Semiconductor cleaning technology 1989: proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Gespeichert in:
| Format: | Tagungsbericht Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Pennington, NJ
Electrochemical Soc.
1990
|
| Schriftenreihe: | Electrochemical Society: Proceedings
1990,9 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | X, 399 S. graph. Darst. |
Internformat
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| 245 | 1 | 0 | |a Semiconductor cleaning technology 1989 |b proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |c ed. by Jerzy Ruzyllo ... |
| 264 | 1 | |a Pennington, NJ |b Electrochemical Soc. |c 1990 | |
| 300 | |a X, 399 S. |b graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Electrochemical Society: Proceedings |v 1990,9 | |
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Semiconductor wafers |x Cleaning |v Congresses | |
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| 700 | 1 | |a Ruzyllo, Jerzy |e Sonstige |4 oth | |
| 711 | 2 | |a International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |n 1 |d 1989 |c Hollywood, Fla. |j Sonstige |0 (DE-588)1400217-6 |4 oth | |
| 830 | 0 | |a Electrochemical Society: Proceedings |v 1990,9 |w (DE-604)BV001900941 |9 1990,9 | |
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Datensatz im Suchindex
| _version_ | 1804118836354482176 |
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| adam_text | TABLE
OF CONTEHTS
Preface
iii
Overview
THE EVOLUTIONS OF SILICON WAFER CLEANING
TECHNOLOGY, W. Kern (Invited)
Wet Cleaning Technology
21
CLEANING TECHNOLOGIES FOR HIGH-VOLUME PRODUCTION
OF SILICON WAFERS, W. C. Krusell and D. I. Golland
23
(Invited)
WET CHEMICAL PROCESSING IN A TRENCH,
C. M.
Tipton
and
R.
A. Bowling (Invited)
33
INVESTIGATION OF H2SOS:H2O2 AND DILUTE HF SILICON
WAFER CLEANING PROCESSES, L.
A. Zazzera,
L. S.
Becker,
P.
E. Soboi,
W. J.
Eberle,
and
W.
Katz
43
METALLIC CONTAMINATION ON Si WAFERS FROM CLEANING
SOLUTIONS, J. At
sumi,
S.
Ohtsuka,
S.
Munehira, and
K. Kajiyama
59
ADVANTAGES AND LIMITS OF WET ETCHING PROCESS IN
SPRAY EQUIPMENT, D. Ross
67
CLEANING MECHANISM OF Si WAFER SURFACES BY THE
SLIGHT ETCH METHOD, R. Takizawa and A. Ohsawa
75
THE USE OF REPROCESSED HF IN SEMICONDUCTOR QUARTZ
AND WAFER CLEANING OPERATIONS, J. Davison,
С
Hsu,
E.
Trautmann,
and H. Lee
83
Dry Cleaning Technology
93
WAFER DRY CLEANING USING DILUTED ANHYDROUS
HYDROGEN FLUORIDE GAS, T.
Ohmi,
N.
Miki,
H.
Kikuyama, I. Kawanabe, and M. Miyashita
(Invited)
95
A REVIEW OF UV/OZONE CLEANING TECHNOLOGY,
J. R.
Vig
(invited)
105
UV-ENHANCED DRY CLEANING OF SILICON WAFERS,
T.
Ito,
R.
sugino,
S. Watanabe, Y.
Nara, anđ
Y. Sato
(Invited)
114
SEQUENTIAL VAPOR-PHASE WAFER CLEANING AND
THIN FILM DEPOSITION, B. E. Deal, M. A. McNeilly,
D. B.
Kao,
and J.
