Holdings: Scanning electron microscopy and x-ray microanalysis

Scanning electron microscopy and x-ray microanalysis: a text for biologists, materials scientists, and geologists

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Bibliographic Details
Format:	Book
Language:	English
Published:	New York u.a. Plenum Press 1992
Edition:	2. ed.
Subjects:	Microanalyse aux rayons X Microanalyse par émission X Microscopes électroniques à balayage Microscopie électronique à balayage Electron Probe Microanalysis Microscopy, Electron, Scanning Scanning electron microscopy X-ray microanalysis Rasterelektronenmikroskopie Raster-Transmissions-Elektronenmikroskopie Elektronenstrahlmikroanalyse Röntgenstrukturanalyse Werkstoff
Online Access:	Inhaltsverzeichnis
Physical Description:	XVIII, 820 S. Ill., graph. Darst.
ISBN:	0306441756

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245	1	0	\|a Scanning electron microscopy and x-ray microanalysis \|b a text for biologists, materials scientists, and geologists \|c Joseph I. Goldstein ...
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adam_text	Scanning Electron Microscopy and X-Ray Microanalysis A Text for Biologists, Materials Scientists, and Geologists SECOND EDITION Joseph I Goldstein Lehigh University Bethlehem, Pennsylvania Dale E Newbury National Institute of Standards and Technology Gaithersburg, Maryland Patrick Echlin University of Cambridge , Cambridge, England David C Joy University of Tennessee Knoxville, Tennessee A D Romig, Jr Sandia National Laboratories Albuquerque, New Mexico Charles £ Lyman Lehigh University Bethlehem, Pennsylvania Charles Fiori National Institute of Standards and Technology Gaithersburg, Maryland Eric Lifshin General Electric Corporate Research and Development Schenectady, New York PLENUM PRESS • NEW YORK AND LONDON Contents 1 Introduction 1 1 1 Evolution of the Scanning Electron Microscope 2 1 2 Evolution of the Electron Probe Microanalyzer 10 1 3 Outline of This Book 17 2 Electron Optics 21 2 1 How the SEM Works 21 211 Functions of the SEM Subsystems 21 212 • Why Learn about Electron Optics? 24 2 2 Electron Guns 25 221 Thermionic Electron Emission 25 222 Conventional Triode Electron Guns 26 223 Brightness 29 224 Tungsten Hairpin Electron Gun 31 225 Lanthanum Hexaboride (LaB6) Electron Guns 35 226 Field Emission Electron Guns 38 2 3 Electron Lenses 43 231 Properties of Magnetic Lenses 43 232 Lenses in SEMs 46 233 Producing Minimum Spot Size 48 234 Lens Aberrations 53 2 4 • Electron Probe Diameter versus Electron Probe Current 57 241 Calculation of dmia and imax 57 242 Comparison of Electron Sources 60 243 Measurement of Microscope Parameters 65 2 5 Summary of SEM Microscopy Modes 67 3 Electron—Specimen Interactions 69 3 1 Introduction 69 3 2 Electron Scattering 70 321 Elastic Scattering 71 322 Inelastic Scattering 73 VU Vlii 3 3 Interaction Volume 79 331 Experimental Evidence 79 CONTENTS 332 Monte Carlo Electron-Trajectory Simulation 81 3321 Influence of Beam Energy on Interaction Volume 83 3322 Influence of Atomic Number on Interaction Volume 84 3323 Influence of Specimen Surface Tilt on Interaction Volume 86 333 Measures of Interaction Volume—Electron Range 87 3331 Bethe Range 88 3332 Kanaya-Okayama Range 89 3333 Range for a Tilted Specimen 89 3334 Comparison of Ranges 89 3335 Range at Low Beam Energy 90 3 4 Signals from Elastic Scattering 90 341 Backscattered Electrons 91 3411 Atomic Number Dependence 92 3412 Beam-Energy Dependence 