Plasma etching in semiconductor fabrication:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Amsterdam u.a.
Elsevier
1985
|
| Schriftenreihe: | Plasma technology.
1. |
| Schlagworte: | |
| Beschreibung: | X, 316 S. Ill., graph. Darst. |
| ISBN: | 0444424695 0444424199 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV002186639 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 890928s1985 ad|| |||| 00||| eng d | ||
| 020 | |a 0444424695 |9 0-444-42469-5 | ||
| 020 | |a 0444424199 |9 0-444-42419-9 | ||
| 035 | |a (OCoLC)11784503 | ||
| 035 | |a (DE-599)BVBBV002186639 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-355 |a DE-29T | ||
| 050 | 0 | |a TK7871.85 | |
| 082 | 0 | |a 621.3815/2 |2 19 | |
| 084 | |a ZN 4150 |0 (DE-625)157360: |2 rvk | ||
| 084 | |a ELT 285f |2 stub | ||
| 100 | 1 | |a Morgan, Russ A. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Plasma etching in semiconductor fabrication |
| 264 | 1 | |a Amsterdam u.a. |b Elsevier |c 1985 | |
| 300 | |a X, 316 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Plasma technology. |v 1. | |
| 650 | 4 | |a Plasma etching | |
| 650 | 4 | |a Semiconductors |x Etching | |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Halbleiterindustrie |0 (DE-588)4158803-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Bearbeitung |0 (DE-588)4120981-3 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Halbleiter |0 (DE-588)4022993-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmastrahl |0 (DE-588)4206366-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |D s |
| 689 | 0 | 1 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Halbleiterindustrie |0 (DE-588)4158803-4 |D s |
| 689 | 1 | 1 | |a Plasmastrahl |0 (DE-588)4206366-8 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Halbleiter |0 (DE-588)4022993-2 |D s |
| 689 | 2 | 1 | |a Bearbeitung |0 (DE-588)4120981-3 |D s |
| 689 | 2 | 2 | |a Plasmastrahl |0 (DE-588)4206366-8 |D s |
| 689 | 2 | |5 DE-604 | |
| 830 | 0 | |a Plasma technology. |v 1. |w (DE-604)BV001897163 |9 1. | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001436293 | ||
Datensatz im Suchindex
| _version_ | 1804116642164113408 |
|---|---|
| any_adam_object | |
| author | Morgan, Russ A. |
| author_facet | Morgan, Russ A. |
| author_role | aut |
| author_sort | Morgan, Russ A. |
| author_variant | r a m ra ram |
| building | Verbundindex |
| bvnumber | BV002186639 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4150 |
| classification_tum | ELT 285f |
| ctrlnum | (OCoLC)11784503 (DE-599)BVBBV002186639 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01898nam a2200553 cb4500</leader><controlfield tag="001">BV002186639</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1985 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0444424695</subfield><subfield code="9">0-444-42469-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0444424199</subfield><subfield code="9">0-444-42419-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)11784503</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002186639</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-29T</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7871.85</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">19</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4150</subfield><subfield code="0">(DE-625)157360:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Morgan, Russ A.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma etching in semiconductor fabrication</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Amsterdam u.a.</subfield><subfield code="b">Elsevier</subfield><subfield code="c">1985</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">X, 316 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Plasma technology.</subfield><subfield code="v">1.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleiterindustrie</subfield><subfield code="0">(DE-588)4158803-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Bearbeitung</subfield><subfield code="0">(DE-588)4120981-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmastrahl</subfield><subfield code="0">(DE-588)4206366-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Halbleiterindustrie</subfield><subfield code="0">(DE-588)4158803-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Plasmastrahl</subfield><subfield code="0">(DE-588)4206366-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2="1"><subfield code="a">Bearbeitung</subfield><subfield code="0">(DE-588)4120981-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2="2"><subfield code="a">Plasmastrahl</subfield><subfield code="0">(DE-588)4206366-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Plasma technology.</subfield><subfield code="v">1.</subfield><subfield code="w">(DE-604)BV001897163</subfield><subfield code="9">1.</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001436293</subfield></datafield></record></collection> |
| id | DE-604.BV002186639 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:41:45Z |
| institution | BVB |
| isbn | 0444424695 0444424199 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001436293 |
| oclc_num | 11784503 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-29T |
| owner_facet | DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-29T |
| physical | X, 316 S. Ill., graph. Darst. |
| publishDate | 1985 |
| publishDateSearch | 1985 |
| publishDateSort | 1985 |
| publisher | Elsevier |
| record_format | marc |
| series | Plasma technology. |
| series2 | Plasma technology. |
| spelling | Morgan, Russ A. Verfasser aut Plasma etching in semiconductor fabrication Amsterdam u.a. Elsevier 1985 X, 316 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Plasma technology. 1. Plasma etching Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Halbleiterindustrie (DE-588)4158803-4 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Bearbeitung (DE-588)4120981-3 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf Plasmastrahl (DE-588)4206366-8 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 s Plasmaätzen (DE-588)4174821-9 s DE-604 Halbleiterindustrie (DE-588)4158803-4 s Plasmastrahl (DE-588)4206366-8 s Halbleiter (DE-588)4022993-2 s Bearbeitung (DE-588)4120981-3 s Plasma technology. 1. (DE-604)BV001897163 1. |
| spellingShingle | Morgan, Russ A. Plasma etching in semiconductor fabrication Plasma technology. Plasma etching Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiterindustrie (DE-588)4158803-4 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Bearbeitung (DE-588)4120981-3 gnd Halbleiter (DE-588)4022993-2 gnd Plasmastrahl (DE-588)4206366-8 gnd |
| subject_GND | (DE-588)4174821-9 (DE-588)4158803-4 (DE-588)4158814-9 (DE-588)4120981-3 (DE-588)4022993-2 (DE-588)4206366-8 |
| title | Plasma etching in semiconductor fabrication |
| title_auth | Plasma etching in semiconductor fabrication |
| title_exact_search | Plasma etching in semiconductor fabrication |
| title_full | Plasma etching in semiconductor fabrication |
| title_fullStr | Plasma etching in semiconductor fabrication |
| title_full_unstemmed | Plasma etching in semiconductor fabrication |
| title_short | Plasma etching in semiconductor fabrication |
| title_sort | plasma etching in semiconductor fabrication |
| topic | Plasma etching Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiterindustrie (DE-588)4158803-4 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Bearbeitung (DE-588)4120981-3 gnd Halbleiter (DE-588)4022993-2 gnd Plasmastrahl (DE-588)4206366-8 gnd |
| topic_facet | Plasma etching Semiconductors Etching Plasmaätzen Halbleiterindustrie Halbleitertechnologie Bearbeitung Halbleiter Plasmastrahl |
| volume_link | (DE-604)BV001897163 |
| work_keys_str_mv | AT morganrussa plasmaetchinginsemiconductorfabrication |