Applications of plasma processes to VLSI technology:
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English Japanese |
Veröffentlicht: |
New York u.a.
Wiley
1985
|
Schriftenreihe: | A Wiley-Interscience Publication
|
Schlagworte: | |
Beschreibung: | EST: Handotai purazuma purosesu gijutsu <engl.> |
Beschreibung: | XIV, 394 S. Ill., graph. Darst. |
ISBN: | 0471869600 |
Internformat
MARC
LEADER | 00000nam a2200000 c 4500 | ||
---|---|---|---|
001 | BV002115395 | ||
003 | DE-604 | ||
005 | 19901222 | ||
007 | t | ||
008 | 890928s1985 ad|| |||| 00||| eng d | ||
020 | |a 0471869600 |9 0-471-86960-0 | ||
035 | |a (OCoLC)11754602 | ||
035 | |a (DE-599)BVBBV002115395 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 1 | |a eng |h jpn | |
049 | |a DE-91 |a DE-29T |a DE-898 |a DE-83 | ||
050 | 0 | |a TK7874 | |
082 | 0 | |a 621.381/73 |2 19 | |
084 | |a ZN 4950 |0 (DE-625)157424: |2 rvk | ||
084 | |a ELT 355f |2 stub | ||
130 | 0 | |a Handotai purazuma purosesu gijutsu | |
245 | 1 | 0 | |a Applications of plasma processes to VLSI technology |c ed. by Takuo Sugano |
264 | 1 | |a New York u.a. |b Wiley |c 1985 | |
300 | |a XIV, 394 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 0 | |a A Wiley-Interscience Publication | |
500 | |a EST: Handotai purazuma purosesu gijutsu <engl.> | ||
650 | 7 | |a Circuits intégrés à très grande échelle |2 ram | |
650 | 7 | |a Métallurgie |2 ram | |
650 | 4 | |a Integrated circuits |x Very large scale integration |x Design and construction | |
650 | 4 | |a Plasma etching | |
650 | 4 | |a Semiconductors |x Etching | |
650 | 4 | |a Vapor-plating | |
650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
655 | 7 | |a Plasmatechnologie |2 gnd |9 rswk-swf | |
689 | 0 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
689 | 0 | 1 | |a Plasmatechnologie |A f |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a VLSI |0 (DE-588)4117388-0 |D s |
689 | 1 | 1 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
689 | 1 | |5 DE-604 | |
700 | 1 | |a Sugano, Takuo |e Sonstige |4 oth | |
999 | |a oai:aleph.bib-bvb.de:BVB01-001387437 |
Datensatz im Suchindex
_version_ | 1804116569363578880 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV002115395 |
callnumber-first | T - Technology |
callnumber-label | TK7874 |
callnumber-raw | TK7874 |
callnumber-search | TK7874 |
callnumber-sort | TK 47874 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_rvk | ZN 4950 |
classification_tum | ELT 355f |
ctrlnum | (OCoLC)11754602 (DE-599)BVBBV002115395 |
dewey-full | 621.381/73 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.381/73 |
dewey-search | 621.381/73 |
dewey-sort | 3621.381 273 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01732nam a2200517 c 4500</leader><controlfield tag="001">BV002115395</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19901222 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1985 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0471869600</subfield><subfield code="9">0-471-86960-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)11754602</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002115395</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="1" ind2=" "><subfield code="a">eng</subfield><subfield code="h">jpn</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/73</subfield><subfield code="2">19</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4950</subfield><subfield code="0">(DE-625)157424:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 355f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="130" ind1="0" ind2=" "><subfield code="a">Handotai purazuma purosesu gijutsu</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Applications of plasma processes to VLSI technology</subfield><subfield code="c">ed. by Takuo Sugano</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York u.a.</subfield><subfield code="b">Wiley</subfield><subfield code="c">1985</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIV, 394 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">A Wiley-Interscience Publication</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">EST: Handotai purazuma purosesu gijutsu <engl.></subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Circuits intégrés à très grande échelle</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Métallurgie</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Very large scale integration</subfield><subfield code="x">Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="a">Plasmatechnologie</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Plasmatechnologie</subfield><subfield code="A">f</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">VLSI</subfield><subfield code="0">(DE-588)4117388-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Sugano, Takuo</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001387437</subfield></datafield></record></collection> |
genre | Plasmatechnologie gnd |
genre_facet | Plasmatechnologie |
id | DE-604.BV002115395 |
illustrated | Illustrated |
indexdate | 2024-07-09T15:40:35Z |
institution | BVB |
isbn | 0471869600 |
language | English Japanese |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001387437 |
oclc_num | 11754602 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-29T DE-898 DE-BY-UBR DE-83 |
owner_facet | DE-91 DE-BY-TUM DE-29T DE-898 DE-BY-UBR DE-83 |
physical | XIV, 394 S. Ill., graph. Darst. |
publishDate | 1985 |
publishDateSearch | 1985 |
publishDateSort | 1985 |
publisher | Wiley |
record_format | marc |
series2 | A Wiley-Interscience Publication |
spelling | Handotai purazuma purosesu gijutsu Applications of plasma processes to VLSI technology ed. by Takuo Sugano New York u.a. Wiley 1985 XIV, 394 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier A Wiley-Interscience Publication EST: Handotai purazuma purosesu gijutsu <engl.> Circuits intégrés à très grande échelle ram Métallurgie ram Integrated circuits Very large scale integration Design and construction Plasma etching Semiconductors Etching Vapor-plating Plasmaätzen (DE-588)4174821-9 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Plasmatechnologie gnd rswk-swf VLSI (DE-588)4117388-0 s Plasmatechnologie f DE-604 Plasmaätzen (DE-588)4174821-9 s Sugano, Takuo Sonstige oth |
spellingShingle | Applications of plasma processes to VLSI technology Circuits intégrés à très grande échelle ram Métallurgie ram Integrated circuits Very large scale integration Design and construction Plasma etching Semiconductors Etching Vapor-plating Plasmaätzen (DE-588)4174821-9 gnd VLSI (DE-588)4117388-0 gnd |
subject_GND | (DE-588)4174821-9 (DE-588)4117388-0 |
title | Applications of plasma processes to VLSI technology |
title_alt | Handotai purazuma purosesu gijutsu |
title_auth | Applications of plasma processes to VLSI technology |
title_exact_search | Applications of plasma processes to VLSI technology |
title_full | Applications of plasma processes to VLSI technology ed. by Takuo Sugano |
title_fullStr | Applications of plasma processes to VLSI technology ed. by Takuo Sugano |
title_full_unstemmed | Applications of plasma processes to VLSI technology ed. by Takuo Sugano |
title_short | Applications of plasma processes to VLSI technology |
title_sort | applications of plasma processes to vlsi technology |
topic | Circuits intégrés à très grande échelle ram Métallurgie ram Integrated circuits Very large scale integration Design and construction Plasma etching Semiconductors Etching Vapor-plating Plasmaätzen (DE-588)4174821-9 gnd VLSI (DE-588)4117388-0 gnd |
topic_facet | Circuits intégrés à très grande échelle Métallurgie Integrated circuits Very large scale integration Design and construction Plasma etching Semiconductors Etching Vapor-plating Plasmaätzen VLSI Plasmatechnologie |
work_keys_str_mv | UT handotaipurazumapurosesugijutsu AT suganotakuo applicationsofplasmaprocessestovlsitechnology |