Fine line lithography:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Amsterdam
North-Holland Publ. Co.
1980
|
| Schriftenreihe: | Materials processing, theory and practices.
1. |
| Schlagworte: | |
| Beschreibung: | enth. u.a.: Fundamentals of electron and x-ray lithography / N. D. Wittels. Optical methods for fine line lithography / B. J. Lin |
| Beschreibung: | VII, 481 S. Ill. u. graph. Darst. |
| ISBN: | 0444853510 |
Internformat
MARC
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| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 245 | 1 | 0 | |a Fine line lithography |c Hrsg. von Roger Newman* |
| 264 | 1 | |a Amsterdam |b North-Holland Publ. Co. |c 1980 | |
| 300 | |a VII, 481 S. |b Ill. u. graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Materials processing, theory and practices. |v 1. | |
| 500 | |a enth. u.a.: Fundamentals of electron and x-ray lithography / N. D. Wittels. Optical methods for fine line lithography / B. J. Lin | ||
| 650 | 7 | |a Circuits intégrés à grande échelle |2 ram | |
| 650 | 7 | |a Lithographie par faisceau d'électrons |2 ram | |
| 650 | 7 | |a Lithographie par rayons X |2 ram | |
| 650 | 4 | |a Integrated circuits |x Large scale integration | |
| 650 | 4 | |a Lithography | |
| 650 | 0 | 7 | |a Lithografie |0 (DE-588)4036042-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 0 | 1 | |a Lithografie |0 (DE-588)4036042-8 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 1 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 1 | |8 1\p |5 DE-604 | |
| 700 | 1 | |a Newman, Roger |e Sonstige |4 oth | |
| 830 | 0 | |a Materials processing, theory and practices. |v 1. |w (DE-604)BV001899942 |9 1 | |
| 940 | 1 | |q TUB-nseb | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-004924614 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
Datensatz im Suchindex
| _version_ | 1804121852644163584 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV007553146 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4170 |
| ctrlnum | (OCoLC)6194916 (DE-599)BVBBV007553146 |
| dewey-full | 621.381/73 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/73 |
| dewey-search | 621.381/73 |
| dewey-sort | 3621.381 273 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV007553146 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:04:34Z |
| institution | BVB |
| isbn | 0444853510 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-004924614 |
| oclc_num | 6194916 |
| open_access_boolean | |
| owner | DE-355 DE-BY-UBR DE-706 DE-83 DE-11 |
| owner_facet | DE-355 DE-BY-UBR DE-706 DE-83 DE-11 |
| physical | VII, 481 S. Ill. u. graph. Darst. |
| psigel | TUB-nseb |
| publishDate | 1980 |
| publishDateSearch | 1980 |
| publishDateSort | 1980 |
| publisher | North-Holland Publ. Co. |
| record_format | marc |
| series | Materials processing, theory and practices. |
| series2 | Materials processing, theory and practices. |
| spelling | Fine line lithography Hrsg. von Roger Newman* Amsterdam North-Holland Publ. Co. 1980 VII, 481 S. Ill. u. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials processing, theory and practices. 1. enth. u.a.: Fundamentals of electron and x-ray lithography / N. D. Wittels. Optical methods for fine line lithography / B. J. Lin Circuits intégrés à grande échelle ram Lithographie par faisceau d'électrons ram Lithographie par rayons X ram Integrated circuits Large scale integration Lithography Lithografie (DE-588)4036042-8 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 s Lithografie (DE-588)4036042-8 s DE-604 Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s 1\p DE-604 Newman, Roger Sonstige oth Materials processing, theory and practices. 1. (DE-604)BV001899942 1 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Fine line lithography Materials processing, theory and practices. Circuits intégrés à grande échelle ram Lithographie par faisceau d'électrons ram Lithographie par rayons X ram Integrated circuits Large scale integration Lithography Lithografie (DE-588)4036042-8 gnd Integrierte Schaltung (DE-588)4027242-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4036042-8 (DE-588)4027242-4 (DE-588)4174516-4 |
| title | Fine line lithography |
| title_auth | Fine line lithography |
| title_exact_search | Fine line lithography |
| title_full | Fine line lithography Hrsg. von Roger Newman* |
| title_fullStr | Fine line lithography Hrsg. von Roger Newman* |
| title_full_unstemmed | Fine line lithography Hrsg. von Roger Newman* |
| title_short | Fine line lithography |
| title_sort | fine line lithography |
| topic | Circuits intégrés à grande échelle ram Lithographie par faisceau d'électrons ram Lithographie par rayons X ram Integrated circuits Large scale integration Lithography Lithografie (DE-588)4036042-8 gnd Integrierte Schaltung (DE-588)4027242-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Circuits intégrés à grande échelle Lithographie par faisceau d'électrons Lithographie par rayons X Integrated circuits Large scale integration Lithography Lithografie Integrierte Schaltung Fotolithografie Halbleitertechnologie |
| volume_link | (DE-604)BV001899942 |
| work_keys_str_mv | AT newmanroger finelinelithography |