Anodic oxide films:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
London [u.a.]
Academic Press
1961
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| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | XIII, 377 S. graph. Darst. |
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| 264 | 1 | |a London [u.a.] |b Academic Press |c 1961 | |
| 300 | |a XIII, 377 S. |b graph. Darst. | ||
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Datensatz im Suchindex
| _version_ | 1804116698213646336 |
|---|---|
| adam_text | ANODIC OXIDE
FILMS
By
L YOUNG
British Columbia Research Council,
University of British Columbia, Vancouver,
British Columbia, Canada
ACADEMIC PRESS
LONDON AND NEW YORK
CONTENTS
PAGE
PREFACEV
1 INTRODUCTION
1 01 Stabilization of reactive metals by thin oxide films 1
1 02 Growth of film induced by anodic polarization 1
1 03 Metals illustrating the spectrum of anodic behaviour 2
2 GENERAL CHARACTERISTICS OF THE FILM-FORMING METALS:
THE RELATION BETWEEN OVERPOTENTIAL AND THE
FIELDS IN THE OXIDE AND ACROSS THE ] NTKRFACES
2 01 Introduction 4
2 02 Current-versus-potential characteristics at constant
thickness5
2 03 Formation at constant current 6
2 04 Formation at constant potential 7
2 05 Transients 7
2 06 Overpotential and overfield 8
2 07 Empirical relations between ionic current, field and
temperature in the steady state 11
3 THEORY OF GROWTH KINETICS OF ANODIC OXIDE FILMS
3 01 Introduction 13
3 02 Fundamental equation for high-field ionic conduc
tivity13
3 03 The effective charge on the mobile ion and the effec
tive field 17
3 04 Application of fundamental equation to anodic oxide
films (steady state)—Verwey s case 18
3 05 Cabrera and Mott s case 19
3 06 General treatment including Mott s and Verwey s;
systems as limiting cases 21
3 07 Dewald s case 22
3 08 Field production of Frenkel defects (steady state) 23
3 09 Transients: introduction 26
3 10 Frenkel defect theory (transients) 28
3 11 Consequences of the amorphous nature of the oxide 31
3 12 Decay of oxide overpotential on open circuit 33
3 13 Relation to the theory of the tarnishing reaction 34
3 14 Appendix: lack of overshoot of models with constant
negative space charge 35
vii
viii COS TENTS
PAGE
4 EXPERIMENTAL TECHNIQUES :I OR PRODUCING ANODIC OXIDE
FILMS ON VALVE METALS
4 01 Introduction 38
4 02 Characterization of film by formation process 38
4 03 Instrumentation for steady-state studies 39
4 04 Instrumentation for st udies of transients 41
4 05 Cell design 4 3
4 06 Techniques of surface preparation 4 5
4 07 Definition of working area 47
5 METHODS OF DETERMINING THE FILM THICKNESS
5 01 Introduction 49
5 02 Methods based on Far;i,day s law 50
5 03 Weighing methods 50
5 04 A C capacity 51
5 05 Electron diffraction method 5 1
5 06 Optical methods (non-mathematical) 52
5 07 Determination of the refractive index 55
5 08 Optics of thin films (mathematical) 5 7
6 TANTALUM I RECIPROCAL CAPACITY VERSUS POTENTIAL;
EFFECTS OF PRE-EXISTING FILM; NATURE OF MOBILE
SPECIES; TEMPERATURE RISE DURING ANODIZATION
6 01 Plots of reciprocal capacity versus potential 65
6 02 Effects of pre-existing f ilm on adhesion of anodic oxide
to its substrate 68
6 03 Apparent lack of effect of metal/metal-oxide interface
onkinetics69
6 04 Whether metal or oxygen moves and the nature of
the transport process 70
6 05 Temperature rise during the formation of the anodic
film 72
7 TANTALUM II DETERMINATION OF THE THICKNESS AND RE
LATED TOPICS FOR FILMS FORMED IN DILUTE SOLUTIONS
7 01 Early work 74
7 02 Recent work 75
7 03 Combination of Faraday s law, capacity and spectro-
photometric methods 78
7 04 Reflectivity in light polarized in the plane of incidence 83
8 TANTALUM III KINETICS OF FORMATION OF THE ANODIC
OXIDE FILM
8 01 Introduction 88
8 02 Steady-state kinetics: variation of field strength with
thickness at constanl current 88
CONTENTSix
PAGE
8 03 Steady-state dependence of the field on the ionic
current and temperature in dilute solutions 92
8 04 Summary of steady-state kinetics 101
8 05 Transient kinetics: introduction 101
8 06 Constant-current and constant-volta ge methods 102
8 07 A C -D C bridge method 105
8 08 Effects of annealing 105
