APA (7th ed.) Citation

(1990). Dry processing for submicrometer lithography: 12 - 13 October 1989, Santa Clara, California. SPIE.

Chicago Style (17th ed.) Citation

Dry Processing for Submicrometer Lithography: 12 - 13 October 1989, Santa Clara, California. Bellingham, Wash: SPIE, 1990.

MLA (9th ed.) Citation

Dry Processing for Submicrometer Lithography: 12 - 13 October 1989, Santa Clara, California. SPIE, 1990.

Warning: These citations may not always be 100% accurate.