Microlithography: process technology for IC fabrication
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York u.a.
McGraw-Hill
1986
|
| Schlagworte: | |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XIX, 378 S. Ill., graph. Darst |
| ISBN: | 0070193045 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV002196326 | ||
| 003 | DE-604 | ||
| 005 | 20130925 | ||
| 007 | t | ||
| 008 | 890928s1986 ad|| |||| 00||| eng d | ||
| 020 | |a 0070193045 |9 0-07-019304-5 | ||
| 035 | |a (OCoLC)12418734 | ||
| 035 | |a (DE-599)BVBBV002196326 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-384 |a DE-898 |a DE-355 |a DE-83 |a DE-11 | ||
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| 084 | |a ELT 285f |2 stub | ||
| 100 | 1 | |a Elliott, David J. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Microlithography |b process technology for IC fabrication |c David J. Elliott |
| 264 | 1 | |a New York u.a. |b McGraw-Hill |c 1986 | |
| 300 | |a XIX, 378 S. |b Ill., graph. Darst | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Integrated circuits |x Very large scale integration |x Design and construction | |
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Photoresists | |
| 650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Technologie |0 (DE-588)4059276-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Technik |0 (DE-588)4059205-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 0 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 1 | 1 | |a Technologie |0 (DE-588)4059276-5 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 2 | 1 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Integrierte Schaltung |0 (DE-588)4027242-4 |D s |
| 689 | 3 | 1 | |a Technik |0 (DE-588)4059205-4 |D s |
| 689 | 3 | |5 DE-604 | |
| 689 | 4 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
| 689 | 4 | 1 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
| 689 | 4 | |5 DE-604 | |
| 940 | 1 | |q TUB-nveb | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001442907 | ||
Datensatz im Suchindex
| _version_ | 1804116651876024320 |
|---|---|
| any_adam_object | |
| author | Elliott, David J. |
| author_facet | Elliott, David J. |
| author_role | aut |
| author_sort | Elliott, David J. |
| author_variant | d j e dj dje |
| building | Verbundindex |
| bvnumber | BV002196326 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UX 2350 ZN 4900 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)12418734 (DE-599)BVBBV002196326 |
| dewey-full | 621.381/73 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/73 |
| dewey-search | 621.381/73 |
| dewey-sort | 3621.381 273 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV002196326 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:41:54Z |
| institution | BVB |
| isbn | 0070193045 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001442907 |
| oclc_num | 12418734 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-384 DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-83 DE-11 |
| owner_facet | DE-91 DE-BY-TUM DE-384 DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-83 DE-11 |
| physical | XIX, 378 S. Ill., graph. Darst |
| psigel | TUB-nveb |
| publishDate | 1986 |
| publishDateSearch | 1986 |
| publishDateSort | 1986 |
| publisher | McGraw-Hill |
| record_format | marc |
| spelling | Elliott, David J. Verfasser aut Microlithography process technology for IC fabrication David J. Elliott New York u.a. McGraw-Hill 1986 XIX, 378 S. Ill., graph. Darst txt rdacontent n rdamedia nc rdacarrier Literaturangaben Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI (DE-588)4117388-0 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Technologie (DE-588)4059276-5 gnd rswk-swf Technik (DE-588)4059205-4 gnd rswk-swf Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Integrierte Schaltung (DE-588)4027242-4 s DE-604 Technologie (DE-588)4059276-5 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Technik (DE-588)4059205-4 s VLSI (DE-588)4117388-0 s |
| spellingShingle | Elliott, David J. Microlithography process technology for IC fabrication Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI (DE-588)4117388-0 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Technologie (DE-588)4059276-5 gnd Technik (DE-588)4059205-4 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| subject_GND | (DE-588)4117388-0 (DE-588)4174516-4 (DE-588)4191584-7 (DE-588)4059276-5 (DE-588)4059205-4 (DE-588)4027242-4 |
| title | Microlithography process technology for IC fabrication |
| title_auth | Microlithography process technology for IC fabrication |
| title_exact_search | Microlithography process technology for IC fabrication |
| title_full | Microlithography process technology for IC fabrication David J. Elliott |
| title_fullStr | Microlithography process technology for IC fabrication David J. Elliott |
| title_full_unstemmed | Microlithography process technology for IC fabrication David J. Elliott |
| title_short | Microlithography |
| title_sort | microlithography process technology for ic fabrication |
| title_sub | process technology for IC fabrication |
| topic | Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI (DE-588)4117388-0 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Technologie (DE-588)4059276-5 gnd Technik (DE-588)4059205-4 gnd Integrierte Schaltung (DE-588)4027242-4 gnd |
| topic_facet | Integrated circuits Very large scale integration Design and construction Microlithography Photoresists VLSI Fotolithografie Halbleitertechnologie Lithografie Halbleitertechnologie Technologie Technik Integrierte Schaltung |
| work_keys_str_mv | AT elliottdavidj microlithographyprocesstechnologyforicfabrication |