Proceedings of the sixth International Vacuum Congress: March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan
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Tokyo
Physical Soc. of Japan
1974
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| Schriftenreihe: | [Japanese journal of applied physics / Supplement]
13,1 |
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| adam_text | IMAGE 1
JAPANESE JOURNAL OF APPLIED PHYSICS
SUPPLEMENT 2, PART 1,1974
PROCEEDINGS OF THE
SIXTH INTERNATIONAL VACUUM
CONGRESS
MARCH 25-29,1974
KYOTO INTERNATIONAL CONFERENCE HALL
KYOTO, JAPAN
SPONSORED BY
INTERNATIONAL UNION FOR VACUUM SCIENCE,
TECHNIQUE AND APPLICATIONS
HOSTED BY THE
VACUUM SOCIETY OF JAPAN
IMAGE 2
PROC. 6TH INTERNL. VACUUM CONGR. 1974 JAPAN. J, APPL. PHYS. SUPPL. 2,
PT. 1, 1974
CONTENTS
TURBOMOLECULAR PUMPS
MASS SEPARATION IN A TURBOMOLECULAR PUMP T. SAWADA 1
NEW DEVELOPMENTS IN THE FIELD OF HIGH PERFORMANCE TURBO MOLECULAR PUMPS
FOR THE PRODUCTION OF OIL-FREE HIGH AND ULTRAHIGH VACUUM J. HENNING 5
ON PERFORMANCE IMPROVEMENT OF AXIAL-FLOW MOLECULAR PUMP S. IIDA AND 0.
KIMURA 9
A NEW SERIES OF TURBOMOLECULAR PUMPS W. BACHLER, R. FRANK, AND E.
USSELMANN 13
DYNAMIC SEALS L. MAURICE 17
A NEW MOLECULAR PUMP L. MAURICE 21
DIFFUSION AND MECHANICAL PUMPS
*DIFFUSION PUMP TECHNOLOGY M. H. HABLANIAN 25
CHARACTERISTICS OF SINGLE STRUCTURE VAPOUR PUMPING GROUPS
B. D. POWER, N. T. M. DENNIS, R. D. OSWALD, AND B. H. COLWELL 33
CHARACTERISTICS OF A NEW DIFFUSION PUMP FLUID
K. SAKUMA AND M. NAGAYAMA 37
BACKSTREAMING IN DIFFUSION PUMP SYSTEMS G. RETTINGHAUS AND W. K. HUBER
A-853
OIL LUBRICATION/SEALING ON MECHANICAL VACUUM PUMPS D. B. WEBB A-853
GETTERS, GETTERING AND ION PUMPS
PREDICTING AND EVALUATING TITANIUM SUBLIMATION PUMP PERFORMANCE
D. J. HARRA
41
MERCURY DISPENSING AND GETTERING IN FLUORESCENT LAMPS P. DELLA PORTA AND
E. RABUSIN
45
ZIRCONIUM-ALUMINIUM ALLOY AS A GETTER FOR HIGH INTENSITY DISCHARGE LAMPS
A. BAROSI AND E. RABUSIN 49
GETTERS AND GETTERING T. A. GIORGI
53
*
: INVITED PAPER
IMAGE 3
X CONTENTS
GETTERING RATES OF HYDROGEN AND DEUTERIUM BY TITANIUM AND ELEVATED
TEMPERATURE M. NAGASAKA AND T. YAMASHINA 61
STARTING CHARACTERISTICS OF TRIODE AND DIODE SPUTTER-ION PUMPS A.
KONISHI AND S. MIZUMACHI 65
THEORY OF THE QUADRUPOLE ION PUMPS H. HORA AND H. SCHWARZ 69
A NEW MODIFIED ORBITRON PUMP P. K. NAIKAND S. L. VERMA 73
CHARACTERISTICS OF ORBITRON PUMP S. KATO, M. NOJIRI, AND H. OIKAWA A-854
CRYOPUMPS
THE OPTIMISATION OF A TUBULAR CONDENSATION CRYOPUMP FOR PRESSURES BELOW
10 13 TORR C. BENVENUTI AND D. BLECHSCHMIDT 77
RELATIONS BETWEEN CRYOGENICS AND VACUUM TECHNOLOGY UP TO NOW AND IN THE
FUTURE G. KLIPPING 81
SOME CONSIDERATIONS ON LARGE-SIZED CATALYTIC PUMPS FOR NUCLEAR FUSION
APPARATUS Y. MURAKAMI, T. KURISAKI, Y, ISHIBE, AND K. OKAMOTO 89
A NEW CRYOSORPTION PUMP FOR BETTER ULTIMATE VACUA C. V. G. NAIRAND P.
VIJENDRAN 93
CRYOSORPTION PUMPING AT 77K FROM ATMOSPHERIC PRESSURE TO I0~7 TORR R,
DOBROZEMSKY AND G. MORAW 97
CONDENSATION CRYOPUMP WITH INDEPENDENT CRYOGENERATOR I. BLINOW AND V,
MINAICHEV 101
CRYOSORPTION PUMPING FOR INTERSECTING STORAGE RINGS H. J. HALAMA AND J.
R. AGGUS A-854
PRESSURE MEASUREMENT
LOW PRESSURE LIMITATION OF THE ORBITRON IONIZATION GAUGE D. BLECHSCHMIDT
105
A PULSED DISCHARGE VACUUM GAUGE K, KAGEYAMA, S. MONMA, F. FUKAZAWA, AND
N. KURIYAMA 109
RELATIVE ION GAUGE SENSITIVITIES TO VARIOUS HYDROCARBON GASES K.
