Verfügbarkeit: Handbook of sputter deposition technology

Handbook of sputter deposition technology: principles, technology and applications

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Bibliographische Detailangaben
Hauptverfasser:	Wasa, Kiyotaka (VerfasserIn), Hayakawa, Shigeru (VerfasserIn)
Format:	Buch
Sprache:	English
Veröffentlicht:	Park Ridge Noyes Publ. 1992
Ausgabe:	Reprint ed.
Schriftenreihe:	Materials science and process technology series
Schlagworte:	Materiais e dispositivos semicondutores Cathode sputtering (Plating process) Thin films Beschichten Dünnschichttechnik Mikroelektronik Zerstäubung Kathode Dünne Schicht Sputtern
Beschreibung:	XII, 304 S. Ill., graph. Darst.
ISBN:	0815512805

Internformat

MARC


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Datensatz im Suchindex

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author	Wasa, Kiyotaka Hayakawa, Shigeru
author_facet	Wasa, Kiyotaka Hayakawa, Shigeru
author_role	aut aut
author_sort	Wasa, Kiyotaka
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bvnumber	BV008225371
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ctrlnum	(OCoLC)22953508 (DE-599)BVBBV008225371
dewey-full	621.3815/2
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	621 - Applied physics
dewey-raw	621.3815/2
dewey-search	621.3815/2
dewey-sort	3621.3815 12
dewey-tens	620 - Engineering and allied operations
discipline	Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik
edition	Reprint ed.
format	Book
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id	DE-604.BV008225371
illustrated	Illustrated
indexdate	2024-07-09T17:16:38Z
institution	BVB
isbn	0815512805
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-005428669
oclc_num	22953508
open_access_boolean
owner	DE-M347 DE-384 DE-92 DE-898 DE-BY-UBR DE-703 DE-83 DE-11 DE-188
owner_facet	DE-M347 DE-384 DE-92 DE-898 DE-BY-UBR DE-703 DE-83 DE-11 DE-188
physical	XII, 304 S. Ill., graph. Darst.
publishDate	1992
publishDateSearch	1992
publishDateSort	1992
publisher	Noyes Publ.
record_format	marc
series2	Materials science and process technology series
spelling	Wasa, Kiyotaka Verfasser aut Handbook of sputter deposition technology principles, technology and applications by Kiyotaka Wasa ; Shigeru Hayakawa Reprint ed. Park Ridge Noyes Publ. 1992 XII, 304 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series Materiais e dispositivos semicondutores larpcal Cathode sputtering (Plating process) Thin films Beschichten (DE-588)4005996-0 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Zerstäubung (DE-588)4067687-0 gnd rswk-swf Kathode (DE-588)4163451-2 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Sputtern (DE-588)4182614-0 s Dünnschichttechnik (DE-588)4136339-5 s DE-604 Beschichten (DE-588)4005996-0 s Zerstäubung (DE-588)4067687-0 s 1\p DE-604 Kathode (DE-588)4163451-2 s 2\p DE-604 Dünne Schicht (DE-588)4136925-7 s 3\p DE-604 Mikroelektronik (DE-588)4039207-7 s 4\p DE-604 Hayakawa, Shigeru Verfasser aut 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Wasa, Kiyotaka Hayakawa, Shigeru Handbook of sputter deposition technology principles, technology and applications Materiais e dispositivos semicondutores larpcal Cathode sputtering (Plating process) Thin films Beschichten (DE-588)4005996-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Mikroelektronik (DE-588)4039207-7 gnd Zerstäubung (DE-588)4067687-0 gnd Kathode (DE-588)4163451-2 gnd Dünne Schicht (DE-588)4136925-7 gnd Sputtern (DE-588)4182614-0 gnd
subject_GND	(DE-588)4005996-0 (DE-588)4136339-5 (DE-588)4039207-7 (DE-588)4067687-0 (DE-588)4163451-2 (DE-588)4136925-7 (DE-588)4182614-0
title	Handbook of sputter deposition technology principles, technology and applications
title_auth	Handbook of sputter deposition technology principles, technology and applications
title_exact_search	Handbook of sputter deposition technology principles, technology and applications
title_full	Handbook of sputter deposition technology principles, technology and applications by Kiyotaka Wasa ; Shigeru Hayakawa
title_fullStr	Handbook of sputter deposition technology principles, technology and applications by Kiyotaka Wasa ; Shigeru Hayakawa
title_full_unstemmed	Handbook of sputter deposition technology principles, technology and applications by Kiyotaka Wasa ; Shigeru Hayakawa
title_short	Handbook of sputter deposition technology
title_sort	handbook of sputter deposition technology principles technology and applications
title_sub	principles, technology and applications
topic	Materiais e dispositivos semicondutores larpcal Cathode sputtering (Plating process) Thin films Beschichten (DE-588)4005996-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Mikroelektronik (DE-588)4039207-7 gnd Zerstäubung (DE-588)4067687-0 gnd Kathode (DE-588)4163451-2 gnd Dünne Schicht (DE-588)4136925-7 gnd Sputtern (DE-588)4182614-0 gnd
topic_facet	Materiais e dispositivos semicondutores Cathode sputtering (Plating process) Thin films Beschichten Dünnschichttechnik Mikroelektronik Zerstäubung Kathode Dünne Schicht Sputtern
work_keys_str_mv	AT wasakiyotaka handbookofsputterdepositiontechnologyprinciplestechnologyandapplications AT hayakawashigeru handbookofsputterdepositiontechnologyprinciplestechnologyandapplications

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