Submicron lithography: March 29 - 30, 1982, Santa Clara, Calif.
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
Bellingham, Washington
Internat. Soc. for Optical Engineering
1982
|
Schriftenreihe: | International Society for Optical Engineering: Proceedings of SPIE.
333. |
Schlagworte: | |
Beschreibung: | VIII, 179 S. zahlr. Ill. u. graph. Darst. |
ISBN: | 0892523689 |
Internformat
MARC
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264 | 1 | |a Bellingham, Washington |b Internat. Soc. for Optical Engineering |c 1982 | |
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discipline | Elektrotechnik / Elektronik / Nachrichtentechnik Industrien, sonstige |
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genre | (DE-588)1071861417 Konferenzschrift 1982 Santa Clara Calif. gnd-content |
genre_facet | Konferenzschrift 1982 Santa Clara Calif. |
id | DE-604.BV002162851 |
illustrated | Illustrated |
indexdate | 2024-07-09T15:41:23Z |
institution | BVB |
isbn | 0892523689 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001420325 |
oclc_num | 8619934 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-83 DE-11 |
owner_facet | DE-91 DE-BY-TUM DE-83 DE-11 |
physical | VIII, 179 S. zahlr. Ill. u. graph. Darst. |
psigel | TUB-nseb |
publishDate | 1982 |
publishDateSearch | 1982 |
publishDateSort | 1982 |
publisher | Internat. Soc. for Optical Engineering |
record_format | marc |
series | International Society for Optical Engineering: Proceedings of SPIE. |
series2 | International Society for Optical Engineering: Proceedings of SPIE. |
spelling | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. Hrsg. von Phillip D. Blais* Bellingham, Washington Internat. Soc. for Optical Engineering 1982 VIII, 179 S. zahlr. Ill. u. graph. Darst. txt rdacontent n rdamedia nc rdacarrier International Society for Optical Engineering: Proceedings of SPIE. 333. Photolithography Congresses Photoresists Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1982 Santa Clara Calif. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Blais, Phillip D. Sonstige oth International Society for Optical Engineering: Proceedings of SPIE. 333. (DE-604)BV000010887 333. |
spellingShingle | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. International Society for Optical Engineering: Proceedings of SPIE. Photolithography Congresses Photoresists Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
subject_GND | (DE-588)4174516-4 (DE-588)1071861417 |
title | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. |
title_auth | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. |
title_exact_search | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. |
title_full | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. Hrsg. von Phillip D. Blais* |
title_fullStr | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. Hrsg. von Phillip D. Blais* |
title_full_unstemmed | Submicron lithography March 29 - 30, 1982, Santa Clara, Calif. Hrsg. von Phillip D. Blais* |
title_short | Submicron lithography |
title_sort | submicron lithography march 29 30 1982 santa clara calif |
title_sub | March 29 - 30, 1982, Santa Clara, Calif. |
topic | Photolithography Congresses Photoresists Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
topic_facet | Photolithography Congresses Photoresists Congresses Fotolithografie Halbleitertechnologie Konferenzschrift 1982 Santa Clara Calif. |
volume_link | (DE-604)BV000010887 |
work_keys_str_mv | AT blaisphillipd submicronlithographymarch29301982santaclaracalif |