8 09 Inadequacy of Frenkel defect model 108
8 10 Conclusions on the mechanism of film growth in dilute
solution108
8 11 Concentrated and non-aqueous solutions-: charge,
capacity and overpotential anomalies 110
8 12 Optical properties of films formed in concentrated
H2S04 114
9 TANTALUM IV FIELD RECRYSTALLIZATION ; ANOMALIES WITH
ROUGH SURFACES; DIELECTRIC-BREAKI OWN
9 01 Field recrystallization of Ta205 films 116
9 02 Anomalies with rough surfaces 121
9 03 Dielectric breakdown of oxide films on valve metals 125
10 PHOTO-EFFECTS WITH TANTALUM AND OTHER OXIDE-COATED
ELECTRODES
10 01 General 129
10 02 Photo-effects with tantalum electrodes: Becquerel
(photovoltaic) effect 130
10 03 Electronic photoconduction 131
10 04 Photo-induced growth 135
10 05 Explanations of photo-induced growth 138
10 06 Electroluminescence 139
11 RECTIFICATION BY VALVE METAL ELECTRODES
11 01 Introduction 141
11 02 Early work 141
11 03 Recent theories—empirical law for anodic leakage
current142
11 04 The p-n junction theory 142
11 05 Weak spot theory 144
11 06 Hydrogen doping theory 145
11 07 Some electrochemical considerations 145
11 08 Fissures as the weak spots 146
11 09 Entry of carriers; rectification by flawless film 147
11 10 A C switch using tantalum electrodes 147
12 DIELECTRIC PROPERTIES OF ANODIC OXIDE FILMS ON VALVE
METALS
12 01 Introduction and summary 150
CONTENTS
PAGE
12 02 Some elementary considerations of measurement 150
12 03 Some definitions of terras 152
12 04 A C bridges 153
12 05 Theory of dielectric properties: introduction 155
12 06 Ionic relaxation losses 156
12 07 Losses due to defects in ionic crystals 157
12 08 Carrier diffusion 157
12 09 Experimental data for films on Al, Ta, Nb and Zr and
their significance 157
12 10 Low frequencies 166
12 11 Use of capacity measurements to study mechanical
condition of the film s 166
13 DIELECTRIC PROPERTIES AND IONIC CONDUCTIVITY OP
OXIDE GLASSES
13 01 Introduction 171
13 02 Low-field ionic conduebion 174
13 03 Dielectric properties 175
13 04 High-field ionic conduction 177
14 ELECTROLYTIC CAPACITORS
14 01 General 181
14 02 Aluminium 182
14 03 Tantalum 183
14 04 Manganese dioxide solid capacitors 184
14 05 Metallized electrolytic capacitors 184
15 NIOBIUM
15 01 Introduction 186
15 02 Thickness, refractive index and dielectric constant 187
15 03 Kinetics of formation 190
15 04 Tantalum-niobium alloys 191
16 ALUMINIUM I POROUS FILMS
16 01 Introduction 193
16 02 Structure of porous fi] ins 193
16 03 Quantitative measurements on the formation of
porous films: introduction 198
, 16 04 Metal loss 199
16 05 Coating weight and ratio 200
16 06 Oxalic and oxalic-sulphuric acid mixtures 202
16 07 Sealing of porous films 202
16 08 Mode of formation of boehmite in sealing 203
16 09 Dependence of rapidity of anodic oxidation on crystal
face204
16 10 A C capacity 204
16 11 Theory of growth of pi rous films 204
16 12 Technical uses of porous films 206
CONTENTSxi
PAGE
17 ALUMINIUM II NON-POROUS FILMS
17 01 Structure of films 211
17 02 Nature of the film material 212
17 03 Metal or oxygen mobility % 215
17 04 Determination of thickness 215
17 05 Kinetic studies 218
18 BERYLLIUM AND MAGNESIUM
18 01 Beryllium 222
18 02 Magnesium: introduction 223
18 03 Anodic behaviour 223
18 04 Magnesium as the negative electrode of primary cells 225
18 05 Anodic finishes 225
19 IKON
19 01 Introduction 227
19 02 Acid solution: the active electrode 228
19 03 Transition between active and passive states 230
19 04 The presence, nature and thickness of an oxide film
on passive iron 233
19 05 The corrosion rate in the passive state 234
19 06 Mechanism of growth of the oxide 236
19 07 Reasons why the Flade potential is not coincident
with the reversible oxide potential 238
19 08 Capacity measurements 240
19 09 Behaviour in presence of redox system 241
19 10 Iron in concentrated nitric acid: the Ostwald-Lillie
nerve model 242
19 11 Passivity, inhibition and theories of passivity 243
19 12 Iron in solutions of inhibitors without applied current 244
19 13 Action of chloride ions 246
19 14 Cathodic and anodic polarization as protection against
corrosion247
19 15 Reductive dissolution of the passivi! film 247