M. de Larios
121
SURFACE DAMAGE DURING REMOTE PLASMA CLEANING
OF SILICON WAFERS, D. G. Frystak and J. Ruzyllo
129
ELIMINATION OF METAL CONTAMINATION FROM
PHOTORESIST BY USING THE OZONE ASHING TECHNIQUE,
S. Onishi, K. Matsuda, K. Tanaka, and K. Sakiyama
141
ETCH PROPERTIES OF THERMALLY OXIDIZED SILICON
NITRIDE. COMPARISON OF WET AND DRY ETCHING
METHODS, L. M. Lowenstein and
C. M.
Tipton 148
EFFECTS OF LOW CONCENTRATION O2 IN N, ON Si
SURFACE CLEANING FOR SOLID PHASE EPITAXY,
Y. Kunii
156
PARTICLES AND AIRBORNE CONTAMINANTS
165
REVIEW OF PARTICLE CONTROL METHODS DURING WET
CHEMICAL CLEANING OF SILICON WAFERS, V. B. Menon
and R. P. Donovan (Invited)
167
ULTRACLEAN ICE SCRUBBER CLEANING WITH JETTING
FINE ICE PARTICLES, T. Ohmori, T. Fukumoto,
T.
Kato,
M.
Tada,
and
T. Kawaguchi
(Invited)
182
vi
STATISTICAL CONTRIBUTIONS TO THE SIZING OF
PARTICULATES ON WAFERS BY LIGHT SCATTERING,
S. Saadat, G. Kren, A. Neukermans, and J.
Pecen
192
AIRBORNE CONCENTRATIONS OF ORGANIC VAPORS AND
THEIR SURFACE ACCUMULATIONS ON WAFERS DURING
PROCESSING IN CLEAN ROOMS, A. J.
Muller,
L. A. Psota-Kelty,
3.
D.
Sinclair and
P. W. Morrison
204
CHARACTERIZATION OF CLEANING
213
SURFACE COMPOSITION AND MORPHOLOGY OF Si WAFERS
AFTER WET CHEMICAL TREATMENTS, M.
Grundner,
P. O.
Hahn,
I. Lampert, A. Schnegg, and H. Jacob
(Invited)
215
ANALYSIS OF TRACE IMPURITIES ON WAFERS FROM
CLEANING,
R. S.
Hockett (Invited)
227
IMPURITY ANALYSIS ON SILICON WAFER BY MONOCHRO
TRXRF, K. Nishihagi and A. Kawabata
243
A DIFFERENTIAL REFLECTANCE STUDY OF THE CLEANING
OF A SILICON SURFACE IN HYDROGEN FLUORIDE
SOLUTIONS, U. S. Pahk and E. A. Irene
251
AUGER CHARACTERIZATION OF SILICON SURFACE CLEANED
WITH H2O2
SOLUTION,
P. M.
Parimi
and
V. P. Sundarsingh
260
AN ANALYSIS FOR CLEANED SILICON SURFACE WITH
THERMAL
DESORPTION
SPECTROSCOPY,
N.
Yabumoto,
K. Minegishi, K.
Saito,
M.
Morita, and T.
Ohmi
265
SURFACE
CHARGE ANALYSIS: A NEW METHOD TO
CHARACTERIZE SEMICONDUCTOR/INSULATOR STRUCTURES:
APPLICATION TO SILICON/OXIDE SYSTEM,
E. Kamieniecki
273
vii
CLEANING BEFORE THERMAL OXIDATION
281
THE EFFECT OF AQUEOUS CHEMICAL TREATMENTS ON Si
SURFACE CHEMISTRY AND OXIDATION KINETICS,
C. R. Helms, B. E. Deal, J. M. deLarios,
and D. B.
Kao
(Invited)
283
THE IMPACT OF Si SURFACE CHARACTERISTICS ON
MOS
DEVICE YIELD, M.
Heyns,
С.
Hasenack,
R.
DeKeersmaecker,
and R. Falster
(Invited)
293
THE INFLUENCE OF CLEANING ON THE OXIDATION
MECHANISM OF SILICON, J.J. van Oekel
306
INFLUENCE OF THE PREOXIDATION CLEANING PROCEDURE
ON OXIDE GROWTH RATE AND THE CHARACTERISTICS OF
SUBOXIDE STATES,
Z. M.
Ling,
L. H.
Dupas,
К.
M.
DeMeyer,
J.
Portillo, and
W.
Vandervorst
313
OXIDATION OF SILICON IN AIR OR NITROGEN AFTER
VARIOUS HF ETCHES, P. A. M. van
der Heide,
H.