94 3413 Tilt Dependence 95 3414 Angular Distribution 97 3415 Energy Distribution 100 3416 Lateral Spatial Distribution 101 3417 Sampling Depth of Backscattered Electrons 104 3 5 Signals from Inelastic Scattering 106 351 Secondary Electrons 107 3511 Definition and Origin 107 3512 Energy Distribution 108 3513 Specimen Composition Dependence 108 3514 Beam-Energy Dependence 110 3515 Specimen Tilt Dependence I l l 3516 Angular Distribution of Secondary Electrons 112 3517 Range and Escape Depth of Secondary Electrons 113 3518 Relative Contributions of SE, and SEn 115 352 X-Rays 116 3521 Continuum X-Ray Production 117 3522 Inner-Shell Ionization 119 3523 X-Ray Absorption 135 3524 X-Ray Fluorescence 139 353 Auger Electrons 142 354 Cathodoluminescence 144 355 Specimen Heating 146 3 6 Summary 146 4 Image Formation and Interpretation 149 4 1 Introduction 149 4 2 The Basic SEM Imaging Process 150 421 Scanning Action ; 150 IX 422 Image Construction (Mapping) 152 4221 Line Scans 153 CONTENTS 4222 Image (Area) Scanning 154 4223 Digital Imaging: Collection and Display 156 423 Magnification 157 424 Picture Element (Pixel) Size 159 425 Low-Magnification Operation 163 426 Depth of Field (Focus) 163 427 Image Distortions 166 4271 Projection Distortion: Gnomonic Projection 166 4272 Projection Distortion: Image Foreshortening of Tilted Objects 167 4273 Corrections for Tilted Flat Surfaces 170 4274 Scan Distortion: Pathological 170 4275 Moire Effects 174 4 3 Detectors 174 431 Electron Detectors 176 4311 Everhart-Thornley Detector 177 4312 Dedicated Backscattered-Electron Detectors 181 4313 Specimen Current (The Specimen As Detector) 186 432 Cathodoluminescence Detector 188 4 4 Image Contrast at Low Magnification ( 10,000x) 189 441 Contrast 190 442 • Compositional (Atomic Number) Contrast 191 4421 Compositional Contrast with Backscattered Electrons 191 4422 Compositional Contrast with Secondary Electrons 195 4423 Compositional Contrast with Specimen Current 197 443 Topographic Contrast 198 4431 Origin 198 4432 Topographic Contrast with the Everhart-Thornley Detector 200 4433 Light-Optical Analogy 203 4434 Topographic Contrast with Other Detectors 205 4435 Separation of Contrast Components 210 4436 Other Contrast Mechanisms 214 4 5 Image Quality 215 4 6 High-Resolution Microscopy: Intermediate (10,000-100,000x) and High Magnification ( 100,000x) 219 461 Electron-Specimen Interactions in High- Resolution Microscopy 220 4611 Backscattered Electrons 220 4612 Secondary Electrons 223 462 High-Resolution Imaging at High Voltage 224 463 High-Resolution Imaging at Low Voltage 226 X464 Resolution Improvements: The Secondary- Electron Signal 227 CONTENTS 465 Image Interpretation at High Resolution 229 4 7 Image Processing for the Display of Contrast Information 231 471 The Visibility Problem 232 472 Analog Signal Processing 233 4721 Display of Weak Contrast (Differential Amplification) 234 4722 Enhancement of a Selected Contrast Range (Gamma Processing) 237 4723 Enhancement of Selected Spatial Frequencies (Derivative Processing) 238 4724 Signal Mixing 242 4725 Contrast Reversal 243 4726 y-Modulation 243 473 Digital Image Processing 244 4731 Real Time Digital Imaging 244 4732 Off-Line Digital Image Processing 245 4733 Digital Imaging for Minimum-Dose Microscopy 246 4 8 Defects of the SEM Imaging Process 247 481 Contamination 247 482 Charging 249 4821 Incipient Charging 253 4822 Severe Charging 254 4 9 Special Topics in SEM Imaging 255 491 SEM at