Dry etching for microelectronics:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Amsterdam u.a.
North-Holland Phys. Publ.
1984
|
| Schriftenreihe: | Materials processing
4 |
| Schlagworte: | |
| Beschreibung: | XI, 299 S. Ill., graph. Darst. |
| ISBN: | 0444869050 |
Internformat
MARC
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| 245 | 1 | 0 | |a Dry etching for microelectronics |c ed. by Ronald A. Powell |
| 264 | 1 | |a Amsterdam u.a. |b North-Holland Phys. Publ. |c 1984 | |
| 300 | |a XI, 299 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Materials processing |v 4 | |
| 650 | 4 | |a Plasma etching | |
| 650 | 4 | |a Semiconductors |x Etching | |
| 650 | 0 | 7 | |a Trockenätzen |0 (DE-588)4222074-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
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| 689 | 1 | 1 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
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Datensatz im Suchindex
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| building | Verbundindex |
| bvnumber | BV002314891 |
| callnumber-first | T - Technology |
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| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UP 3100 UP 3250 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)10913832 (DE-599)BVBBV002314891 |
| dewey-full | 621.381/73 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/73 |
| dewey-search | 621.381/73 |
| dewey-sort | 3621.381 273 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV002314891 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:43:51Z |
| institution | BVB |
| isbn | 0444869050 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001519452 |
| oclc_num | 10913832 |
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| owner_facet | DE-91 DE-BY-TUM DE-384 DE-355 DE-BY-UBR DE-706 DE-83 DE-11 |
| physical | XI, 299 S. Ill., graph. Darst. |
| psigel | TUB-nseb |
| publishDate | 1984 |
| publishDateSearch | 1984 |
| publishDateSort | 1984 |
| publisher | North-Holland Phys. Publ. |
| record_format | marc |
| series | Materials processing |
| series2 | Materials processing |
| spelling | Dry etching for microelectronics ed. by Ronald A. Powell Amsterdam u.a. North-Holland Phys. Publ. 1984 XI, 299 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials processing 4 Plasma etching Semiconductors Etching Trockenätzen (DE-588)4222074-9 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Ionenstrahlätzen (DE-588)4162299-6 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 s Trockenätzen (DE-588)4222074-9 s DE-604 Ionenstrahlätzen (DE-588)4162299-6 s Mikroelektronik (DE-588)4039207-7 s Powell, Ronald A. Sonstige oth Materials processing 4 (DE-604)BV001899942 4 |
| spellingShingle | Dry etching for microelectronics Materials processing Plasma etching Semiconductors Etching Trockenätzen (DE-588)4222074-9 gnd Mikroelektronik (DE-588)4039207-7 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Ionenstrahlätzen (DE-588)4162299-6 gnd |
| subject_GND | (DE-588)4222074-9 (DE-588)4039207-7 (DE-588)4158814-9 (DE-588)4162299-6 |
| title | Dry etching for microelectronics |
| title_auth | Dry etching for microelectronics |
| title_exact_search | Dry etching for microelectronics |
| title_full | Dry etching for microelectronics ed. by Ronald A. Powell |
| title_fullStr | Dry etching for microelectronics ed. by Ronald A. Powell |
| title_full_unstemmed | Dry etching for microelectronics ed. by Ronald A. Powell |
| title_short | Dry etching for microelectronics |
| title_sort | dry etching for microelectronics |
| topic | Plasma etching Semiconductors Etching Trockenätzen (DE-588)4222074-9 gnd Mikroelektronik (DE-588)4039207-7 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Ionenstrahlätzen (DE-588)4162299-6 gnd |
| topic_facet | Plasma etching Semiconductors Etching Trockenätzen Mikroelektronik Halbleitertechnologie Ionenstrahlätzen |
| volume_link | (DE-604)BV001899942 |
| work_keys_str_mv | AT powellronalda dryetchingformicroelectronics |