High vacuum production in the microelectronics industry:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Amsterdam u.a.
Elsevier Science Publ.
1988
|
| Schriftenreihe: | Plasma technology
2 |
| Schlagworte: | |
| Beschreibung: | XIII, 222 S. Ill., graph. Darst. |
| ISBN: | 044442878X |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV003712153 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 900813s1988 ad|| |||| 00||| eng d | ||
| 020 | |a 044442878X |9 0-444-42878-X | ||
| 035 | |a (OCoLC)20391196 | ||
| 035 | |a (DE-599)BVBBV003712153 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-11 | ||
| 050 | 0 | |a TS695 | |
| 082 | 0 | |a 671.7/35 |2 20 | |
| 084 | |a ELT 008f |2 stub | ||
| 084 | |a ELT 340f |2 stub | ||
| 084 | |a MAS 970f |2 stub | ||
| 100 | 1 | |a Duval, Pierre |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a High vacuum production in the microelectronics industry |
| 264 | 1 | |a Amsterdam u.a. |b Elsevier Science Publ. |c 1988 | |
| 300 | |a XIII, 222 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Plasma technology |v 2 | |
| 650 | 4 | |a Vacuum microelectronics | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a Fertigung |0 (DE-588)4016899-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Hochvakuumtechnik |0 (DE-588)4160304-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Vakuumtechnik |0 (DE-588)4062270-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 0 | 1 | |a Fertigung |0 (DE-588)4016899-2 |D s |
| 689 | 0 | 2 | |a Hochvakuumtechnik |0 (DE-588)4160304-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Vakuumtechnik |0 (DE-588)4062270-8 |D s |
| 689 | 1 | 1 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 1 | |5 DE-604 | |
| 830 | 0 | |a Plasma technology |v 2 |w (DE-604)BV001897163 |9 2 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-002362759 | ||
Datensatz im Suchindex
| _version_ | 1804118056965767168 |
|---|---|
| any_adam_object | |
| author | Duval, Pierre |
| author_facet | Duval, Pierre |
| author_role | aut |
| author_sort | Duval, Pierre |
| author_variant | p d pd |
| building | Verbundindex |
| bvnumber | BV003712153 |
| callnumber-first | T - Technology |
| callnumber-label | TS695 |
| callnumber-raw | TS695 |
| callnumber-search | TS695 |
| callnumber-sort | TS 3695 |
| callnumber-subject | TS - Manufactures |
| classification_tum | ELT 008f ELT 340f MAS 970f |
| ctrlnum | (OCoLC)20391196 (DE-599)BVBBV003712153 |
| dewey-full | 671.7/35 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 671 - Metalworking & primary metal products |
| dewey-raw | 671.7/35 |
| dewey-search | 671.7/35 |
| dewey-sort | 3671.7 235 |
| dewey-tens | 670 - Manufacturing |
| discipline | Elektrotechnik Werkstoffwissenschaften / Fertigungstechnik Maschinenbau |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01616nam a2200493 cb4500</leader><controlfield tag="001">BV003712153</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">900813s1988 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">044442878X</subfield><subfield code="9">0-444-42878-X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)20391196</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV003712153</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TS695</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">671.7/35</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 008f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 340f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">MAS 970f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Duval, Pierre</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">High vacuum production in the microelectronics industry</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Amsterdam u.a.</subfield><subfield code="b">Elsevier Science Publ.</subfield><subfield code="c">1988</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIII, 222 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Plasma technology</subfield><subfield code="v">2</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vacuum microelectronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fertigung</subfield><subfield code="0">(DE-588)4016899-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Hochvakuumtechnik</subfield><subfield code="0">(DE-588)4160304-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Vakuumtechnik</subfield><subfield code="0">(DE-588)4062270-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Fertigung</subfield><subfield code="0">(DE-588)4016899-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Hochvakuumtechnik</subfield><subfield code="0">(DE-588)4160304-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Vakuumtechnik</subfield><subfield code="0">(DE-588)4062270-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Plasma technology</subfield><subfield code="v">2</subfield><subfield code="w">(DE-604)BV001897163</subfield><subfield code="9">2</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-002362759</subfield></datafield></record></collection> |
| id | DE-604.BV003712153 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T16:04:14Z |
| institution | BVB |
| isbn | 044442878X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-002362759 |
| oclc_num | 20391196 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-11 |
| owner_facet | DE-91 DE-BY-TUM DE-11 |
| physical | XIII, 222 S. Ill., graph. Darst. |
| publishDate | 1988 |
| publishDateSearch | 1988 |
| publishDateSort | 1988 |
| publisher | Elsevier Science Publ. |
| record_format | marc |
| series | Plasma technology |
| series2 | Plasma technology |
| spelling | Duval, Pierre Verfasser aut High vacuum production in the microelectronics industry Amsterdam u.a. Elsevier Science Publ. 1988 XIII, 222 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Plasma technology 2 Vacuum microelectronics Vapor-plating Fertigung (DE-588)4016899-2 gnd rswk-swf Hochvakuumtechnik (DE-588)4160304-7 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Vakuumtechnik (DE-588)4062270-8 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 s Fertigung (DE-588)4016899-2 s Hochvakuumtechnik (DE-588)4160304-7 s DE-604 Vakuumtechnik (DE-588)4062270-8 s Plasma technology 2 (DE-604)BV001897163 2 |
| spellingShingle | Duval, Pierre High vacuum production in the microelectronics industry Plasma technology Vacuum microelectronics Vapor-plating Fertigung (DE-588)4016899-2 gnd Hochvakuumtechnik (DE-588)4160304-7 gnd Mikroelektronik (DE-588)4039207-7 gnd Vakuumtechnik (DE-588)4062270-8 gnd |
| subject_GND | (DE-588)4016899-2 (DE-588)4160304-7 (DE-588)4039207-7 (DE-588)4062270-8 |
| title | High vacuum production in the microelectronics industry |
| title_auth | High vacuum production in the microelectronics industry |
| title_exact_search | High vacuum production in the microelectronics industry |
| title_full | High vacuum production in the microelectronics industry |
| title_fullStr | High vacuum production in the microelectronics industry |
| title_full_unstemmed | High vacuum production in the microelectronics industry |
| title_short | High vacuum production in the microelectronics industry |
| title_sort | high vacuum production in the microelectronics industry |
| topic | Vacuum microelectronics Vapor-plating Fertigung (DE-588)4016899-2 gnd Hochvakuumtechnik (DE-588)4160304-7 gnd Mikroelektronik (DE-588)4039207-7 gnd Vakuumtechnik (DE-588)4062270-8 gnd |
| topic_facet | Vacuum microelectronics Vapor-plating Fertigung Hochvakuumtechnik Mikroelektronik Vakuumtechnik |
| volume_link | (DE-604)BV001897163 |
| work_keys_str_mv | AT duvalpierre highvacuumproductioninthemicroelectronicsindustry |