Elevated Pressures (Environmental SEM) 255 4911 The Vacuum Environment 255 4912 Detectors for Elevated-Pressure Microscopy 256 4913 Contrast in Elevated-Pressure Microscopy 257 4914 Resolution 258 4915 Benefits of SEM at Elevated Pressures 258 492 Stereo Microscopy 260 4921 Qualitative Stereo Microscopy 260 4922 Quantitative Stereo Microscopy 263 493 STEM in SEM 267 4 10 Developing a Comprehensive Imaging Strategy 270 5 X-Ray Spectral Measurement: WDS and EDS 273 5 1 Introduction 273 5 2 Wavelength-Dispersive Spectrometer 273 521 Basic Design 273 522 The X-Ray Detector 280 523 Detector Electronics 283 5 3 Energy-Dispersive X-Ray Spectrometer 292 531 Operating Principles 292 532 The Detection Process 296 533 Charge-to-Voltage Conversion 297 534 Pulse-Shaping Linear Amplifier and Pileup •* Rejection Circuitry 298 535 The Computer X-Ray Analyzer 304 CONTENTS 536 Artifacts of the Detection Process 310 5361 Peak Broadening 310 5362 Peak Distortion 313 5363 Silicon X-Ray Escape Peaks 315 5364 Absorption Edges 316 5365 Internal Fluorescence Peak of Silicon 319 537 Artifacts from the Detector Environment 319 5371 Microphony 320 5372 Ground Loops 321 5373 Ice-Oil Accumulation 323 5374 Sensitivity to Stray Radiation 325 538 Summary of EDS Operation and Artifacts 330 5 4 Comparison of WDS and EDS 331 541 Geometrical Collection Efficiency 331 542 Quantum Efficiency 332 543 Resolution 332 544 Spectral Acceptance Range 334 545 Maximum Count Rate 334 546 Minimum Probe Size 334 547 Speed of Analysis 336 548 Spectral Artifacts 336 Appendix: Initial Detector Setup and Testing 337 6 Qualitative X-Ray Analysis 341 6 1 Introduction 341 6 2 EDS Qualitative Analysis 343 621 X-Ray Lines 343 622 Guidelines for EDS Qualitative Analysis 348 6221 General Guidelines for EDS Qualitative Analysis 348 6222 Specific Guidelines for EDS Qualitative Analysis 349 623 Pathological Overlaps in EDS Qualitative Analysis 353 624 Examples of EDS Qualitative Analysis 355 6 3 WDS Qualitative Analysis 357 631 Measurement of X-Ray Lines 357 632 Guidelines for WDS Qualitative Analysis 361 6 4 Automatic Qualitative EDS Analysis 363 7 X-Ray Peak and Background Measurements 365 7 1 General Considerations for X-Ray Data Handling 365 7 2 Background Correction 366 721 Background Correction for EDS 366 7211 Background Modeling 368 7212 Background Filtering 373 XII 722 Background Correction for WDS 376 7221 Interpolation 376 CONTENTS 7222 Substitute Material Method 377 *73 Peak Overlap Correction 377 731 EDS Peak Overlap Correction 377 7311 Linearity 379 7312 Goodness of Fit 380 7313 The Linear Methods 381 7314 The Nonlinear Methods 383 7315 Error Estimation 386 732 WDS Peak-Overlap Correction 391 8 Quantitative X-Ray Analysis: The Basics 395 8 1 Introduction 395 8 2 Advantages of Quantitative X-Ray Microanalysis in the SEM/EPMA 396 8 3 Quantitative Analysis Procedures 397 8 4 The Approach to X-Ray Quantitation: The Need for Matrix Corrections 399 8 5 The Physical Origin of Matrix Effects 400 8 6 X-Ray Production 401 861 Effect of Atomic Number 401 862 X-Ray Generation with Depth, t (pz) 403 8 7 ZAF Factors in Microanalysis 405 871 Atomic Number Effect 405 872 X-Ray Absorption Effect 407 873 X-Ray Fluorescence 412 8 8 Types of Matrix Correction Schemes 413 8 9 Caveats 415 9QuantitativeX-RayAnalysis:TheoryandPractice 417 91 Introduction 417 9 2 ZAF Technique , 417 921 Introduction 417 922 The Atomic Number Correction Z 419 923 The Absorption Correction A 424 9231 Formulation 