Ion implantation, sputtering and their applications:
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
London
Academic Pr.
1976
|
| Schlagworte: | |
| Beschreibung: | IX, 333 S. |
Internformat
MARC
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| 001 | BV001969490 | ||
| 003 | DE-604 | ||
| 005 | 20241125 | ||
| 007 | t| | ||
| 008 | 890928s1976 xx |||| 00||| eng d | ||
| 035 | |a (OCoLC)2400851 | ||
| 035 | |a (DE-599)BVBBV001969490 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91G |a DE-355 |a DE-29T |a DE-20 |a DE-19 |a DE-83 |a DE-706 |a DE-188 | ||
| 050 | 0 | |a QC702.7.I55 | |
| 082 | 0 | |a 530.4/1 | |
| 084 | |a UP 9350 |0 (DE-625)146462: |2 rvk | ||
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| 100 | 1 | |a Townsend, P. D. |d 1937- |e Verfasser |0 (DE-588)1126599425 |4 aut | |
| 245 | 1 | 0 | |a Ion implantation, sputtering and their applications |c by Peter D. Townsend ; John C. Kelly ; N. E. Hartley |
| 264 | 1 | |a London |b Academic Pr. |c 1976 | |
| 300 | |a IX, 333 S. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Ion implantation | |
| 650 | 4 | |a Sputtering (Physics) | |
| 650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Ionenimplantation |0 (DE-588)4027606-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Anwendung |0 (DE-588)4196864-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Zerstäubung |0 (DE-588)4067687-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Ionenstrahl |0 (DE-588)4162347-2 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Sputtern |0 (DE-588)4182614-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Ionenimplantation |0 (DE-588)4027606-5 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Ionenstrahl |0 (DE-588)4162347-2 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Zerstäubung |0 (DE-588)4067687-0 |D s |
| 689 | 3 | 1 | |a Anwendung |0 (DE-588)4196864-5 |D s |
| 689 | 3 | |5 DE-604 | |
| 700 | 1 | |a Kelly, John C. |e Verfasser |4 aut | |
| 700 | 1 | |a Hartley, N. E. |e Verfasser |4 aut | |
| 940 | 1 | |q TUB-nveb | |
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-001284458 | |
Datensatz im Suchindex
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|---|---|
| adam_text | |
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| author | Townsend, P. D. 1937- Kelly, John C. Hartley, N. E. |
| author_GND | (DE-588)1126599425 |
| author_facet | Townsend, P. D. 1937- Kelly, John C. Hartley, N. E. |
| author_role | aut aut aut |
| author_sort | Townsend, P. D. 1937- |
| author_variant | p d t pd pdt j c k jc jck n e h ne neh |
| building | Verbundindex |
| bvnumber | BV001969490 |
| callnumber-first | Q - Science |
| callnumber-label | QC702 |
| callnumber-raw | QC702.7.I55 |
| callnumber-search | QC702.7.I55 |
| callnumber-sort | QC 3702.7 I55 |
| callnumber-subject | QC - Physics |
| classification_rvk | UP 9350 |
| classification_tum | PHY 790f |
| ctrlnum | (OCoLC)2400851 (DE-599)BVBBV001969490 |
| dewey-full | 530.4/1 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 530 - Physics |
| dewey-raw | 530.4/1 |
| dewey-search | 530.4/1 |
| dewey-sort | 3530.4 11 |
| dewey-tens | 530 - Physics |
| discipline | Physik |
| format | Book |
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| id | DE-604.BV001969490 |
| illustrated | Not Illustrated |
| indexdate | 2024-11-25T15:01:08Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-001284458 |
| oclc_num | 2400851 |
| open_access_boolean | |
| owner | DE-91G DE-BY-TUM DE-355 DE-BY-UBR DE-29T DE-20 DE-19 DE-BY-UBM DE-83 DE-706 DE-188 |
| owner_facet | DE-91G DE-BY-TUM DE-355 DE-BY-UBR DE-29T DE-20 DE-19 DE-BY-UBM DE-83 DE-706 DE-188 |
| physical | IX, 333 S. |
| psigel | TUB-nveb |
| publishDate | 1976 |
| publishDateSearch | 1976 |
| publishDateSort | 1976 |
| publisher | Academic Pr. |
| record_format | marc |
| spelling | Townsend, P. D. 1937- Verfasser (DE-588)1126599425 aut Ion implantation, sputtering and their applications by Peter D. Townsend ; John C. Kelly ; N. E. Hartley London Academic Pr. 1976 IX, 333 S. txt rdacontent n rdamedia nc rdacarrier Ion implantation Sputtering (Physics) Sputtern (DE-588)4182614-0 gnd rswk-swf Ionenimplantation (DE-588)4027606-5 gnd rswk-swf Anwendung (DE-588)4196864-5 gnd rswk-swf Zerstäubung (DE-588)4067687-0 gnd rswk-swf Ionenstrahl (DE-588)4162347-2 gnd rswk-swf Sputtern (DE-588)4182614-0 s DE-604 Ionenimplantation (DE-588)4027606-5 s Ionenstrahl (DE-588)4162347-2 s Zerstäubung (DE-588)4067687-0 s Anwendung (DE-588)4196864-5 s Kelly, John C. Verfasser aut Hartley, N. E. Verfasser aut |
| spellingShingle | Townsend, P. D. 1937- Kelly, John C. Hartley, N. E. Ion implantation, sputtering and their applications Ion implantation Sputtering (Physics) Sputtern (DE-588)4182614-0 gnd Ionenimplantation (DE-588)4027606-5 gnd Anwendung (DE-588)4196864-5 gnd Zerstäubung (DE-588)4067687-0 gnd Ionenstrahl (DE-588)4162347-2 gnd |
| subject_GND | (DE-588)4182614-0 (DE-588)4027606-5 (DE-588)4196864-5 (DE-588)4067687-0 (DE-588)4162347-2 |
| title | Ion implantation, sputtering and their applications |
| title_auth | Ion implantation, sputtering and their applications |
| title_exact_search | Ion implantation, sputtering and their applications |
| title_full | Ion implantation, sputtering and their applications by Peter D. Townsend ; John C. Kelly ; N. E. Hartley |
| title_fullStr | Ion implantation, sputtering and their applications by Peter D. Townsend ; John C. Kelly ; N. E. Hartley |
| title_full_unstemmed | Ion implantation, sputtering and their applications by Peter D. Townsend ; John C. Kelly ; N. E. Hartley |
| title_short | Ion implantation, sputtering and their applications |
| title_sort | ion implantation sputtering and their applications |
| topic | Ion implantation Sputtering (Physics) Sputtern (DE-588)4182614-0 gnd Ionenimplantation (DE-588)4027606-5 gnd Anwendung (DE-588)4196864-5 gnd Zerstäubung (DE-588)4067687-0 gnd Ionenstrahl (DE-588)4162347-2 gnd |
| topic_facet | Ion implantation Sputtering (Physics) Sputtern Ionenimplantation Anwendung Zerstäubung Ionenstrahl |
| work_keys_str_mv | AT townsendpd ionimplantationsputteringandtheirapplications AT kellyjohnc ionimplantationsputteringandtheirapplications AT hartleyne ionimplantationsputteringandtheirapplications |