IEEE SEMI International Semiconductor Manufacturing Science Symposium: may 19 - 22, 1991, Burlingame, CA, USA
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
New York, NY
Inst. of Electrical and Electronics Engineers
1991
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | X, 164 S. Ill., graph. Darst. |
| ISBN: | 0780300270 0780300289 0780300297 |
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| 245 | 1 | 0 | |a IEEE SEMI International Semiconductor Manufacturing Science Symposium |b may 19 - 22, 1991, Burlingame, CA, USA |
| 264 | 1 | |a New York, NY |b Inst. of Electrical and Electronics Engineers |c 1991 | |
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| 500 | |a Literaturangaben | ||
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| 650 | 4 | |a Electronic industries |v Congresses | |
| 650 | 4 | |a Semiconductors |x Design and construction |v Congresses | |
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Datensatz im Suchindex
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|---|---|
| adam_text | TABLE
OF
CONTENTS
Overview of
SEMI
iv
Overview of the IEEE
iv
MANUFACTURING MANAGEMENT
Session Chair: Robert W. Atherton, In-Motbn Technology
The IBM Statistical Process Control Implementation Program: An Interactive
1
Videodisc Approach S. Jack Hunt, IBM Corporation
A New Equipment Management Approach
4
Luc Pesesse, SGS Thomson Microelectronics
Modeling the Performance of Cluster-Based Fabs
8
Samuel
С
Wood, Krishna C. Saraswat, Stanford University
Shop Floor Control in ASIC Assembly
15
Shay-Ping T. Wang, Motorola, Inc.
Performance Evaluation of Lot Dispatching and Scheduling Algorithms Through
21
Discrete Event Simulation Pat O Neil, Motorola, Inc.
Utilizing an Integrated Yield Management System to Improve the Return on
25
Investment in
1С
Manufacturing Paul Castrucci, Paul Castrucci
S
Associates,
Inc,
Gary Dickerson, Dave
Bakker,
KLA
Instruments Corporation
LUNCHEON TALK
The Intelligent Microelectronics Factory of the Future
30
Graydon B. Larrabee, Texas Instruments, Inc.
EQUIPMENT PERFORMANCE
&
RELIABILITY
Session Chair: Joe Monkowski, Lam Research Corporation
Industrial Standards
-
The Development Process
35
Invited Speaker: Jim Greed. VLSI Standards
Long Term Cost of Ownership: Beyond Purchase Price
39
Ross
Carnes,
SEMATECH, May
Su,
Lam Research
Manufacturing Lithography Value/Cost Analysis
44
Mark G. Bigetow, Paul
Ter Beek,
ASM-Lithography
Equipment Start-up in a Manufacturing Environment
55
Landon Vines, Ravi Jhota, Stephen Cannizzaro, VLSI Technology, Inc.
Automated Malfunction Diagnosis of a Plasma Etcher
62
Gary S. May,
Costas
J. Spanos,
University of California
-
Berkeley
Gaining Competitive Advantage Through Continuous Improvement Programs
69
Richard Herrera, Alan
Miller, Lam Research Corp.
Moving In-SItu Particle Monitoring into Manufacturing: A Status Report
75
Peter
Bordon,
Joe Mason,
Michele
Klein, High Yield Technology
IEEE/SEMI Int l Semiconductor Manufacturing Science Symposium
91
Burlingame, CA
СІМ
/
Manufacturing Standards
Session Chair: Dheeraj (Raj) Khera, U.S. Natbnal Institute of Standards
&
Technology
The Focus of Computer Integrated Manufacturing in the Japanese
80
Semiconductor Industry Invited Speaker: Bevan P. F. Wu, IBM T. J. Watson Research Center
A New Knowledge-Based Expert System for Inspection of ULSI Process Flow
85
Etsuo Fukuda,
Minoru Kimura,
Kazuyuki Miura, Hiromichi Fuji, Masayoshi Tazawa, Toshiba Corp.
Paperless Manufacturing: A Challenge Now and in the Future
89
Mark
G. Remson,
VLSI Technology, Inc.
Automation Experiences on a New
1
Micron Production Fab
95
Frank M. T. Chi, Mike Cornelison,
Taman
Semiconductor Mfg, Michael Brain,
Miliard Schewe, Asyst
Technologies
Measuring Perceptions and Expectations of Service Quality
98
John L.
