíček and Jaromír Zachoval 2., rev. ed. Amsterdam u.a. Elsevier 1993 376 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science monographs 76 Aus dem Tschech. übers. - Literaturangaben Circuits intégrés à grande échelle - Conception et construction ram Circuits intégrés à très grande échelle - Conception et construction ram Lithographie par faisceau d'électrons ram Lithographie par faisceaux d'ions ram Lithographie par rayons X ram Microlithographie ram Semiconducteurs - Conception et construction ram Integrated circuits Very large scale integration Design and construction Lithography, Electron beam Microlithography Semiconductors Design and construction X-ray lithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Photoresist (DE-588)4174545-0 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Photoresist (DE-588)4174545-0 s DE-604 Králíček, Jaroslav Verfasser aut Zachoval, Jaromír Verfasser aut Materials science monographs 76 (DE-604)BV000008462 76 |
| spellingShingle | Bednář, Bohumil Králíček, Jaroslav Zachoval, Jaromír Resists in microlithography and printing Materials science monographs Circuits intégrés à grande échelle - Conception et construction ram Circuits intégrés à très grande échelle - Conception et construction ram Lithographie par faisceau d'électrons ram Lithographie par faisceaux d'ions ram Lithographie par rayons X ram Microlithographie ram Semiconducteurs - Conception et construction ram Integrated circuits Very large scale integration Design and construction Lithography, Electron beam Microlithography Semiconductors Design and construction X-ray lithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Photoresist (DE-588)4174545-0 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)4174545-0 |
| title | Resists in microlithography and printing |
| title_alt | Litografické techniky |
| title_auth | Resists in microlithography and printing |
| title_exact_search | Resists in microlithography and printing |
| title_full | Resists in microlithography and printing Bohumil Bednář, Jaroslav Králíček and Jaromír Zachoval |
| title_fullStr | Resists in microlithography and printing Bohumil Bednář, Jaroslav Králíček and Jaromír Zachoval |
| title_full_unstemmed | Resists in microlithography and printing Bohumil Bednář, Jaroslav Králíček and Jaromír Zachoval |
| title_short | Resists in microlithography and printing |
| title_sort | resists in microlithography and printing |
| topic | Circuits intégrés à grande échelle - Conception et construction ram Circuits intégrés à très grande échelle - Conception et construction ram Lithographie par faisceau d'électrons ram Lithographie par faisceaux d'ions ram Lithographie par rayons X ram Microlithographie ram Semiconducteurs - Conception et construction ram Integrated circuits Very large scale integration Design and construction Lithography, Electron beam Microlithography Semiconductors Design and construction X-ray lithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Photoresist (DE-588)4174545-0 gnd |
| topic_facet | Circuits intégrés à grande échelle - Conception et construction Circuits intégrés à très grande échelle - Conception et construction Lithographie par faisceau d'électrons Lithographie par faisceaux d'ions Lithographie par rayons X Microlithographie Semiconducteurs - Conception et construction Integrated circuits Very large scale integration Design and construction Lithography, Electron beam Microlithography Semiconductors Design and construction X-ray lithography Fotolithografie Halbleitertechnologie Photoresist |
| volume_link | (DE-604)BV000008462 |
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