Integrated circuit metrology, inspection, and process control V: 4 - 5 March San Jose, California
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | Undetermined |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1991
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
1464 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | X, 630 S. Ill., zahlr. graph. Darst. |
| ISBN: | 0819405639 |
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| 245 | 1 | 0 | |a Integrated circuit metrology, inspection, and process control V |b 4 - 5 March San Jose, California |c William H. Arnold chair/ed. |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1991 | |
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Datensatz im Suchindex
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| adam_text | INTEGRATED CIRCUIT METROLOGY, INSPECTION,
AND PROCESS CONTROL V
Volume
1464
CONTENTS
Conference Committee
................................................................
vii
Introduction
..........................................................................ix
SESSION
1
SEM
METROLOGY I
1464-01
Charging effects in low-voltage
SEM
metrology
K. M. Monahan, J. P.
Benschop,
T.
A. Harris, Signetics Co
.................................... 2
1464-02
Monte Carlo modeling of secondary electron signals from heterogeneous specimens
with nonplanar surfaces
J.
C. Russ,
North Carolina State Univ.; B. W. Dudley, S. K. Jones, Microelectronics Ctr.
of North Carolina
..................................................................... 10
1464-03
Figure of merit for calibration and comparison of linewidth measurement instruments
R. R. Hershey, Motorola, Inc.;
Т. Е.
Zavecz, TEA Systems Corp
...............................22
1464-04
Application of transmission electron detection to x-ray mask calibrations
and inspection
M. T. Postek, R. D. Larrabee, W. J. Keery, E. Marx, National Institute of Standards
and Technology
.......................................................................35
SESSION
2
SEM
METROLOGY II
1464-05
Linewidth measurement comparison between a photometric optical microscope
and a scanning electron microscope backed with Monte Carlo trajectory computations
J. W. Nunn,
N.
P. Turner, National Physical Lab. (UK)
......................................50
1464-06
High-speed stepper setup using a low-voltage
SEM
J. P.
Benschop,
Κ. Μ.
Monahan,
T.
A. Harris, Signetics Co
...................................62
1464-07
Electron-beam metrology: the European initiative
].
J. Jackman, International Business Ctr. Electron Optics/Philips Analytical (Netherlands)
.........71
1464-08
Cross-sectional imaging in
SEM:
signal formation mechanism and CD measurements
L. A.
Firstein,
A. Noz,
RFN
Technology
...................................................81
SESSION
3
ELECTRICAL METROLOGY
1464-09
Extending electrical measurements to the
0.5-μΐη
regime
P. M.
Troceólo,
Intel
Соф.;
L.
С.
Mantalas, Prometrix
Соф.;
R. A.
Allen, L.
Linholm,
National
Institute
of Standards and Technology
.............................................90
1464-10
0.50-μτη
contact measurement and characterization
T. K. Lindsay, K. J. Orvek, Digital Equipment
Соф.;
R. T.
Mumaw, Prometrix Corp
............104
1464-11
Half-micrometer linewidth metrology
S. E. Knight, D. Humphrey, R. R. Bowley, Jr.,
R. M.
Cogley,
ШМ Соф.......................
119
1464-60
Semi
waf
er
metrology project
M. H.
Bennett-Lilley, Texas Instruments Inc.; W. M. Hiatt, Motorola, Inc.; L. J. Lauchlan,
IBM East Fishkill Facility; L. C. Mantalas, Prometrix
Соф.;
H.
Rottmann,
IBM/East
Fishkill Facility; M.
Seliger,
Digital Equipment
Соф.; В.
Singh, Advanced Micro
Devices, Inc.; D. E. Yansen,
BIO-RAD Late.,
be
.......................................... 127
(continued)
SPIE
Vol.
1464
Integrated Circuit Metrology, Inspection, and Process Control V
(19911 /
m
INTEGRATED CIRCUIT METROLOGY, INSPECTION,
AND PROCESS CONTROL V
Volume
1464
1464-43
Computational model of the imaging process in scanning-
χ
microscopy
H. S.
Gallarda,
R. C.
Jain, Univ. of Michigan
..............................................459
1464-44
Submicron linewidth
measurement using an
interferometrie
optical profiler
K. Creath,
WYKO
Corp. and Optical Sciences Ctr./Univ. of Arizona
.........................474
1464-45
X-ray laminography analysis of ultra-fine-pitch solder connections on ultrathin boards
J. A. Adams, Four Pi Systems Corp
......................................................484
SESSION
10
POSTER SESSION II: SPECIAL TOPICS IN PROCESS CONTROL
AND EMERGING TECHNOLOGIES
1464-47
Using an expert system to interface mainframe computing resources with
an interactive video system
R. Carey, S. F. Wible, W. H. Gaynor, T. G. Hendry, Intel
Соф
..............................500
1464-48
Adaptive control of photolithography
O. D. Crisalle, R. A. Soper, D. A. Mellichamp, D. E. Seborg, Univ. of California/
Santa Barbara
........................................................................508
1464-49
Effects of wafer cooling characteristics after post-exposure bake
on critical dimensions
T. L. Lauck,
Varian
Associates; M. Nomura, T.