424 9232 Expressions for f(x) 425 9233 Practical Considerations 426 9234 Calculations of the Absorption Factor A 421 9 2A The Characteristic Fluorescence Correction F 429 925 The Continuum Fluorescence Correction 432 926 Summary Discussion of the ZAF Method 434 9 3 4 (pz) Technique 436 931 Introduction 436 932 The p(pz) Curves 437 9321 Definition 437 9322 Measurement of j (pz) Curves 439 933 Calculation of 0(pz) Curves 440 XIII 934 Atomic Number Correction Z, 443 935 Absorption Correction At - 445 CONTENTS 936 Summary Discussion of the j (pz) Method 448 9 4 Quantitative Analysis with Nonnormal Electron-Beam Incidence 453 9 5 Standardless Analysis 456 9 6 The Biological or Polymer Specimen: Special Procedures 460 961 The Characteristic Signal 461 962 The Continuum Signal 462 963 Derivation of the Hall Procedure in Terms of X-Ray Cross-Sections 463 964 Error Analysis 465 965 Bulk Targets and Analysis of a Minor Element 465 9 7 Special Procedures for Geological Analysis 466 971 Introduction 466 972 Formulation of the Bence-Albee Procedure 467 973 Application of Bence-Albee Procedure 468 974 Specimen Conductivity 470 9 8 Special Sample Analysis 471 981 Introduction: The Analytical Total 471 982 Films on Substrates 472 983 Foils 476 984 Particles and Rough Surfaces 479 9841 Mass Effect 479 9842 Absorption Effect 480 9843 Fluorescence Effect 486 9844 Compensating for Geometric Effects in Quantitative Analysis 486 9 9 Precision and Sensitivity in X-Ray Analysis 493 991 Statistical Basis for Calculating Precision and Sensitivity 493 992 Sample Homogeneity 496, 993 Analytical Sensitivity 497 994 Trace-Element Analysis 499 995 Variance under Peak Overlap Conditions in the EDS 502 9 10 Light-Element Analysis 503 9 10 1 Introduction 503 9 10 2 Operating Conditions for Light-Element Analysis 504 9 10 3 X-Ray Spectrometers 505 9 10 3 1 WDS 505 9 10 3 2 EDS 509 9 10 4 Chemical Bonding Shifts 510 9 10 4 1 WDS 510 9 10 4 2 EDS 512 9 10 5 Standards for Light-Element Analysis 513 9 10 6 Surface Contamination 514 9 10 7 Measurement of Background Intensities 516 9 10 7 1 WDS 516 9 10 7 2 EDS 517 9 10 8 Quantitation Procedures for the Light Elements 517 XIV Appendix 9 1 Equations for the a, fi, y, and 0(0) Terms of the Packwood-Brown (j (pz) Equation 520 CONTENTS Appendix 9 2 Solutions for the Atomic Number and Absorption Corrections 522 10 Compositional Imaging 525 10 1 Introduction 525 10 2 Analog X-Ray Area Scanning (Dot Mapping) 526 10 2 1 Procedure 526 10 2 2 Limitations and Artifacts 529 10 3 Digital Compositional Mapping ; 535 10 3 1 Principles 535 10 311 Data Collection 536 10 312 Dead-time Correction 536 10 313 Defocusing or Decollimation Correction 536 10 314 Background Correction 537 10 315 Standardization (fc-Value) 538 10 316 Matrix Correction 538 10 317 Combined EDS-WDS Strategy 538 10 318 Statistics in Compositional Mapping 539 10 3 2 Advantages 539 11 Specimen Preparation for Inorganic Materials: Microstructural and Microchemical Analysis 547 11 1 Metals 547 11 1 1 Specimen Preparation for Surface Topography 549 11 1 2 Specimen Preparation for Microstructural and Microchemical Analysis 550 11 121 Final Specimen Preparation for Microstructural Analysis 550 11 122 Final Specimen Preparation for Microchemical Analysis 552 11 1 3 Preparation of Standards for X-Ray Microanalysis 554 11 2 Ceramics and Geological Specimens 556 11 2 1 Initial Specimen Preparation 556 11 2 2 Mounting 556 11 2 3 Polishing 557 11 2 4 Final