Plasma chemical processing:
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
New York, N.Y.
American Inst. of Chem. Engineers
1979
|
| Series: | American Institute of chemical Engineers: AIChE symposium series.
186=Vol.75. |
| Subjects: | |
| Physical Description: | 92 S. Ill., graph. Darst. |
Staff View
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV002007250 | ||
| 003 | DE-604 | ||
| 005 | 20220224 | ||
| 007 | t | ||
| 008 | 890928s1979 ad|| |||| 10||| eng d | ||
| 035 | |a (OCoLC)5101512 | ||
| 035 | |a (DE-599)BVBBV002007250 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-29T | ||
| 050 | 0 | |a TP156.P5 | |
| 082 | 0 | |a 660/.04/4 | |
| 084 | |a PHY 570f |2 stub | ||
| 084 | |a CHE 060f |2 stub | ||
| 245 | 1 | 0 | |a Plasma chemical processing |c Hrsg. von David M. Benenson* |
| 264 | 1 | |a New York, N.Y. |b American Inst. of Chem. Engineers |c 1979 | |
| 300 | |a 92 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a American Institute of chemical Engineers: AIChE symposium series. |v 186=Vol.75. | |
| 650 | 4 | |a Plasma chemistry |x Industrial applications |v Congresses | |
| 650 | 0 | 7 | |a Plasmachemie |0 (DE-588)4254737-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1979 |z Atlantic City, NJ |2 gnd-content | |
| 689 | 0 | 0 | |a Plasmachemie |0 (DE-588)4254737-4 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Benenson, David M. |e Sonstige |4 oth | |
| 830 | 0 | |a American Institute of chemical Engineers: AIChE symposium series. |v 186=Vol.75. |w (DE-604)BV006658069 |9 186 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-001309579 | ||
Record in the Search Index
| _version_ | 1804116455306821632 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV002007250 |
| callnumber-first | T - Technology |
| callnumber-label | TP156 |
| callnumber-raw | TP156.P5 |
| callnumber-search | TP156.P5 |
| callnumber-sort | TP 3156 P5 |
| callnumber-subject | TP - Chemical Technology |
| classification_tum | PHY 570f CHE 060f |
| ctrlnum | (OCoLC)5101512 (DE-599)BVBBV002007250 |
| dewey-full | 660/.04/4 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 660 - Chemical engineering |
| dewey-raw | 660/.04/4 |
| dewey-search | 660/.04/4 |
| dewey-sort | 3660 14 14 |
| dewey-tens | 660 - Chemical engineering |
| discipline | Chemie / Pharmazie Physik Chemie |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01329nam a2200373 cb4500</leader><controlfield tag="001">BV002007250</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20220224 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1979 ad|| |||| 10||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)5101512</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002007250</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-29T</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TP156.P5</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">660/.04/4</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 570f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">CHE 060f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma chemical processing</subfield><subfield code="c">Hrsg. von David M. Benenson*</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York, N.Y.</subfield><subfield code="b">American Inst. of Chem. Engineers</subfield><subfield code="c">1979</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">92 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">American Institute of chemical Engineers: AIChE symposium series.</subfield><subfield code="v">186=Vol.75.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma chemistry</subfield><subfield code="x">Industrial applications</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmachemie</subfield><subfield code="0">(DE-588)4254737-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1979</subfield><subfield code="z">Atlantic City, NJ</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmachemie</subfield><subfield code="0">(DE-588)4254737-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Benenson, David M.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">American Institute of chemical Engineers: AIChE symposium series.</subfield><subfield code="v">186=Vol.75.</subfield><subfield code="w">(DE-604)BV006658069</subfield><subfield code="9">186</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001309579</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1979 Atlantic City, NJ gnd-content |
| genre_facet | Konferenzschrift 1979 Atlantic City, NJ |
| id | DE-604.BV002007250 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:38:47Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001309579 |
| oclc_num | 5101512 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-29T |
| owner_facet | DE-91 DE-BY-TUM DE-29T |
| physical | 92 S. Ill., graph. Darst. |
| publishDate | 1979 |
| publishDateSearch | 1979 |
| publishDateSort | 1979 |
| publisher | American Inst. of Chem. Engineers |
| record_format | marc |
| series | American Institute of chemical Engineers: AIChE symposium series. |
| series2 | American Institute of chemical Engineers: AIChE symposium series. |
| spelling | Plasma chemical processing Hrsg. von David M. Benenson* New York, N.Y. American Inst. of Chem. Engineers 1979 92 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier American Institute of chemical Engineers: AIChE symposium series. 186=Vol.75. Plasma chemistry Industrial applications Congresses Plasmachemie (DE-588)4254737-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1979 Atlantic City, NJ gnd-content Plasmachemie (DE-588)4254737-4 s DE-604 Benenson, David M. Sonstige oth American Institute of chemical Engineers: AIChE symposium series. 186=Vol.75. (DE-604)BV006658069 186 |
| spellingShingle | Plasma chemical processing American Institute of chemical Engineers: AIChE symposium series. Plasma chemistry Industrial applications Congresses Plasmachemie (DE-588)4254737-4 gnd |
| subject_GND | (DE-588)4254737-4 (DE-588)1071861417 |
| title | Plasma chemical processing |
| title_auth | Plasma chemical processing |
| title_exact_search | Plasma chemical processing |
| title_full | Plasma chemical processing Hrsg. von David M. Benenson* |
| title_fullStr | Plasma chemical processing Hrsg. von David M. Benenson* |
| title_full_unstemmed | Plasma chemical processing Hrsg. von David M. Benenson* |
| title_short | Plasma chemical processing |
| title_sort | plasma chemical processing |
| topic | Plasma chemistry Industrial applications Congresses Plasmachemie (DE-588)4254737-4 gnd |
| topic_facet | Plasma chemistry Industrial applications Congresses Plasmachemie Konferenzschrift 1979 Atlantic City, NJ |
| volume_link | (DE-604)BV006658069 |
| work_keys_str_mv | AT benensondavidm plasmachemicalprocessing |