Rapid thermal and integrated processing: 10 - 11 September 1991, San Jose, California
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
1992
|
| Series: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
1595 |
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Item Description: | Literaturangaben |
| Physical Description: | IX, 207 S. Ill., graph. Darst. |
| ISBN: | 0819407267 |
Staff View
MARC
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| 245 | 1 | 0 | |a Rapid thermal and integrated processing |b 10 - 11 September 1991, San Jose, California |c Mehrdad M. Moslehi ... chairs/eds. |
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| 650 | 4 | |a Semiconductors |x Heat treatment |v Congresses | |
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Record in the Search Index
| _version_ | 1804122666071752704 |
|---|---|
| adam_text | RAPID
THERMAL
AND INTEGRATED PROCESSING
Volume
1595
CONTENTS
vii
Introduction
ix
Conference Committee
SESSION
1
EQUIPMENT DESIGN, PROCESS CONTROL, AND
TEMPERATÜRE
MEASUREMENT
2
Modeling and control of rapid thermal processing (Invited Paper)
[1595-01]
C. D.
Schaper,
Y. M.
Cho, P. Park, S. A. Norman, P. Gyugyi, G. Hoffmann, S. Balemi,
S. P. Boyd, G. Franklin, T. Kailath,
К. С
Saraswat, Stanford Univ.
18
Review of rapid thermal processing: system design and applications (Invited Paper)
[1595-02]
X. Xu, J. J. Wortraan,
M. C
Ozturk,
F. Y.
Sorrell, North Carolina State Univ.
35
Influence of pyrometer signal absorption due to process gas on temperature control
in rapid thermal processing
[1595-03]
J. C. Chang, T. Nguyen,
J. S. Nakos,
J. W. Korejwa, IBM/General Technology
Div.
39
Application of modern quality improvement techniques to rapid thermal processing
[1595-04]
J. C
Davis, R.
S. Gyurcsik, J. C. Lu,
R. H.
Perkins, North Carolina State Univ.
52
Wafer emissivity correction using dual-color pyrometry
[1595-05]
D.
Mordo,
Y.
Wasserman,
A. Gat,
AG Associates.
61
Improved
wafer temperature
measurements
[1595-06]
D. W. Voorhes, D. M. Hall, OPTRA,
Inc.
65
Applications
of
surface charge
analyzer for use in process control and in-line
characterization of reoxidized nitrided oxide
(ONO)
films
[1595-07]
J. S. Cable, C. Kantamneni, TRW, Inc.; I. Bencuya,
Semitest
Inc.
73
Uniformity characterization of rapid thermal processor thin films
[1595-08]
С. В.
Yarling, Ion Implant Services;
D. M.
Cook, Prometrix Corp.
(continued)
SPIE
Vol.
1595
Rapid Thermal and Integrated Processing
Ц991І
/№
RAPID
THERMAL
AND INTEGRATED PROCESSING
Volume
1595
SESSION
2
CHEMICAL VAPOR DEPOSITION
78
Epitaxial growth and processing of S^Gex/Si for heterojunction bipolar transistors
using rapid thermal techniques (Invited Paper)
[1595-11]
J. L. Hoyt, T. Ghani, D. B. Noble, J. F. Gibbons, Stanford Univ.
90
Optical properties of Si^Ge, quantum wells and superlattices grown by rapid thermal
chemical vapor deposition (Invited Paper)
[1595-12]
J. C. Sturm, X. Xiao, H. Manoharan, P. V. Schwartz, Princeton Univ.
99
Control of polysilicon emitter interface using RTCVD
[1595-14]
A. Kermani, RAPRO Technology Inc.; B. Jalali, AT&T Bell Labs.
SESSION
3
ION IMPLANTATION
108
Rapid thermal annealing of ion-implanted InP, InGaAs, and InSb (Invited Paper)
[1595-15]
M. V. Rao, George Mason Univ.
120
Damage and
RTA
kinetics in Ar+ and Si* ion-implanted CZ silicon characterized
by thermal wave modulated optical reflectance
[1595-16]
S.
Hahn,
Stanford Univ.; W. L. Smith, Therma-Wave, Inc.; T.
Hara,
H.
Hagiwara,
H.
Suzuki, Hosei Univ. (Japan); Y. Kwon, K. Kim, Y.
Вае,
W.
J. Chung, Research
Institute of Industrial Science and Technology (South Korea);
C. B.
Yarling, Ion Implant
Services; L. A. Larson, National Semiconductor Corp.; R.
Meinecke,
AG
Associates.
SESSION
4
PROCESS INTEGRATION AND NOVEL APPLICATIONS
132
RTP for advanced CMOS process integration (Invited Paper)
[1595-17]
M. M. Moslehi, J. Kuehne, L.
Velo, D.
Yin,
D. Yeakley, S. S.
Huang,
R- B.
Jucha,
T. Breedijk, Texas Instruments Inc.
146
Oxidation of hydrogen silsesquioxane, (HSiOjo)., by rapid thermal processing
(Invited Paper)
[1595-18]
T. E.
Gentle, Dow Corning Corp.
ISUS
ЯщМ
Thmmml rnnf
к,Г0џтШ Рњошѕшпд
(1991!
RAPID
THERMAL
AND INTEGRATED PROCESSING
Volume
1595
SESSION
5
DIELECTRICS
166
In-situ characterization of SiOj deposition and growth for gate-oxides (Invited Paper)
[1595-20]
M. Liehr, IBM/Thomas J. Watson Research Ctr.
177
Chemically
modifíed
ultrathin oxides fabricated by rapid thermal processing
(Invited Paper)
[1595-21]
A. B. Joshi, G. Q.
Lo,
J.
Ahn,
W.
C. Ting,
D.
Kwong, Univ. of Texas/Austin.
195
Development and characterization of an ultrathin rapid thermal silicon nitride for
1С
sensor applications
[1595-22]
R. A. Williams, Univ. of California/Berkeley; L. J. Arias, Jr., Peak Systems, Inc.;
D. W.
Hess, Lehigh Univ.
206
Addendum
207
Author Index
SPIE
Vol. 1S95 Rapid Thermal and Integrated Processing II
991) /
v
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| genre_facet | Konferenzschrift 1991 San Jose Calif. |
| id | DE-604.BV008270261 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:17:30Z |
| institution | BVB |
| isbn | 0819407267 |
| language | English |
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| physical | IX, 207 S. Ill., graph. Darst. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | SPIE |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California Mehrdad M. Moslehi ... chairs/eds. Bellingham, Wash. SPIE 1992 IX, 207 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1595 Literaturangaben Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1991 San Jose Calif. gnd-content Halbleitertechnologie (DE-588)4158814-9 s DE-604 Moslehi, Mehrdad M. Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1595 (DE-604)BV000010887 1595 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005463455&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie (DE-588)4158814-9 gnd |
| subject_GND | (DE-588)4158814-9 (DE-588)1071861417 |
| title | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California |
| title_auth | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California |
| title_exact_search | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California |
| title_full | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California Mehrdad M. Moslehi ... chairs/eds. |
| title_fullStr | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California Mehrdad M. Moslehi ... chairs/eds. |
| title_full_unstemmed | Rapid thermal and integrated processing 10 - 11 September 1991, San Jose, California Mehrdad M. Moslehi ... chairs/eds. |
| title_short | Rapid thermal and integrated processing |
| title_sort | rapid thermal and integrated processing 10 11 september 1991 san jose california |
| title_sub | 10 - 11 September 1991, San Jose, California |
| topic | Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie (DE-588)4158814-9 gnd |
| topic_facet | Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie Konferenzschrift 1991 San Jose Calif. |
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