The physics of submicron lithography:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York u.a.
Plenum Pr.
1992
|
| Schriftenreihe: | Microdevices
|
| Schlagworte: | |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XI, 493 S. Ill., graph. Darst. |
| ISBN: | 0306435780 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV005768795 | ||
| 003 | DE-604 | ||
| 005 | 20061025 | ||
| 007 | t | ||
| 008 | 921106s1992 ad|| |||| 00||| engod | ||
| 020 | |a 0306435780 |9 0-306-43578-0 | ||
| 035 | |a (OCoLC)24845420 | ||
| 035 | |a (DE-599)BVBBV005768795 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-11 | ||
| 050 | 0 | |a TK7874 | |
| 082 | 0 | |a 621.381/531 |2 20 | |
| 084 | |a UH 5750 |0 (DE-625)145705: |2 rvk | ||
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 084 | |a ELT 285f |2 stub | ||
| 100 | 1 | |a Valiev, Kamilʹ A. |d 1931- |e Verfasser |0 (DE-588)130569682 |4 aut | |
| 245 | 1 | 0 | |a The physics of submicron lithography |c Kamil A. Valiev |
| 264 | 1 | |a New York u.a. |b Plenum Pr. |c 1992 | |
| 300 | |a XI, 493 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Microdevices | |
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Lithographie par faisceau d'ions | |
| 650 | 7 | |a Lithographie par faisceau d'ions |2 ram | |
| 650 | 4 | |a Lithographie par faisceau d'électrons | |
| 650 | 7 | |a Lithographie par faisceau d'électrons |2 ram | |
| 650 | 4 | |a Lithographie par rayons X | |
| 650 | 7 | |a Lithographie par rayons X |2 ram | |
| 650 | 4 | |a Physique | |
| 650 | 4 | |a Ion beam lithography | |
| 650 | 4 | |a Lithography, Electron beam | |
| 650 | 4 | |a Physics | |
| 650 | 4 | |a X-ray lithography | |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Ionenstrahllithografie |0 (DE-588)4619761-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Röntgenlithografie |0 (DE-588)4178314-1 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Röntgenlithografie |0 (DE-588)4178314-1 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Ionenstrahllithografie |0 (DE-588)4619761-8 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Elektronenstrahllithografie |0 (DE-588)4151897-4 |D s |
| 689 | 3 | |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-003603751 | ||
Datensatz im Suchindex
| _version_ | 1804119952449339392 |
|---|---|
| any_adam_object | |
| author | Valiev, Kamilʹ A. 1931- |
| author_GND | (DE-588)130569682 |
| author_facet | Valiev, Kamilʹ A. 1931- |
| author_role | aut |
| author_sort | Valiev, Kamilʹ A. 1931- |
| author_variant | k a v ka kav |
| building | Verbundindex |
| bvnumber | BV005768795 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UH 5750 ZN 4170 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)24845420 (DE-599)BVBBV005768795 |
| dewey-full | 621.381/531 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/531 |
| dewey-search | 621.381/531 |
| dewey-sort | 3621.381 3531 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02128nam a2200613 c 4500</leader><controlfield tag="001">BV005768795</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20061025 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">921106s1992 ad|| |||| 00||| engod</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0306435780</subfield><subfield code="9">0-306-43578-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)24845420</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV005768795</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/531</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UH 5750</subfield><subfield code="0">(DE-625)145705:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Valiev, Kamilʹ A.</subfield><subfield code="d">1931-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)130569682</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">The physics of submicron lithography</subfield><subfield code="c">Kamil A. Valiev</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York u.a.</subfield><subfield code="b">Plenum Pr.</subfield><subfield code="c">1992</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 493 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Microdevices</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithographie par faisceau d'ions</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Lithographie par faisceau d'ions</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithographie par faisceau d'électrons</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Lithographie par faisceau d'électrons</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithographie par rayons X</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Lithographie par rayons X</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physique</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ion beam lithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithography, Electron beam</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">X-ray lithography</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Ionenstrahllithografie</subfield><subfield code="0">(DE-588)4619761-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Röntgenlithografie</subfield><subfield code="0">(DE-588)4178314-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Röntgenlithografie</subfield><subfield code="0">(DE-588)4178314-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Ionenstrahllithografie</subfield><subfield code="0">(DE-588)4619761-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Elektronenstrahllithografie</subfield><subfield code="0">(DE-588)4151897-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-003603751</subfield></datafield></record></collection> |
| id | DE-604.BV005768795 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T16:34:22Z |
| institution | BVB |
| isbn | 0306435780 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-003603751 |
| oclc_num | 24845420 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-11 |
| owner_facet | DE-91 DE-BY-TUM DE-11 |
| physical | XI, 493 S. Ill., graph. Darst. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | Plenum Pr. |
| record_format | marc |
| series2 | Microdevices |
| spelling | Valiev, Kamilʹ A. 1931- Verfasser (DE-588)130569682 aut The physics of submicron lithography Kamil A. Valiev New York u.a. Plenum Pr. 1992 XI, 493 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Microdevices Literaturangaben Lithographie par faisceau d'ions Lithographie par faisceau d'ions ram Lithographie par faisceau d'électrons Lithographie par faisceau d'électrons ram Lithographie par rayons X Lithographie par rayons X ram Physique Ion beam lithography Lithography, Electron beam Physics X-ray lithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Ionenstrahllithografie (DE-588)4619761-8 gnd rswk-swf Röntgenlithografie (DE-588)4178314-1 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Röntgenlithografie (DE-588)4178314-1 s Ionenstrahllithografie (DE-588)4619761-8 s Elektronenstrahllithografie (DE-588)4151897-4 s |
| spellingShingle | Valiev, Kamilʹ A. 1931- The physics of submicron lithography Lithographie par faisceau d'ions Lithographie par faisceau d'ions ram Lithographie par faisceau d'électrons Lithographie par faisceau d'électrons ram Lithographie par rayons X Lithographie par rayons X ram Physique Ion beam lithography Lithography, Electron beam Physics X-ray lithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd Ionenstrahllithografie (DE-588)4619761-8 gnd Röntgenlithografie (DE-588)4178314-1 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)4151897-4 (DE-588)4619761-8 (DE-588)4178314-1 |
| title | The physics of submicron lithography |
| title_auth | The physics of submicron lithography |
| title_exact_search | The physics of submicron lithography |
| title_full | The physics of submicron lithography Kamil A. Valiev |
| title_fullStr | The physics of submicron lithography Kamil A. Valiev |
| title_full_unstemmed | The physics of submicron lithography Kamil A. Valiev |
| title_short | The physics of submicron lithography |
| title_sort | the physics of submicron lithography |
| topic | Lithographie par faisceau d'ions Lithographie par faisceau d'ions ram Lithographie par faisceau d'électrons Lithographie par faisceau d'électrons ram Lithographie par rayons X Lithographie par rayons X ram Physique Ion beam lithography Lithography, Electron beam Physics X-ray lithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd Ionenstrahllithografie (DE-588)4619761-8 gnd Röntgenlithografie (DE-588)4178314-1 gnd |
| topic_facet | Lithographie par faisceau d'ions Lithographie par faisceau d'électrons Lithographie par rayons X Physique Ion beam lithography Lithography, Electron beam Physics X-ray lithography Fotolithografie Halbleitertechnologie Elektronenstrahllithografie Ionenstrahllithografie Röntgenlithografie |
| work_keys_str_mv | AT valievkamilʹa thephysicsofsubmicronlithography |