APA-Zitierstil (7. Ausg.)

(1990). Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies IX ; 7 - 8 March 1990 San Jose, California. SPIE.

Chicago-Zitierstil (17. Ausg.)

Electron-beam, X-ray, and Ion-beam Technology: Submicrometer Lithographies IX ; 7 - 8 March 1990 San Jose, California. Bellingham, Wash: SPIE, 1990.

MLA-Zitierstil (9. Ausg.)

Electron-beam, X-ray, and Ion-beam Technology: Submicrometer Lithographies IX ; 7 - 8 March 1990 San Jose, California. SPIE, 1990.