Microlithography: process technology for IC fabrication
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
New York u.a.
McGraw-Hill
1986
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| Subjects: | |
| Item Description: | Literaturangaben |
| Physical Description: | XIX, 378 S. Ill., graph. Darst |
| ISBN: | 0070193045 |
Staff View
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV002196326 | ||
| 003 | DE-604 | ||
| 005 | 20130925 | ||
| 007 | t | ||
| 008 | 890928s1986 ad|| |||| 00||| eng d | ||
| 020 | |a 0070193045 |9 0-07-019304-5 | ||
| 035 | |a (OCoLC)12418734 | ||
| 035 | |a (DE-599)BVBBV002196326 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-384 |a DE-898 |a DE-355 |a DE-83 |a DE-11 | ||
| 050 | 0 | |a TK7874 | |
| 082 | 0 | |a 621.381/73 |2 19 | |
| 084 | |a UX 2350 |0 (DE-625)146952: |2 rvk | ||
| 084 | |a ZN 4900 |0 (DE-625)157417: |2 rvk | ||
| 084 | |a ELT 285f |2 stub | ||
| 100 | 1 | |a Elliott, David J. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Microlithography |b process technology for IC fabrication |c David J. Elliott |
| 264 | 1 | |a New York u.a. |b McGraw-Hill |c 1986 | |
| 300 | |a XIX, 378 S. |b Ill., graph. Darst | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Integrated circuits |x Very large scale integration |x Design and construction | |
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Photoresists | |
| 650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Technologie |0 (DE-588)4059276-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Technik |0 (DE-588)4059205-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 1 | 1 | |a Technologie |0 (DE-588)4059276-5 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 2 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 3 | 1 | |a Technik |0 (DE-588)4059205-4 |D s |
| 689 | 3 | |5 DE-604 | |
| 689 | 4 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
| 689 | 4 | 1 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 4 | |5 DE-604 | |
| 940 | 1 | |q TUB-nveb | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001442907 | ||
Record in the Search Index
| _version_ | 1804116651876024320 |
|---|---|
| any_adam_object | |
| author | Elliott, David J. |
| author_facet | Elliott, David J. |
| author_role | aut |
| author_sort | Elliott, David J. |
| author_variant | d j e dj dje |
| building | Verbundindex |
| bvnumber | BV002196326 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UX 2350 ZN 4900 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)12418734 (DE-599)BVBBV002196326 |
| dewey-full | 621.381/73 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/73 |
| dewey-search | 621.381/73 |
| dewey-sort | 3621.381 273 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02305nam a2200625 c 4500</leader><controlfield tag="001">BV002196326</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20130925 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1986 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0070193045</subfield><subfield code="9">0-07-019304-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)12418734</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002196326</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-384</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/73</subfield><subfield code="2">19</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UX 2350</subfield><subfield code="0">(DE-625)146952:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4900</subfield><subfield code="0">(DE-625)157417:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Elliott, David J.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Microlithography</subfield><subfield code="b">process technology for IC fabrication</subfield><subfield code="c">David J. Elliott</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York u.a.</subfield><subfield code="b">McGraw-Hill</subfield><subfield code="c">1986</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIX, 378 S.</subfield><subfield code="b">Ill., graph. Darst</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Very large scale integration</subfield><subfield code="x">Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photoresists</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Technologie</subfield><subfield code="0">(DE-588)4059276-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Technik</subfield><subfield code="0">(DE-588)4059205-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Technologie</subfield><subfield code="0">(DE-588)4059276-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2="1"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Integrierte Schaltung</subfield><subfield code="0">(DE-588)4027242-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2="1"><subfield code="a">Technik</subfield><subfield code="0">(DE-588)4059205-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="4" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2="1"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">TUB-nveb</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001442907</subfield></datafield></record></collection> |
| id | DE-604.BV002196326 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:41:54Z |
| institution | BVB |
| isbn | 0070193045 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001442907 |
| oclc_num | 12418734 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-384 DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-83 DE-11 |
| owner_facet | DE-91 DE-BY-TUM DE-384 DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-83 DE-11 |
| physical | XIX, 378 S. Ill., graph. Darst |
| psigel | TUB-nveb |
| publishDate | 1986 |
| publishDateSearch | 1986 |
| publishDateSort | 1986 |
| publisher | McGraw-Hill |
| record_format | marc |
| spelling | Elliott, David J. Verfasser aut Microlithography process technology for IC fabrication David J. Elliott New York u.a. McGraw-Hill 1986 XIX, 378 S. Ill., graph. Darst txt rdacontent n rdamedia nc rdacarrier Literaturangaben Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI (DE-588)4117388-0 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Technologie (DE-588)4059276-5 gnd rswk-swf Technik (DE-588)4059205-4 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Integrierte Schaltung (DE-588)4027242-4 s DE-604 Technologie (DE-588)4059276-5 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Technik (DE-588)4059205-4 s VLSI (DE-588)4117388-0 s |
| spellingShingle | Elliott, David J. Microlithography process technology for IC fabrication Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI (DE-588)4117388-0 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Technologie (DE-588)4059276-5 gnd Technik (DE-588)4059205-4 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| subject_GND | (DE-588)4117388-0 (DE-588)4174516-4 (DE-588)4191584-7 (DE-588)4059276-5 (DE-588)4059205-4 (DE-588)4027242-4 |
| title | Microlithography process technology for IC fabrication |
| title_auth | Microlithography process technology for IC fabrication |
| title_exact_search | Microlithography process technology for IC fabrication |
| title_full | Microlithography process technology for IC fabrication David J. Elliott |
| title_fullStr | Microlithography process technology for IC fabrication David J. Elliott |
| title_full_unstemmed | Microlithography process technology for IC fabrication David J. Elliott |
| title_short | Microlithography |
| title_sort | microlithography process technology for ic fabrication |
| title_sub | process technology for IC fabrication |
| topic | Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI (DE-588)4117388-0 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Technologie (DE-588)4059276-5 gnd Technik (DE-588)4059205-4 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| topic_facet | Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI Fotolithografie Halbleitertechnologie Lithografie Halbleitertechnologie Technologie Technik Integrierte Schaltung |
| work_keys_str_mv | AT elliottdavidj microlithographyprocesstechnologyforicfabrication |