W. L.
Liñdelauf,
and H. J.
Ronde
321
AGING OF HYDROPHILIC Si SURFACES AND ROUGHNESS
OF THE Si/SiOj INTERFACE AFTER THERMAL OXIDATION,
M. Grundner, P. O.
Hahn
and I. Lampert
328
EFFECT OF SILICON WAFER CLEANING ON
PRE-
AND
POST-THERMAL OXIDATION CHARGES, A. Resnick,
E. Kamieniecki, A. Philipossian, and D. Jackson
335
REMOVAL OF SURFACE ORGANIC CONTAMINANTS DURING
THERMAL OXIDATION OF SILICON,
S. D.
Hossain,
C. G.
Pantano
and J. Ruzyllo
341
THE EFFECT OF AMBIENT AIR INFILTRATION ON GROWTH
RATE AND ELECTRICAL CHARACTERISTICS OF ULTRATHIN
SILICON DIOXIDE GATE INSULATORS, A. Philipossian,
D. Jackson, E. Kamieniecki, and A. Resnick
357
viii
CLEANING OF III
-
V SEMICONDUCTORS
369
EPI
GaAs SURFACE TREATMENT
-
IMPACT OF MIXED
PHASES ON DEVICE PERFORMANCE, A. D. Warren
and J. M. Woodall (Invited)
371
PROCESS DAMAGE AND CONTAMINATION EFFECTS ON
SHALLOW SILICON IMPLANTED GaAs
,
H.
Baratte,
G. J.
Scilla,
T.
N.
Jackson,
A. J. Fleischman,
H. J. Hovel, and F. Cardone
377
IN-SITU
SPECTROSCOPIC ELLIPSOMETRY
STUDY OF
THE CLEANING OF InP SURFACES,
X. LÍU
and
E. A. Irene
383
AUTHOR INDEX
393
SUBJECT INDEX
395
ix
Author Index
Atsumi
,
j
.
59
Kawaguchi,
T.
182
Baratte, H.
377
Kawanabe
, Ι
.
95
Becker,
L. S.
43
Kern,
W.
3
Bowling, R.
Α.
33
Kikuyama
,
Η
.
95
Cardone
,
F
.
377
Kren,
G.
192
Davison, J.
83
Kruseli,
W.
С.
23
de Larios,
J. M.
121,283
Kunii,
У.
156
Deal,
B. E.
121,283
Lampert
,
I
.
215,328
DeKeersmaecker
,
R.
293
bee,
Η.
83
DeMeyer,
K. M.
313
Lindelauf,
H. W. L.
321
Donovan,
R. P.
167
Ling,
Z. M.
313
Dupas,
L. H.
313
Liu, X.
383
Eberle,
W. J.
43
Lowenstein,
L.
M.
148
Falster, R.
293
Matsuda, K.
141
Fleischman,
Α.
377
McNeilly, M. A.
121
Fry
stak,
D. G.
129
Menon,
V.
B.
167
Fukumoto,
T.
182
Miki,
N.
95
Gollanđ,
D. I.
23
Minegishi, K.
265
Grundner,
M.
215,328
Miyashita, M.
95
Hahn,
P.
о.
215,328
Mor
ita,
M.
265
Hasenack,
С.
293
Morrison,
P.
W.
204
Helms,
C. R.
283
Muller,
A.
J.
204
Heyns,
M.
293
Munehira, S.
59
Hockett,
R. S.
227
Nara,
Y
114
Hossain, S.
D.
341
Neukermans
,
A
.
192
Hovel, H.
377
Nishihagi, K.
243
Hsu,
С.
83
Ohmi
,
Τ
.
95,265
Irene, E.
Α.
251,383
Ohmori, T.
182
Ito,
T.
114
Ohsawa, A.
75
Jackson, D.
335,357
Ohtsuka
,
S
.
59
Jackson, T.
377
Onishi, S.
141
Jacob, H.
215
Pahk, U. S.
251
Kajiyama, K.
59
Pantano
,
С
.
G
.
341
KamienieckijE.
273
,335,357
Parimi,
P. M.
260
Kao,
D. B.
121,283
Pecen
,
J
.