Specimen Preparation 557 11 3 Electronic Devices and Packages 557 11 3 1 Initial Specimen Preparation 558 11 3 2 Mounting 559 11 3 3 Polishing 560 11 3 4 Final Preparation 560 11 4 Semiconductors 560 11 4 1 Voltage Contrast 560 11 4 2 Charge Collection 561 11 4 3 Electron Channeling 562 11 5 Sands, Soils, and Clays 562 11 6 Particles and Fibers 564 11 6 1 Particle Substrates 565 XV 11 611 Bulk Substrates 565 11 612 Thin-Foil Substrate 566 CONTENTS 11 6 2 Transfer and Attachment of Particles to Substrates 566 11 621 Abundant, Loose Particles 567 11 622 Particle Transfer from a Filter 568 11 623 Particles in a Solid Matrix 568 11 6 3 Transfer of Individual Particles 569 12 Sample Preparation for Biological, Organic, Polymeric, and Hydrated Materials 571 12 1 Introduction • 571 12 2 Compromising the Electron-Beam Instrument 572 12 2 1 Environmental Stages 572 12 2 2 Environmental Microscopes 572 12 2 3 Nonoptimal Microscope Performance 573 12 3 Compromising the Sample 574 12 4 Correlative Microscopy 576 12 5 Techniques for Structural Studies 576 12 5 1 Specimen Selection 578 12 5 2 Specimen Cleaning 579 12 5 3 Specimen Stabilization 582 12 5 4 Specimen Dehydration 585 12 541 Chemical Dehydration 585 12 542 Critical-Point Drying 590 12 543 Low-Temperature Drying 592 12 544 Ambient-Temperature Sublimation 594 12 5 5 Exposure of Internal Surfaces 594 12 551 Sectioning 596 12 552 Fracturing 599 12 553 Replication 604 12 554 Surface Etching 606 12 5 6 Specimen Supports 606 12 5 7 High-Resolution Scanning Microscopy # 609 12 571 Isolation of Object of Interest 609 12 572 Stabilization and Conductive Staining 611 12 573 Specimen Coating 611 12 6 Specimen Preparation for Localization of Metabolic Activity and Chemical Specificity 611 12 6 1 Introduction 611 12 6 2 The Nature of the Problem 612 12 621 The Form of the Substance Being Analyzed 612 12 622 Precision of Analytical Investigation 612 12 623 Types of Specimens 614 12 624 Types of Instrumentation 616 12 625 Types of Analytical Applications 616 12 6 3 General Preparative Procedures 617 12 631 Before Fixation 617 12 632 Fixation 617 12 633 Histochemical Techniques 619 XVI 12 634 Precipitation Techniques 620 12 635 Dehydration 621 CONTENTS 12 636 Embedding 622 12 637 Sectioning and Fracturing 623 12 638 Specimen Supports 623 12 639 Specimen Staining 624 12 6 4 Localizing Regions of Biological Activity and Chemical Specificity 624 • 12 641 Backscattered-Electron Cytochemical Methods 624 12 642 Radioactive Labelling Methods 628 12 643 Immunocytochemical Methods 629 12 6 5 Criteria for Satisfactory Specimen Preparation 633 12 7 Preparative Procedures for Organic Samples Such as Polymers, Plastics, and Paints 635 12 7 1 Introduction 635 12 7 2 Examination of the Surface of Polymers and Fibers 635 12 7 3 Examination of the Interior of Polymers and Fibers 635 12 731 Sectioning 636 12 732 Polished Cut Surfaces 636 12 733 Peelback Procedure 637 12 734 Fracturing 638 12 735 Replicas 639 12 7 4 Surface Etching of Polymers 639 12 741 High-Energy Beam Bombardment 640 12 742 Argon Ion-Beam Etching 640 12 1 A3 Oxygen Plasma Etching 640 12 1 AA Chemical Dissolution 640 12 745 Chemical Attack 641 12 746 Enzymatic Digestion 641 12 7 5 Staining of Polymers and Plastics 641 12 751 Osmium Tetroxide 641 12 752 Chlorosulphonic Acid 641 12 753 Phosphotungstic Acid 642 12 754 Ruthenium Tetroxide 642 12 755 Silver Salts 642 12 7 6 Specialized Preparative Methods 643 12 8 Low-Temperature Specimen