Abstracts: 15 - 17 April 1991, Shanghai, China
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
Oxford u.a.
Pergamon Press
1991
|
| Schriftenreihe: | Vacuum
42,16 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Einzelaufnahme eines Zs.-Heftes |
| Beschreibung: | S. 1031 - 1098 |
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Datensatz im Suchindex
| _version_ | 1804119645638098944 |
|---|---|
| adam_text | VACUUM
TECHNOLOGY APPLICATIONS
AND ION PHYSICS
Volume 42/number
16/1991
Contents
1991
INTERNATIONAL CONFERENCE ON THIN FILM
PHYSICS AND APPLICATIONS, ABSTRACTS
1 5-17
April
1 991,
Shanghai, China
AUTHORS
Wang Yongling and
Xi
Jianzheng
Abstracts
ARTICLES
1031 1991
International Conference on Thin Film Physics and
Applications
( 91
TFPA)—Review
1035
VACUUM DIARY
SOFTWARE SURVEY SECTION
1099
ISSN
0042
207X
VACUAV
42(16) 1029-1102 (1991)
Published by
PERGAMON PRESS
VACUUM
TECHNOLOGY APPLICATIONS
AND ION PHYSICS
Volume 42/number
17/1991
Contents
AUTHORS
A Kay
1103
Zhao Nai-shi,
Li Meng
chun,
1109
Zhao Xiao-jun and Wang Jing-guo
K K Chattopadhyay, A Särkar.
S
Chaudhuri and
А К
Pal
ARTICLES
Multiflow pressure quenching in vacuum furnaces
Direct current (dc)-plasma CVD equipment with auxiliary
heating electrodes
1113
Preparation and optical properties of
Cd, ,
Zn,
Те
films
Y
Aparna.
O Md
Hussain,
Ρ
S Reddy,
1117
В
Srimvasulu
Naiđu
and
Ρ
Jayarama Reddy
Qihua Fan and Yougang Zhang
1121
G
Carter and
M J Nobes
1125
Liao Changgeng. Zheng Zhihao,
1129
Wang Yongqiang, Yang Shengsheng and
Jiang
Hui
A Hoffman and
M Folman
VACUUM NEWS
VACUUM DIARY
BOOK REVIEW
SOFTWARE SURVEY SECTION
1133
1137
1157
1161
Characterization of thin film
n
-CdS p-CuGaobln06Se2
heterojunctions
Magneto-optical TbFeCo media prepared by four-pair target
facing type sputtering apparatus
The principles of a new method of determining ion beam profile
density distribution
Study of boron depth profiles in IPI amorphous silicon films
after thermal annealing using the (p. z) reaction
Effects of oxygen adsorption on the low energy Auger spectrum
of
α
-Cu
-AIO
00)
alloys
ISSN 0O42-2O7X
VACUAV
42(17) 1103^1162 (1991)
Published by
PERGAMON PRESS
VACUUM
TECHNOLOGY APPLICATIONS
AND ION PHYSICS
Volume 42/number
18/1991
Contents
AUTHORS
K J
Reason.
R
S
Spraggs.
1163
R M Gwjlliam. R P
Webb.
B J Sealy and
A De Veirman
INVITED REVIEW
R V
Latham
and N S Xu
REGULAR PAPERS
B
A Brusilovsky
S M
Mokier
and P R
Watson
1173
1183
1187
K A Valiev. A G Vasiliev,
1191
A
AOrlikovskij. A L
Vasiliev. A LGolovin,
R
M Imamov and
N
A Kiselev
J L
Sullivan. S
О
Saied and
I
Bertoti
1203
W
Gericke, M
Höricke
and
1209
J
von Kalben
Y
Liu
and M C
Flowers
1213
U
S Tandon.
В
D
Pant and A Kumar
1219
VACUUM NEWS
VACUUM DIARY
SOFTWARE SURVEY SECTION
VOLUME CONTENTS AND AUTHOR
INDEX, VOLUME
42, 1991
1229
1245
ARTICLES
7990
C R
Burcii
Prize Joint Award Ion beam synthesis ol
epitaxial CoSi? layers
Electron pin-holes : the limiting defect for insulating high
voltages by vacuum, a basis for new cold cathode electron
sources
Study of the ion-induced electron emission from the surface
of a single crystal
New mass spectrometric data to aid etching and growth studies
of GaAs using As and Ga trichlorides
Structure and properties of TiSi2 films on Si, obtained by
Τι
and Si co-evaporation in high vacuum
Effect of ion and neutral sputtering on single crystal TiO2
A detailed study of the moiecular beam flux distribution of
MBE effusion sources
Kinetics of
triode mode
reactive ion etching of Si(1
00)
wafers
by chlorine plasmas: temperature and dc self-bias effects
An overview of X-ray lithography for use in semiconductor
device preparation
ISSN 0042-207X
VACUAV
42(18) 1163-1248 (1991)
Published by
PERGAMON PRESS
|
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| spelling | International Conference on Thin Film Physics and Applications 1 1991 Schanghai Verfasser (DE-588)5063580-3 aut Abstracts 15 - 17 April 1991, Shanghai, China 1991 International Conference on Thin Film Physics and Applications Oxford u.a. Pergamon Press 1991 S. 1031 - 1098 txt rdacontent n rdamedia nc rdacarrier Vacuum 42,16 Einzelaufnahme eines Zs.-Heftes Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1991 Schanghai gnd-content Dünnschichttechnik (DE-588)4136339-5 s DE-604 Vacuum 42,16 (DE-604)BV002571861 42,16 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=003400620&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Abstracts 15 - 17 April 1991, Shanghai, China Vacuum Dünnschichttechnik (DE-588)4136339-5 gnd |
| subject_GND | (DE-588)4136339-5 (DE-588)1071861417 |
| title | Abstracts 15 - 17 April 1991, Shanghai, China |
| title_auth | Abstracts 15 - 17 April 1991, Shanghai, China |
| title_exact_search | Abstracts 15 - 17 April 1991, Shanghai, China |
| title_full | Abstracts 15 - 17 April 1991, Shanghai, China 1991 International Conference on Thin Film Physics and Applications |
| title_fullStr | Abstracts 15 - 17 April 1991, Shanghai, China 1991 International Conference on Thin Film Physics and Applications |
| title_full_unstemmed | Abstracts 15 - 17 April 1991, Shanghai, China 1991 International Conference on Thin Film Physics and Applications |
| title_short | Abstracts |
| title_sort | abstracts 15 17 april 1991 shanghai china |
| title_sub | 15 - 17 April 1991, Shanghai, China |
| topic | Dünnschichttechnik (DE-588)4136339-5 gnd |
| topic_facet | Dünnschichttechnik Konferenzschrift 1991 Schanghai |
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