192
Kato,
T.
182
Philipossian, A.
335,357
Katz, W.
43
Portillo, J.
313
Kawabata,
Α.
243
Psota-Kelty,
L.
Α.
204
393
Resnick, A.
335,357
Ronde, H.
J.
321
ROSS,
D.
67
Ruzyllo,
J.
129,341
Saadat,
S.
192
Saito,
К.
265
Sakiyama
141
Sato,
Y.
114
Schnegg, A.
215
Scilla,
G.
377
Sinclair, J.
D.
204
Snee,
P. M.
306
Sobol,
P.
E.
43
Sugino,
R.
114
Sundarsingh,
V.
P.
260
Tada,
M.
182
Takizawa, R.
75
Tanaka,
К.
141
Tipton,
С.
M.
33,148
Trautmann,
E.
83
van der Heide,
P.A.M.
321
van Oekel,
J. J.
306
Vandervorst,
W.
313
Vig,
J. R.
105
Warren,
A. D.
371
Watanabe,
S.
114
Woodall,
J. M.
371
Yabumoto,
N. 265
Zazzera, L.
Α.
43
394
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| genre | (DE-588)1071861417 Konferenzschrift 1989 Hollywood Fla. gnd-content |
| genre_facet | Konferenzschrift 1989 Hollywood Fla. |
| id | DE-604.BV004719434 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T16:16:37Z |
| institution | BVB |
| institution_GND | (DE-588)1400217-6 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-002900215 |
| oclc_num | 21562780 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | X, 399 S. graph. Darst. |
| publishDate | 1990 |
| publishDateSearch | 1990 |
| publishDateSort | 1990 |
| publisher | Electrochemical Soc. |
| record_format | marc |
| series | Electrochemical Society: Proceedings |
| series2 | Electrochemical Society: Proceedings |
| spelling | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. by Jerzy Ruzyllo ... Pennington, NJ Electrochemical Soc. 1990 X, 399 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Electrochemical Society: Proceedings 1990,9 Literaturangaben Semiconductor wafers Cleaning Congresses Oberflächenreinigung (DE-588)4204243-4 gnd rswk-swf Wafer (DE-588)4294605-0 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1989 Hollywood Fla. gnd-content Wafer (DE-588)4294605-0 s Oberflächenreinigung (DE-588)4204243-4 s DE-604 Ruzyllo, Jerzy Sonstige oth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing 1 1989 Hollywood, Fla. Sonstige (DE-588)1400217-6 oth Electrochemical Society: Proceedings 1990,9 (DE-604)BV001900941 1990,9 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=002900215&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing Electrochemical Society: Proceedings Semiconductor wafers Cleaning Congresses Oberflächenreinigung (DE-588)4204243-4 gnd Wafer (DE-588)4294605-0 gnd |
| subject_GND | (DE-588)4204243-4 (DE-588)4294605-0 (DE-588)1071861417 |
| title | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
| title_auth | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
| title_exact_search | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
| title_full | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. by Jerzy Ruzyllo ... |
| title_fullStr | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. by Jerzy Ruzyllo ... |
| title_full_unstemmed | Semiconductor cleaning technology 1989 proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. by Jerzy Ruzyllo ... |
| title_short | Semiconductor cleaning technology 1989 |
| title_sort | semiconductor cleaning technology 1989 proceedings of the first international symposium on cleaning technology in semiconductor device manufacturing |
| title_sub | proceedings of the first International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
| topic | Semiconductor wafers Cleaning Congresses Oberflächenreinigung (DE-588)4204243-4 gnd Wafer (DE-588)4294605-0 gnd |
| topic_facet | Semiconductor wafers Cleaning Congresses Oberflächenreinigung Wafer Konferenzschrift 1989 Hollywood Fla. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=002900215&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV001900941 |
| work_keys_str_mv | AT ruzyllojerzy semiconductorcleaningtechnology1989proceedingsofthefirstinternationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturing AT internationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturinghollywoodfla semiconductorcleaningtechnology1989proceedingsofthefirstinternationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturing |