Semiconductor lithography: principles, practices, and materials
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York u.a.
Plenum Pr.
1989
|
| Ausgabe: | 2. print. |
| Schriftenreihe: | Microdevices.
|
| Schlagworte: | |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XX, 931 S. Ill., zahlr. graph. Darst. |
| ISBN: | 0306421852 |
Internformat
MARC
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| 100 | 1 | |a Moreau, Wayne M. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Semiconductor lithography |b principles, practices, and materials |c Wayne M. Moreau |
| 250 | |a 2. print. | ||
| 264 | 1 | |a New York u.a. |b Plenum Pr. |c 1989 | |
| 300 | |a XX, 931 S. |b Ill., zahlr. graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Microdevices. | |
| 500 | |a Literaturangaben | ||
| 650 | 0 | 7 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 1 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 1 | |8 1\p |5 DE-604 | |
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-002764067 | |
Datensatz im Suchindex
| _version_ | 1818964545387888640 |
|---|---|
| adam_text | |
| any_adam_object | |
| author | Moreau, Wayne M. |
| author_facet | Moreau, Wayne M. |
| author_role | aut |
| author_sort | Moreau, Wayne M. |
| author_variant | w m m wm wmm |
| building | Verbundindex |
| bvnumber | BV004458593 |
| classification_rvk | UP 3100 ZN 4800 |
| ctrlnum | (OCoLC)611921999 (DE-599)BVBBV004458593 |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | 2. print. |
| format | Book |
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| id | DE-604.BV004458593 |
| illustrated | Illustrated |
| indexdate | 2024-12-20T13:02:49Z |
| institution | BVB |
| isbn | 0306421852 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-002764067 |
| oclc_num | 611921999 |
| open_access_boolean | |
| owner | DE-384 DE-11 DE-20 |
| owner_facet | DE-384 DE-11 DE-20 |
| physical | XX, 931 S. Ill., zahlr. graph. Darst. |
| publishDate | 1989 |
| publishDateSearch | 1989 |
| publishDateSort | 1989 |
| publisher | Plenum Pr. |
| record_format | marc |
| series2 | Microdevices. |
| spelling | Moreau, Wayne M. Verfasser aut Semiconductor lithography principles, practices, and materials Wayne M. Moreau 2. print. New York u.a. Plenum Pr. 1989 XX, 931 S. Ill., zahlr. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Microdevices. Literaturangaben Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s DE-604 Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Integrierte Schaltung (DE-588)4027242-4 s 1\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Moreau, Wayne M. Semiconductor lithography principles, practices, and materials Integrierte Schaltung (DE-588)4027242-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4027242-4 (DE-588)4174516-4 (DE-588)4191584-7 |
| title | Semiconductor lithography principles, practices, and materials |
| title_auth | Semiconductor lithography principles, practices, and materials |
| title_exact_search | Semiconductor lithography principles, practices, and materials |
| title_full | Semiconductor lithography principles, practices, and materials Wayne M. Moreau |
| title_fullStr | Semiconductor lithography principles, practices, and materials Wayne M. Moreau |
| title_full_unstemmed | Semiconductor lithography principles, practices, and materials Wayne M. Moreau |
| title_short | Semiconductor lithography |
| title_sort | semiconductor lithography principles practices and materials |
| title_sub | principles, practices, and materials |
| topic | Integrierte Schaltung (DE-588)4027242-4 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Integrierte Schaltung Fotolithografie Halbleitertechnologie Lithografie Halbleitertechnologie |
| work_keys_str_mv | AT moreauwaynem semiconductorlithographyprinciplespracticesandmaterials |