Schuier,
Advanced Micro Devices
Implementation of the SEMI Generic Equipment Model Using Object-Based
102
Cell Technology John R. DeBolt,
С
Robert Wickizer,
PROMIS
Systems Corp.
ISO
9000:
The New Quality Standard
106
Harvey Berman, Underwriters Laboratories, Inc.
PROCESS CONTROL
/
SPC
Session Chair: Jim Cunningham, Cunningham Associates
Semiconductor Manufacturing Education at San Jose State University
109
Invited Speaker: Peter Gwozdz, San Jose State University
Real-time Statistical Process Control for Plasma Etching
113
Hai-Fang Guo,
Costas
J.
Spanos, University of California
-
Berkeley
,
Alan J. Miller, Lam Research
A Practical Standard Procedure for Contamination Measurements on Wafer
119
Surfaces: Experimental Verification John Todoroff, Tom Woodhuli, IBM Corp.
Designing Particles out of the Deposition Process
--
Titanium Nitride Films
124
V. S. Dharmadhikari, W. Brennan, Alain
С
Diebold, SEMATECH.J. Schlueter, J. Blake, EATON Corp.
Using Full Wafer Defect Maps as Process Signatures to Monitor and Control Yield
129
Ken Radigan, National Semiconductor Corp., Brian Sheumaker, Neil Heller, Insystems
VLSI Process Monitoring System
136
Arthur W. Quick, Joe Lucas, IBM Corp.
Efficient and Practical Experimental Designs for High Volume Manufacturing
139
Raymond L.
Brunelle,
National Semiconductor Corp.
Bibliography of Books and Articles Related to Manufacturing:
1991 145
Gary Cheek, Analog Devices Semiconductor
BIOGRAPHIES OF THE SPEAKERS
149
SEMI Publications, Standards, Videos, Network
155
Past ISMSS, ASMC Proceedings
--
Order Form
156
Summary of Conference Publications Available
158
IEEE Membership Information
164
IEEE/SEMI Int l Semiconductor Manufacturing Science Symposium
91
Burlingame, CA
|
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Conference Proceeding Book |
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| genre_facet | Konferenzschrift 1991 Burlingame Calif. |
| id | DE-604.BV005923799 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T16:36:57Z |
| institution | BVB |
| institution_GND | (DE-588)5059516-7 |
| isbn | 0780300270 0780300289 0780300297 |
| language | English |
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| publishDate | 1991 |
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| publisher | Inst. of Electrical and Electronics Engineers |
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| spelling | International Semiconductor Manufacturing Science Symposium 3 1991 Burlingame, Calif. Verfasser (DE-588)5059516-7 aut IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA New York, NY Inst. of Electrical and Electronics Engineers 1991 X, 164 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Literaturangaben Computer integrated manufacturing systems Congresses Electronic industries Congresses Semiconductors Design and construction Congresses Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1991 Burlingame Calif. gnd-content Integrierte Schaltung (DE-588)4027242-4 s Fertigung (DE-588)4016899-2 s DE-604 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003709486&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA Computer integrated manufacturing systems Congresses Electronic industries Congresses Semiconductors Design and construction Congresses Integrierte Schaltung (DE-588)4027242-4 gnd Fertigung (DE-588)4016899-2 gnd |
| subject_GND | (DE-588)4027242-4 (DE-588)4016899-2 (DE-588)1071861417 |
| title | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA |
| title_auth | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA |
| title_exact_search | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA |
| title_full | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA |
| title_fullStr | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA |
| title_full_unstemmed | IEEE SEMI International Semiconductor Manufacturing Science Symposium may 19 - 22, 1991, Burlingame, CA, USA |
| title_short | IEEE SEMI International Semiconductor Manufacturing Science Symposium |
| title_sort | ieee semi international semiconductor manufacturing science symposium may 19 22 1991 burlingame ca usa |
| title_sub | may 19 - 22, 1991, Burlingame, CA, USA |
| topic | Computer integrated manufacturing systems Congresses Electronic industries Congresses Semiconductors Design and construction Congresses Integrierte Schaltung (DE-588)4027242-4 gnd Fertigung (DE-588)4016899-2 gnd |
| topic_facet | Computer integrated manufacturing systems Congresses Electronic industries Congresses Semiconductors Design and construction Congresses Integrierte Schaltung Fertigung Konferenzschrift 1991 Burlingame Calif. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003709486&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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