The application of plasmas to chemical processing:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Cambridge, Mass.
MIT Pr.
1967
|
| Schlagworte: | |
| Beschreibung: | 206 S. |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV002053957 | ||
| 003 | DE-604 | ||
| 005 | 20040427 | ||
| 007 | t | ||
| 008 | 890928s1967 |||| 00||| eng d | ||
| 035 | |a (OCoLC)70386716 | ||
| 035 | |a (DE-599)BVBBV002053957 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91G |a DE-83 | ||
| 084 | |a CHE 060f |2 stub | ||
| 245 | 1 | 0 | |a The application of plasmas to chemical processing |
| 264 | 1 | |a Cambridge, Mass. |b MIT Pr. |c 1967 | |
| 300 | |a 206 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Plasma (Ionized gases) | |
| 650 | 4 | |a Plasma chemistry | |
| 650 | 4 | |a Plasma chemistry |x Industrial applications | |
| 650 | 0 | 7 | |a Plasmachemie |0 (DE-588)4254737-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmatechnik |0 (DE-588)4140353-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Plasmachemie |0 (DE-588)4254737-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Plasmatechnik |0 (DE-588)4140353-8 |D s |
| 689 | 1 | |5 DE-604 | |
| 700 | 1 | |a Baddour, Raymond F. |e Sonstige |4 oth | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001343180 | ||
Datensatz im Suchindex
| _version_ | 1804116504127471616 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV002053957 |
| classification_tum | CHE 060f |
| ctrlnum | (OCoLC)70386716 (DE-599)BVBBV002053957 |
| discipline | Chemie |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01094nam a2200361 c 4500</leader><controlfield tag="001">BV002053957</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20040427 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1967 |||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)70386716</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002053957</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91G</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">CHE 060f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">The application of plasmas to chemical processing</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Cambridge, Mass.</subfield><subfield code="b">MIT Pr.</subfield><subfield code="c">1967</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">206 S.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma (Ionized gases)</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma chemistry</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma chemistry</subfield><subfield code="x">Industrial applications</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmachemie</subfield><subfield code="0">(DE-588)4254737-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmachemie</subfield><subfield code="0">(DE-588)4254737-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Baddour, Raymond F.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001343180</subfield></datafield></record></collection> |
| id | DE-604.BV002053957 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T15:39:33Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001343180 |
| oclc_num | 70386716 |
| open_access_boolean | |
| owner | DE-91G DE-BY-TUM DE-83 |
| owner_facet | DE-91G DE-BY-TUM DE-83 |
| physical | 206 S. |
| publishDate | 1967 |
| publishDateSearch | 1967 |
| publishDateSort | 1967 |
| publisher | MIT Pr. |
| record_format | marc |
| spelling | The application of plasmas to chemical processing Cambridge, Mass. MIT Pr. 1967 206 S. txt rdacontent n rdamedia nc rdacarrier Plasma (Ionized gases) Plasma chemistry Plasma chemistry Industrial applications Plasmachemie (DE-588)4254737-4 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Plasmachemie (DE-588)4254737-4 s DE-604 Plasmatechnik (DE-588)4140353-8 s Baddour, Raymond F. Sonstige oth |
| spellingShingle | The application of plasmas to chemical processing Plasma (Ionized gases) Plasma chemistry Plasma chemistry Industrial applications Plasmachemie (DE-588)4254737-4 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| subject_GND | (DE-588)4254737-4 (DE-588)4140353-8 |
| title | The application of plasmas to chemical processing |
| title_auth | The application of plasmas to chemical processing |
| title_exact_search | The application of plasmas to chemical processing |
| title_full | The application of plasmas to chemical processing |
| title_fullStr | The application of plasmas to chemical processing |
| title_full_unstemmed | The application of plasmas to chemical processing |
| title_short | The application of plasmas to chemical processing |
| title_sort | the application of plasmas to chemical processing |
| topic | Plasma (Ionized gases) Plasma chemistry Plasma chemistry Industrial applications Plasmachemie (DE-588)4254737-4 gnd Plasmatechnik (DE-588)4140353-8 gnd |
| topic_facet | Plasma (Ionized gases) Plasma chemistry Plasma chemistry Industrial applications Plasmachemie Plasmatechnik |
| work_keys_str_mv | AT baddourraymondf theapplicationofplasmastochemicalprocessing |