Submicron lithography: March 29 - 30, 1982, Santa Clara, Calif.
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Bibliographic Details
Format: Book
Language:English
Published: Bellingham, Washington Internat. Soc. for Optical Engineering 1982
Series:International Society for Optical Engineering: Proceedings of SPIE. 333.
Subjects:
Physical Description:VIII, 179 S. zahlr. Ill. u. graph. Darst.
ISBN:0892523689

There is no print copy available.

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