Omori,
К.
Yoshioka,
Tokyo Electron Ltd. (Japan)
............................................................527
1464-50
Wafer alignment based on existing
microstructures
G. J.
Wynnes,
M.
Hercher, OPTRA,
bc.................................................
539
1464-52
Characterization of wavelength offset for optimization of deep-UV
stepper performance
S. K. Jones, B. W. Dudley,
C. R.
Peters,
M. D.
Kellam,
Microelectronics Ctr.
of North Carolina; E. K. Pavelchek, Shipley Co.,
Inc
........................................546
1464-53
Optical polysilicon over oxide thickness measurement
A. M. Kaiser. Digital Equipment Corp
...................................................554
1464-54
Measuring films on and below polycrystalline silicon using reflectometry
H. L.
Engström,
S. E.
Stokowski, Tencor Instruments
.......................................566
1464-55
Surface roughness effects on light scattered by
submicron
particles on surfaces
E. J. Bawolek,
E. D.
Hirleman, Arizona State Univ
.........................................574
1464-57
In-line wafer inspection using lOO-megapixel-per-second digital image
processing technology
G. Dickerson, R. P. Wallace,
KLA
Instruments Corp
.......................................584
1464-58
Automated wafer inspection in the manufacturing line
J. E.
Harrigan,
ШМ
Corp.;
M. D.
StoUer,
KLA
Instruments
Corp
.............................596
1464-59
Automated approach to the correlation of defect locations to electrical test
results to determine yield-reducing defects
M.
Slama,
National Semiconductor Corp.; A. C. Patterson, Insystems
.........................602
1464-61
Sequential experimentation strategy and response surface methodologies
for photoresist process optimization
G. E. Flores, D. H.
Norbury,
ΚΉ
Chemicals
Inc
.................................
Addendum.................................................................. £28
Author
Index...........................................................
r y„
ì
464
Inte
irat ·-
Circuit Metrology. Inspection, and Process
Contrai
v
і я )1
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| genre_facet | Konferenzschrift 1991 San Jose Calif. |
| id | DE-604.BV005439905 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T16:29:33Z |
| institution | BVB |
| isbn | 0819405639 |
| language | Undetermined |
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| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California William H. Arnold chair/ed. Bellingham, Wash. SPIE 1991 X, 630 S. Ill., zahlr. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1464 Literaturangaben Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Prüftechnik (DE-588)4047610-8 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1991 San Jose Calif. gnd-content Integrierte Schaltung (DE-588)4027242-4 s Prüftechnik (DE-588)4047610-8 s DE-604 Halbleitertechnologie (DE-588)4158814-9 s Arnold, William H. Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1464 (DE-604)BV000010887 1464 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003402936&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Integrierte Schaltung (DE-588)4027242-4 gnd Prüftechnik (DE-588)4047610-8 gnd Halbleitertechnologie (DE-588)4158814-9 gnd |
| subject_GND | (DE-588)4027242-4 (DE-588)4047610-8 (DE-588)4158814-9 (DE-588)1071861417 |
| title | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California |
| title_auth | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California |
| title_exact_search | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California |
| title_full | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California William H. Arnold chair/ed. |
| title_fullStr | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California William H. Arnold chair/ed. |
| title_full_unstemmed | Integrated circuit metrology, inspection, and process control V 4 - 5 March San Jose, California William H. Arnold chair/ed. |
| title_short | Integrated circuit metrology, inspection, and process control V |
| title_sort | integrated circuit metrology inspection and process control v 4 5 march san jose california |
| title_sub | 4 - 5 March San Jose, California |
| topic | Integrierte Schaltung (DE-588)4027242-4 gnd Prüftechnik (DE-588)4047610-8 gnd Halbleitertechnologie (DE-588)4158814-9 gnd |
| topic_facet | Integrierte Schaltung Prüftechnik Halbleitertechnologie Konferenzschrift 1991 San Jose Calif. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003402936&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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