Preparation for Structural and Analytical Studies 644 12 8 1 Introduction 644 12 8 2 Water: Properties 645 12 8 3 Ice 646 12 8 4 Rapid Cooling Procedures 647 12 8 5 Cryosectioning 649 12 8 6 Cryofracturing 649 12 8 7 Freeze Drying 651 12 8 8 Freeze Substitution and Low-Temperature Embedding 652 12 8 9 Low-Temperature SEM 654 12 8 10 Low-Temperature X-Ray Microanalysis 654 12 9 Damage, Artifact, and Interpretation 658 12 9 1 Introduction 658 12 9 2 Sample Damage during Preparation 658 XVII 12 9 3 Specimen Damage during Examination and Analysis 659 12 931 Observable Damage 659 CONTENTS 12 932 Nonobservable Damage 662 12 9 4 Artifacts _ 668 12 9 5 Interpretation 669 12 10 Specific Preparative Procedures: A Bibliography 669 13 Coating and Conductivity Techniques for SEM and Microanalysis 671 13 1 Introduction 671 13 2 Specimen Characteristics 672 13 2 1 Conductivity ^ 672 13 2 2 Thermal Damage 672 13 2 3 Secondary- and Backscattered-Electron Emission 674 13 2 4 X-Ray and Cathodoluminescence Emission 674 13 2 5 Mechanical Stability 675 13 3 Untreated Specimens 675 13 4 Bulk Conductivity Staining Methods 678 13 5 Specimen Mounting Procedures 684 13 6 Thin-Film Methods 685 13 7 Thermal Evaporation 686 13 7 1 High-Vacuum Evaporation 688 13 7 2 The Apparatus 692 13 7 3 Choice of Evaporant 694 13 7 4 • Evaporation Techniques 696 13 7 5 Artifacts Associated with Evaporative Coating 700 13 7 6 Low-Vacuum Evaporation 701 13 8 Sputter Coating 701 13 8 1 Diode or Direct-Current Sputtering 703 13 8 2 Plasma-Magnetron Sputtering 705 13 8 3 Ion-Beam Sputtering 707 13 8 4 Penning Sputtering 711 13 8 5 Sputtering Techniques 715 13 8 6 Choice of Target Material 716 13 8 7 Coating Thickness 716 13 8 8 Advantages of Sputter Coating 717 13 8 9 Artifacts Associated with Sputter Coating 719 13 9 Specialized Coating Methods 720 13 9 1 High-Resolution Coating 720 13 9 2 Coating Samples Maintained at Low Specimen Temperatures 723 13 9 3 Coating Frozen-Hydrated Material Maintained at Low Temperatures 726 13 9 4 Coating Techniques for X-Ray Microanalysis 729 13 10 Determination of Coating Thickness 732 13 10 1 Estimation of Coating Thickness 732 13 10 2 Measurement during Coating 733 13 10 3 Measurement after Coating 735 13 10 4 Removing Coating Layers 736 XVIII 13 11 Artifacts Related to Coating and Bulk-Conductivity Procedures 737 CONTENTS 13 12 Conclusions 739 14 Data Base 741 Table 14 1 Atomic Number, Atomic Weight, and Density of Elements 741 Table 14 2 Common Oxides of the Elements 743 Table 14 3 Mass Absorption Coefficients for Ka Lines 744 Table 14 4 Mass Absorption Coefficients for La Lines 752 Table 14 5 Mass Absorption Coefficients for Ma Lines 768 Table 14 6 K Series X-Ray Wavelengths and Energies 778 Table 14 7 L Series X-Ray Wavelengths and Energies 780 Table 14 8 M Series X-Ray Wavelengths and Energies 781 Table 14 9 J and Fluorescent Yield (w) by Atomic Number 782 Table 14 10 Important Properties of Selected Coating Elements 784 References , 787 Index 807
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id	DE-604.BV007311619
illustrated	Illustrated
indexdate	2024-07-09T16:59:41Z
institution	BVB
isbn	0306441756
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-004703864
oclc_num	25551671
open_access_boolean
owner	DE-384 DE-355 DE-BY-UBR DE-703 DE-20 DE-M347 DE-29T DE-706 DE-11 DE-188 DE-B16
owner_facet	DE-384 DE-355 DE-BY-UBR DE-703 DE-20 DE-M347 DE-29T DE-706 DE-11 DE-188 DE-B16
physical	XVIII, 820 S. Ill., graph. Darst.
