Plasma chemical processing:
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
New York, N.Y.
American Inst. of Chem. Engineers
1979
|
Schriftenreihe: | American Institute of chemical Engineers: AIChE symposium series.
186=Vol.75. |
Schlagworte: | |
Beschreibung: | 92 S. Ill., graph. Darst. |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV002007250 | ||
003 | DE-604 | ||
005 | 20220224 | ||
007 | t | ||
008 | 890928s1979 ad|| |||| 10||| eng d | ||
035 | |a (OCoLC)5101512 | ||
035 | |a (DE-599)BVBBV002007250 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | 0 | |a eng | |
049 | |a DE-91 |a DE-29T | ||
050 | 0 | |a TP156.P5 | |
082 | 0 | |a 660/.04/4 | |
084 | |a PHY 570f |2 stub | ||
084 | |a CHE 060f |2 stub | ||
245 | 1 | 0 | |a Plasma chemical processing |c Hrsg. von David M. Benenson* |
264 | 1 | |a New York, N.Y. |b American Inst. of Chem. Engineers |c 1979 | |
300 | |a 92 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a American Institute of chemical Engineers: AIChE symposium series. |v 186=Vol.75. | |
650 | 4 | |a Plasma chemistry |x Industrial applications |v Congresses | |
650 | 0 | 7 | |a Plasmachemie |0 (DE-588)4254737-4 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1979 |z Atlantic City, NJ |2 gnd-content | |
689 | 0 | 0 | |a Plasmachemie |0 (DE-588)4254737-4 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Benenson, David M. |e Sonstige |4 oth | |
830 | 0 | |a American Institute of chemical Engineers: AIChE symposium series. |v 186=Vol.75. |w (DE-604)BV006658069 |9 186 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-001309579 |
Datensatz im Suchindex
_version_ | 1804116455306821632 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV002007250 |
callnumber-first | T - Technology |
callnumber-label | TP156 |
callnumber-raw | TP156.P5 |
callnumber-search | TP156.P5 |
callnumber-sort | TP 3156 P5 |
callnumber-subject | TP - Chemical Technology |
classification_tum | PHY 570f CHE 060f |
ctrlnum | (OCoLC)5101512 (DE-599)BVBBV002007250 |
dewey-full | 660/.04/4 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 660 - Chemical engineering |
dewey-raw | 660/.04/4 |
dewey-search | 660/.04/4 |
dewey-sort | 3660 14 14 |
dewey-tens | 660 - Chemical engineering |
discipline | Chemie / Pharmazie Physik Chemie |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01329nam a2200373 cb4500</leader><controlfield tag="001">BV002007250</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20220224 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">890928s1979 ad|| |||| 10||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)5101512</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV002007250</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-29T</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TP156.P5</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">660/.04/4</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 570f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">CHE 060f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma chemical processing</subfield><subfield code="c">Hrsg. von David M. Benenson*</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York, N.Y.</subfield><subfield code="b">American Inst. of Chem. Engineers</subfield><subfield code="c">1979</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">92 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">American Institute of chemical Engineers: AIChE symposium series.</subfield><subfield code="v">186=Vol.75.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma chemistry</subfield><subfield code="x">Industrial applications</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmachemie</subfield><subfield code="0">(DE-588)4254737-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1979</subfield><subfield code="z">Atlantic City, NJ</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmachemie</subfield><subfield code="0">(DE-588)4254737-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Benenson, David M.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">American Institute of chemical Engineers: AIChE symposium series.</subfield><subfield code="v">186=Vol.75.</subfield><subfield code="w">(DE-604)BV006658069</subfield><subfield code="9">186</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001309579</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift 1979 Atlantic City, NJ gnd-content |
genre_facet | Konferenzschrift 1979 Atlantic City, NJ |
id | DE-604.BV002007250 |
illustrated | Illustrated |
indexdate | 2024-07-09T15:38:47Z |
institution | BVB |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001309579 |
oclc_num | 5101512 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-29T |
owner_facet | DE-91 DE-BY-TUM DE-29T |
physical | 92 S. Ill., graph. Darst. |
publishDate | 1979 |
publishDateSearch | 1979 |
publishDateSort | 1979 |
publisher | American Inst. of Chem. Engineers |
record_format | marc |
series | American Institute of chemical Engineers: AIChE symposium series. |
series2 | American Institute of chemical Engineers: AIChE symposium series. |
spelling | Plasma chemical processing Hrsg. von David M. Benenson* New York, N.Y. American Inst. of Chem. Engineers 1979 92 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier American Institute of chemical Engineers: AIChE symposium series. 186=Vol.75. Plasma chemistry Industrial applications Congresses Plasmachemie (DE-588)4254737-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1979 Atlantic City, NJ gnd-content Plasmachemie (DE-588)4254737-4 s DE-604 Benenson, David M. Sonstige oth American Institute of chemical Engineers: AIChE symposium series. 186=Vol.75. (DE-604)BV006658069 186 |
spellingShingle | Plasma chemical processing American Institute of chemical Engineers: AIChE symposium series. Plasma chemistry Industrial applications Congresses Plasmachemie (DE-588)4254737-4 gnd |
subject_GND | (DE-588)4254737-4 (DE-588)1071861417 |
title | Plasma chemical processing |
title_auth | Plasma chemical processing |
title_exact_search | Plasma chemical processing |
title_full | Plasma chemical processing Hrsg. von David M. Benenson* |
title_fullStr | Plasma chemical processing Hrsg. von David M. Benenson* |
title_full_unstemmed | Plasma chemical processing Hrsg. von David M. Benenson* |
title_short | Plasma chemical processing |
title_sort | plasma chemical processing |
topic | Plasma chemistry Industrial applications Congresses Plasmachemie (DE-588)4254737-4 gnd |
topic_facet | Plasma chemistry Industrial applications Congresses Plasmachemie Konferenzschrift 1979 Atlantic City, NJ |
volume_link | (DE-604)BV006658069 |
work_keys_str_mv | AT benensondavidm plasmachemicalprocessing |