Process and Device Modeling for Integrated Circuit Design:
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Louvain
Universite Catholique de Louvain
1977
|
| Beschreibung: | 1 Band Diagramme |
Internformat
MARC
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| 007 | t | ||
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| 035 | |a (OCoLC)630225533 | ||
| 035 | |a (DE-599)BVBBV002085911 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 | ||
| 100 | 1 | |a Demoulin, E. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Process and Device Modeling for Integrated Circuit Design |c E. Demoulin ; F. van de Wiele |
| 246 | 1 | 3 | |a NATO Advanced Study Institute on Process and Device Modeling for Integrated Circuit Design |
| 264 | 1 | |a Louvain |b Universite Catholique de Louvain |c 1977 | |
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| 338 | |b nc |2 rdacarrier | ||
| 505 | 8 | 0 | |t Ion implanted mos transistors |
| 700 | 1 | |a Wiele, Fernand van |e Verfasser |4 aut | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001365778 | ||
Datensatz im Suchindex
| _version_ | 1804116537447022592 |
|---|---|
| any_adam_object | |
| author | Demoulin, E. Wiele, Fernand van |
| author_facet | Demoulin, E. Wiele, Fernand van |
| author_role | aut aut |
| author_sort | Demoulin, E. |
| author_variant | e d ed f v w fv fvw |
| building | Verbundindex |
| bvnumber | BV002085911 |
| contents | Ion implanted mos transistors |
| ctrlnum | (OCoLC)630225533 (DE-599)BVBBV002085911 |
| format | Book |
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| id | DE-604.BV002085911 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T15:40:05Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001365778 |
| oclc_num | 630225533 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | 1 Band Diagramme |
| publishDate | 1977 |
| publishDateSearch | 1977 |
| publishDateSort | 1977 |
| publisher | Universite Catholique de Louvain |
| record_format | marc |
| spelling | Demoulin, E. Verfasser aut Process and Device Modeling for Integrated Circuit Design E. Demoulin ; F. van de Wiele NATO Advanced Study Institute on Process and Device Modeling for Integrated Circuit Design Louvain Universite Catholique de Louvain 1977 1 Band Diagramme txt rdacontent n rdamedia nc rdacarrier Ion implanted mos transistors Wiele, Fernand van Verfasser aut |
| spellingShingle | Demoulin, E. Wiele, Fernand van Process and Device Modeling for Integrated Circuit Design Ion implanted mos transistors |
| title | Process and Device Modeling for Integrated Circuit Design |
| title_alt | NATO Advanced Study Institute on Process and Device Modeling for Integrated Circuit Design Ion implanted mos transistors |
| title_auth | Process and Device Modeling for Integrated Circuit Design |
| title_exact_search | Process and Device Modeling for Integrated Circuit Design |
| title_full | Process and Device Modeling for Integrated Circuit Design E. Demoulin ; F. van de Wiele |
| title_fullStr | Process and Device Modeling for Integrated Circuit Design E. Demoulin ; F. van de Wiele |
| title_full_unstemmed | Process and Device Modeling for Integrated Circuit Design E. Demoulin ; F. van de Wiele |
| title_short | Process and Device Modeling for Integrated Circuit Design |
| title_sort | process and device modeling for integrated circuit design |
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