Chemical vapor deposition: principles and applications
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
London u.a.
Academic Press u.a.
1993
|
Schlagworte: | |
Beschreibung: | V, 677 S. Ill., zahlr. graph. Darst. |
ISBN: | 0123496705 |
Internformat
MARC
LEADER | 00000nam a2200000 c 4500 | ||
---|---|---|---|
001 | BV008024080 | ||
003 | DE-604 | ||
005 | 20051201 | ||
007 | t | ||
008 | 930713s1993 ad|| |||| 00||| eng d | ||
020 | |a 0123496705 |9 0-12-349670-5 | ||
035 | |a (OCoLC)27995365 | ||
035 | |a (DE-599)BVBBV008024080 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
049 | |a DE-703 |a DE-355 |a DE-91G |a DE-29T |a DE-83 |a DE-11 | ||
050 | 0 | |a TS695 | |
082 | 0 | |a 620/.44 |2 20 | |
084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
084 | |a VN 7260 |0 (DE-625)147614:253 |2 rvk | ||
084 | |a FER 882f |2 stub | ||
245 | 1 | 0 | |a Chemical vapor deposition |b principles and applications |c ed. by Michael L. Hitchman ... |
264 | 1 | |a London u.a. |b Academic Press u.a. |c 1993 | |
300 | |a V, 677 S. |b Ill., zahlr. graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
650 | 4 | |a Chemical vapor deposition | |
650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Hitchman, Michael L. |e Sonstige |4 oth | |
999 | |a oai:aleph.bib-bvb.de:BVB01-005280073 |
Datensatz im Suchindex
_version_ | 1804122388315504640 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV008024080 |
callnumber-first | T - Technology |
callnumber-label | TS695 |
callnumber-raw | TS695 |
callnumber-search | TS695 |
callnumber-sort | TS 3695 |
callnumber-subject | TS - Manufactures |
classification_rvk | UP 7550 VN 7260 |
classification_tum | FER 882f |
ctrlnum | (OCoLC)27995365 (DE-599)BVBBV008024080 |
dewey-full | 620/.44 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 620 - Engineering and allied operations |
dewey-raw | 620/.44 |
dewey-search | 620/.44 |
dewey-sort | 3620 244 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Chemie / Pharmazie Physik Fertigungstechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01160nam a2200361 c 4500</leader><controlfield tag="001">BV008024080</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20051201 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">930713s1993 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0123496705</subfield><subfield code="9">0-12-349670-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)27995365</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV008024080</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-91G</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TS695</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620/.44</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">VN 7260</subfield><subfield code="0">(DE-625)147614:253</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">FER 882f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Chemical vapor deposition</subfield><subfield code="b">principles and applications</subfield><subfield code="c">ed. by Michael L. Hitchman ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">London u.a.</subfield><subfield code="b">Academic Press u.a.</subfield><subfield code="c">1993</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">V, 677 S.</subfield><subfield code="b">Ill., zahlr. graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical vapor deposition</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Hitchman, Michael L.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-005280073</subfield></datafield></record></collection> |
id | DE-604.BV008024080 |
illustrated | Illustrated |
indexdate | 2024-07-09T17:13:05Z |
institution | BVB |
isbn | 0123496705 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-005280073 |
oclc_num | 27995365 |
open_access_boolean | |
owner | DE-703 DE-355 DE-BY-UBR DE-91G DE-BY-TUM DE-29T DE-83 DE-11 |
owner_facet | DE-703 DE-355 DE-BY-UBR DE-91G DE-BY-TUM DE-29T DE-83 DE-11 |
physical | V, 677 S. Ill., zahlr. graph. Darst. |
publishDate | 1993 |
publishDateSearch | 1993 |
publishDateSort | 1993 |
publisher | Academic Press u.a. |
record_format | marc |
spelling | Chemical vapor deposition principles and applications ed. by Michael L. Hitchman ... London u.a. Academic Press u.a. 1993 V, 677 S. Ill., zahlr. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Chemical vapor deposition CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 s DE-604 Hitchman, Michael L. Sonstige oth |
spellingShingle | Chemical vapor deposition principles and applications Chemical vapor deposition CVD-Verfahren (DE-588)4009846-1 gnd |
subject_GND | (DE-588)4009846-1 |
title | Chemical vapor deposition principles and applications |
title_auth | Chemical vapor deposition principles and applications |
title_exact_search | Chemical vapor deposition principles and applications |
title_full | Chemical vapor deposition principles and applications ed. by Michael L. Hitchman ... |
title_fullStr | Chemical vapor deposition principles and applications ed. by Michael L. Hitchman ... |
title_full_unstemmed | Chemical vapor deposition principles and applications ed. by Michael L. Hitchman ... |
title_short | Chemical vapor deposition |
title_sort | chemical vapor deposition principles and applications |
title_sub | principles and applications |
topic | Chemical vapor deposition CVD-Verfahren (DE-588)4009846-1 gnd |
topic_facet | Chemical vapor deposition CVD-Verfahren |
work_keys_str_mv | AT hitchmanmichaell chemicalvapordepositionprinciplesandapplications |