publishDate	1992
publishDateSearch	1992
publishDateSort	1992
publisher	Plenum Press
record_format	marc
spelling	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists Joseph I. Goldstein ... 2. ed. New York u.a. Plenum Press 1992 XVIII, 820 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Microanalyse aux rayons X Microanalyse par émission X ram Microscopes électroniques à balayage ram Microscopie électronique à balayage Microscopie électronique à balayage ram Electron Probe Microanalysis Microscopy, Electron, Scanning Scanning electron microscopy X-ray microanalysis Rasterelektronenmikroskopie (DE-588)4048455-5 gnd rswk-swf Raster-Transmissions-Elektronenmikroskopie (DE-588)4320991-9 gnd rswk-swf Elektronenstrahlmikroanalyse (DE-588)4151898-6 gnd rswk-swf Röntgenstrukturanalyse (DE-588)4137203-7 gnd rswk-swf Werkstoff (DE-588)4065579-9 gnd rswk-swf Elektronenstrahlmikroanalyse (DE-588)4151898-6 s Werkstoff (DE-588)4065579-9 s DE-604 Raster-Transmissions-Elektronenmikroskopie (DE-588)4320991-9 s Rasterelektronenmikroskopie (DE-588)4048455-5 s Röntgenstrukturanalyse (DE-588)4137203-7 s 1\p DE-604 2\p DE-604 Goldstein, Joseph 1939-2015 Sonstige (DE-588)1023852381 oth HEBIS Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=004703864&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists Microanalyse aux rayons X Microanalyse par émission X ram Microscopes électroniques à balayage ram Microscopie électronique à balayage Microscopie électronique à balayage ram Electron Probe Microanalysis Microscopy, Electron, Scanning Scanning electron microscopy X-ray microanalysis Rasterelektronenmikroskopie (DE-588)4048455-5 gnd Raster-Transmissions-Elektronenmikroskopie (DE-588)4320991-9 gnd Elektronenstrahlmikroanalyse (DE-588)4151898-6 gnd Röntgenstrukturanalyse (DE-588)4137203-7 gnd Werkstoff (DE-588)4065579-9 gnd
subject_GND	(DE-588)4048455-5 (DE-588)4320991-9 (DE-588)4151898-6 (DE-588)4137203-7 (DE-588)4065579-9
title	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists
title_auth	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists
title_exact_search	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists
title_full	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists Joseph I. Goldstein ...
title_fullStr	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists Joseph I. Goldstein ...
title_full_unstemmed	Scanning electron microscopy and x-ray microanalysis a text for biologists, materials scientists, and geologists Joseph I. Goldstein ...
title_short	Scanning electron microscopy and x-ray microanalysis
title_sort	scanning electron microscopy and x ray microanalysis a text for biologists materials scientists and geologists
title_sub	a text for biologists, materials scientists, and geologists
topic	Microanalyse aux rayons X Microanalyse par émission X ram Microscopes électroniques à balayage ram Microscopie électronique à balayage Microscopie électronique à balayage ram Electron Probe Microanalysis Microscopy, Electron, Scanning Scanning electron microscopy X-ray microanalysis Rasterelektronenmikroskopie (DE-588)4048455-5 gnd Raster-Transmissions-Elektronenmikroskopie (DE-588)4320991-9 gnd Elektronenstrahlmikroanalyse (DE-588)4151898-6 gnd Röntgenstrukturanalyse (DE-588)4137203-7 gnd Werkstoff (DE-588)4065579-9 gnd
topic_facet	Microanalyse aux rayons X Microanalyse par émission X Microscopes électroniques à balayage Microscopie électronique à balayage Electron Probe Microanalysis Microscopy, Electron, Scanning Scanning electron microscopy X-ray microanalysis Rasterelektronenmikroskopie Raster-Transmissions-Elektronenmikroskopie Elektronenstrahlmikroanalyse Röntgenstrukturanalyse Werkstoff
url	http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=004703864&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA
work_keys_str_mv	AT goldsteinjoseph scanningelectronmicroscopyandxraymicroanalysisatextforbiologistsmaterialsscientistsandgeologists

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