Glow discharge processes: sputtering and plasma etching
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
Wiley
1980
|
| Schriftenreihe: | A Wiley-Interscience publication
|
| Schlagworte: | |
| Beschreibung: | XV, 406 S. Ill., graph. Darst. |
| ISBN: | 047107828X |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV002268641 | ||
| 003 | DE-604 | ||
| 005 | 20210914 | ||
| 007 | t | ||
| 008 | 890928s1980 ad|| |||| 00||| eng d | ||
| 020 | |a 047107828X |9 0-471-07828-X | ||
| 035 | |a (OCoLC)833904903 | ||
| 035 | |a (DE-599)BVBBV002268641 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-384 |a DE-Aug4 |a DE-355 |a DE-20 |a DE-703 |a DE-19 |a DE-1050 |a DE-526 |a DE-83 | ||
| 050 | 0 | |a QC702.7.P6 | |
| 082 | 0 | |a 537.5/2 | |
| 084 | |a UR 6000 |0 (DE-625)146639: |2 rvk | ||
| 084 | |a ZN 3400 |0 (DE-625)157307: |2 rvk | ||
| 100 | 1 | |a Chapman, Brian |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Glow discharge processes |b sputtering and plasma etching |c Brian Chapman |
| 264 | 1 | |a New York [u.a.] |b Wiley |c 1980 | |
| 300 | |a XV, 406 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a A Wiley-Interscience publication | |
| 650 | 4 | |a Glow discharges | |
| 650 | 4 | |a Plasma etching | |
| 650 | 4 | |a Sputtering (Physics) | |
| 650 | 0 | 7 | |a Glimmentladung |0 (DE-588)4157609-3 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Gasentladung |0 (DE-588)4139645-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Zerstäubung |0 (DE-588)4067687-0 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Glimmentladung |0 (DE-588)4157609-3 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Zerstäubung |0 (DE-588)4067687-0 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Gasentladung |0 (DE-588)4139645-5 |D s |
| 689 | 2 | |5 DE-604 | |
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-001490657 | |
Datensatz im Suchindex
| _version_ | 1809768295469940736 |
|---|---|
| adam_text | |
| any_adam_object | |
| author | Chapman, Brian |
| author_facet | Chapman, Brian |
| author_role | aut |
| author_sort | Chapman, Brian |
| author_variant | b c bc |
| building | Verbundindex |
| bvnumber | BV002268641 |
| callnumber-first | Q - Science |
| callnumber-label | QC702 |
| callnumber-raw | QC702.7.P6 |
| callnumber-search | QC702.7.P6 |
| callnumber-sort | QC 3702.7 P6 |
| callnumber-subject | QC - Physics |
| classification_rvk | UR 6000 ZN 3400 |
| ctrlnum | (OCoLC)833904903 (DE-599)BVBBV002268641 |
| dewey-full | 537.5/2 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 537 - Electricity and electronics |
| dewey-raw | 537.5/2 |
| dewey-search | 537.5/2 |
| dewey-sort | 3537.5 12 |
| dewey-tens | 530 - Physics |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00000nam a2200000 c 4500</leader><controlfield tag="001">BV002268641</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20210914</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1980 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">047107828X</subfield><subfield code="9">0-471-07828-X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)833904903</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002268641</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-384</subfield><subfield code="a">DE-Aug4</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-1050</subfield><subfield code="a">DE-526</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">QC702.7.P6</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">537.5/2</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UR 6000</subfield><subfield code="0">(DE-625)146639:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 3400</subfield><subfield code="0">(DE-625)157307:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Chapman, Brian</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Glow discharge processes</subfield><subfield code="b">sputtering and plasma etching</subfield><subfield code="c">Brian Chapman</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York [u.a.]</subfield><subfield code="b">Wiley</subfield><subfield code="c">1980</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XV, 406 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">A Wiley-Interscience publication</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Glow discharges</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Sputtering (Physics)</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Glimmentladung</subfield><subfield code="0">(DE-588)4157609-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Gasentladung</subfield><subfield code="0">(DE-588)4139645-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Zerstäubung</subfield><subfield code="0">(DE-588)4067687-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Glimmentladung</subfield><subfield code="0">(DE-588)4157609-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Zerstäubung</subfield><subfield code="0">(DE-588)4067687-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Gasentladung</subfield><subfield code="0">(DE-588)4139645-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001490657</subfield></datafield></record></collection> |
| id | DE-604.BV002268641 |
| illustrated | Illustrated |
| indexdate | 2024-09-10T00:52:21Z |
| institution | BVB |
| isbn | 047107828X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001490657 |
| oclc_num | 833904903 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-384 DE-Aug4 DE-355 DE-BY-UBR DE-20 DE-703 DE-19 DE-BY-UBM DE-1050 DE-526 DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-384 DE-Aug4 DE-355 DE-BY-UBR DE-20 DE-703 DE-19 DE-BY-UBM DE-1050 DE-526 DE-83 |
| physical | XV, 406 S. Ill., graph. Darst. |
| publishDate | 1980 |
| publishDateSearch | 1980 |
| publishDateSort | 1980 |
| publisher | Wiley |
| record_format | marc |
| series2 | A Wiley-Interscience publication |
| spelling | Chapman, Brian Verfasser aut Glow discharge processes sputtering and plasma etching Brian Chapman New York [u.a.] Wiley 1980 XV, 406 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier A Wiley-Interscience publication Glow discharges Plasma etching Sputtering (Physics) Glimmentladung (DE-588)4157609-3 gnd rswk-swf Gasentladung (DE-588)4139645-5 gnd rswk-swf Zerstäubung (DE-588)4067687-0 gnd rswk-swf Glimmentladung (DE-588)4157609-3 s DE-604 Zerstäubung (DE-588)4067687-0 s Gasentladung (DE-588)4139645-5 s |
| spellingShingle | Chapman, Brian Glow discharge processes sputtering and plasma etching Glow discharges Plasma etching Sputtering (Physics) Glimmentladung (DE-588)4157609-3 gnd Gasentladung (DE-588)4139645-5 gnd Zerstäubung (DE-588)4067687-0 gnd |
| subject_GND | (DE-588)4157609-3 (DE-588)4139645-5 (DE-588)4067687-0 |
| title | Glow discharge processes sputtering and plasma etching |
| title_auth | Glow discharge processes sputtering and plasma etching |
| title_exact_search | Glow discharge processes sputtering and plasma etching |
| title_full | Glow discharge processes sputtering and plasma etching Brian Chapman |
| title_fullStr | Glow discharge processes sputtering and plasma etching Brian Chapman |
| title_full_unstemmed | Glow discharge processes sputtering and plasma etching Brian Chapman |
| title_short | Glow discharge processes |
| title_sort | glow discharge processes sputtering and plasma etching |
| title_sub | sputtering and plasma etching |
| topic | Glow discharges Plasma etching Sputtering (Physics) Glimmentladung (DE-588)4157609-3 gnd Gasentladung (DE-588)4139645-5 gnd Zerstäubung (DE-588)4067687-0 gnd |
| topic_facet | Glow discharges Plasma etching Sputtering (Physics) Glimmentladung Gasentladung Zerstäubung |
| work_keys_str_mv | AT chapmanbrian glowdischargeprocessessputteringandplasmaetching |