19 16 Alkaline solution 248
20 TITANIUM, ZIRCONIUM AND HAFNIUM
20 01 Titanium: introduction; behaviour as a valve metal 253
20 02 Active-passive transition and 1 he protection of
titanium against corrosion by anodic polarization 255
20 03 Zirconium: introduction 257
20 04 Kinetics of formation of the anodic oxide 257
20 05 Very thin films 258
20 06 Thicker films 261
20 07 Spectrophotometry method 262
20 08 Hafnium 265
xii CONTENTS
J AGE
21 CHROMIUM, MOLYBDENUM, TUNGSTEN, URANIUM, MANGAN
ESE AND COBALT
21 01 Chromium 268
21 02 Molybdenum and tungsten: anodic behaviour 272
21 03 Growth and properties of anodic W03 films 272
21 04 Uranium 273
21 05 Manganese: anodic behaviour 274
21 06 The Mn02 electrode 274
21 07 Cobalt 275
22 PLATINUM, PALLADIUM AND XICKEL
22 01 Platinum: introductioi i 278
22 02 Charging curves 278
22 03 Transition to oxide 282
22 04 A C and D C 284
22 05 Nature of oxides • 284
22 06 Open-circuit potential 285
22 07 Photo-effects 285
22 08 Effect of surface conditions on electron-transfer re
actions286
22 09 Effect of surface condition on friction 287
22 10 Palladium 287
22 11 Nickel: introduction 288
22 12 Acid solution 289
22 13 Alkaline solution 290
23 GOLD, SILVER AND COPPER
23 01 Gold: introduction 297
23 02 Chloride solutions 297
23 03 Other solutions 298
23 04 Silver: introduction 302
23 05 Alkaline solutions 302
23 06 Sulphuric acid solutions 306
23 07 Chloride solutions 307
23 08 Copper: state of the surface on open circuit 307
23 09 Alkaline solution 308
23 10 Acid solution 309
24 ZINC, CADMIUM, MERCURY, GALLIUM, INDIUM AND THALLIUM
24 01 Zinc: introduction 312
24 02 Alkaline solutions 312
24 03 Cadmium: introduction 314
24 04 Anodic behaviour 314
24 05 Mercury: alkaline solutions 319
24 06 Chloride solutions 319
24 07 Gallium, indium and thallium 319
CONTENTSXiii
PAGE
25 LEAD, TIN, GERMANIUM AND SILICON
25 01 Lead: introduction; the acid lead ciill 321
25 02 Anodic processes on massive lead in sulphuric acid 322
25 03 Self-discharge 324
25 04 Antimonial lead 324
25 05 Photo-effects 325
25 06 Alkaline solutions 325
25 07 Tin: introduction 326
25 08 Low-current-density charging curves 326
25 09 Higher current densities 327
25 10 Germanium: introduction 328
25 11 Anodic dissolution 329
25 12 Electron-transfer reactions at germanium electrodes 331
25 13 Valve-metal-type oxide films 331
25 14 Silicon: valve-metal-type oxide films 332
25 15 Anodic dissolution 332
26 ANTIMONY, BISMUTH AND INDIUM ANTIMONIDE
26 01 Antimony: introduction 335
26 02 Anodic behaviour 335
26 03 Antimony as a pH-indicating electrode 336
26 04 Bismuth 337
26 05 Indium antimonide 338
APPENDIX A THE OXYGEN EVOLUTION REACTION
A 01 Effect of the state of oxidation of the surface 342
A 02 Mechanism of oxygen evolution 343
APPENDIX B SOME NOTES ON ELECTROCHEMICAL TOPICS
B 01 Introduction 345
B 02 The electrical double layer 345
B 03 Electrode potentials 348
B 04 Mixed potentials in corrosion processes 351
B 05 Reversible potentials of systems involving oxides 352
AUTHOR INDEX 355
SUBJECT INDEX 363
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| spelling | Young, Lawrence Verfasser aut Anodic oxide films by L. Young London [u.a.] Academic Press 1961 XIII, 377 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Metallic films Metall (DE-588)4038860-8 gnd rswk-swf Oxidschicht (DE-588)4044242-1 gnd rswk-swf Metall (DE-588)4038860-8 s Oxidschicht (DE-588)4044242-1 s DE-604 HEBIS Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=001473679&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
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| subject_GND | (DE-588)4038860-8 (DE-588)4044242-1 |
| title | Anodic oxide films |
| title_auth | Anodic oxide films |
| title_exact_search | Anodic oxide films |
| title_full | Anodic oxide films by L. Young |
| title_fullStr | Anodic oxide films by L. Young |
| title_full_unstemmed | Anodic oxide films by L. Young |
| title_short | Anodic oxide films |
| title_sort | anodic oxide films |
| topic | Metallic films Metall (DE-588)4038860-8 gnd Oxidschicht (DE-588)4044242-1 gnd |
| topic_facet | Metallic films Metall Oxidschicht |
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