NAKAYAMA AND H. HOJO 113
THE FLOW OF RAREFIED GASES IN VACUUM SYSTEMS AND PROBLEMS OF
STANDARDIZATION OF MEASURING TECHNIQUES W. STECKELMACHER 117
A COMPARATIVE STUDY OF THE METROLOGICAL CHARACTERISTICS OF A FIXED AND
VARIABLE CONDUCTANCE DYNAMIC SYSTEM FOR VACUUM-GAUGE CALIBRATION A.
CALCATELLI, C. FERRERO, G. RUMIANO, AND G. UGHI 127
STANDARD SYSTEMS IN VACUUM, AND DEVELOPMENT TRENDS A. CALCATELLI, C.
FERRERO, G. RUMIANO, AND G. UGHI 131
PRESSURE MEASUREMENT BY THE BROWNIAN MOTION. ABSOLUTE MEASUREMENT OF
VACUUM PRESSURE THROUGH THE SPECTRAL ANALYSIS OF BROWNIAN MOTION M.
MORIMURA, K. NAKAGAWA, AND Y. NEZU 135
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CONTENTS XI
ACCURACY OF (A P/P) = 10 7 OBTAINED ON A DIFFERENTIAL INTERFEROMETRIC
MANOMETER MDI USED WITH RECORDER J. L. TRUFFIER AND P. S. CHOUMOFF 139
HIGH PRESSURE IONIZATION GAUGE FOR CALIBRATION IN THE 10~7 TO 10-1 TORR
RANGE P. S. CHOUMOFF AND B. IAPTEFF 143
THE MCLEOD GAUGE (1874-1974)-ITS BIRTH-ITS DEVELOPMENT-ITS ACTUALITY E.
THOMAS AND R. LEYNIERS 147
OBSERVATIONS AND MEASUREMENT OF THE MERCURY PUMPING EFFECT ON SEVERAL
GASES BY FOUR NEW METHODS L. B. THOMAS, R. E. HARRIS, AND C. L. KRUEGER
151
A MONTE CARLO STUDY OF THE 3-GAUGE PUMPING SPEED TEST DOME D. R. DENISON
155
PARTIAL PRESSURE MEASUREMENT AND MASS ANALYSIS
MASS SPECTROMETRY APPLIED TO HUMAN BREATH ANALYSIS P. J. BRYANT, O. H.
WEDDLE, AND P. L. GUTSHALL 159
PRECISION AND ACCURACY OF MASS SPECTROMETER ANALYSIS IN THE DIRECT GAS
INLET SYSTEM (FUNDAMENTAL CONSIDERATION FOR RESPIRATORY GAS ANALYSIS) I.
NIISHI, S. SUGAI, AND K. KIMURA 163
A HIGH SENSITIVITY PROGRAMMABLE MASS SPECTROMETER F. NAKAO AND T.
YAMAMOTO 167
AN IMPROVED METHOD FOR MEASUREMENTS OF VERY LOW PARTIAL PRESSURES H.
MIYAKE AND M. MICHIJIMA 171
OPTIMIZATION OF THE ADJUSTMENTS OF A QUADRUPOLE MASS SPECTROMETER FOR
THE ANALYSIS OF GASES IN METALS
J.-M. WELTER 175
A NEW APPROACH TO THE IMPLEMENTATION OF A DELAYED DC RAMP QUADRUPOLE
MASS FILTER W. M. BRUBAKER 179
A NEW DIGITALLY CONTROLLED, COMPUTER COMPATIBLE QUADRUPOLE MASS
SPECTROMETER H. EGLI, W. K. HUBER H. SELHOFER, AND R. VOGELSANG A-855
A PEAK SHARPENER FOR MAGNETIC MASS SPECTROMETERS W. M. BRUBAKER A-855
PARTICLE ACCELERATORS
SUPERCONDUCTIVITY, CRYOGENICS, AND VACUUM TECHNOLOGY FOR LINEAR
ACCELERATORS E. L. GARWIN 183
PULSED GAS SHUTTER
H. ISHIMARU, S. FUKUMOTO, AND N. YAGI 191
A VACUUM SYSTEM FOR A 30 MV TANDEM VAN DE GRAAFT B. S. HALLIDAY 195
VACUUM AND ULTRAHIGH VACUUM FOR PARTICLE ACCELERATORS AND STORAGE RINGS
E. FISCHER 199
A SCHEME OF INITIAL START OF A LARGE VACUUM SYSTEM WITH SPUTTER ION PUMP
WITHOUT BAKING PROCEDURE G. HORIKOSHI, K. SATOH, AND H. MIZUNO 205
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XII CONTENTS
THE UHV-SYSTEM FOR THE DESY ELECTRON-POSITRON DOUBLE STORAGE RING
DORIS CH. FALLAND, H. GOEDECKE, H. HARTWIG, J. KOUPTSIDIS, H-CH.
LEWIN, H. MINISTER, H. PINGEL, G. SCHUMANN, AND M. SCHWARTZ 209
NUCLEAR FUSION
THE VACUUM CHAMBER OF A TOKAMAK PLASMA EXPERIMENT (TFR) Z. SLEDZIESKI,
M. HUGUET, P. H. REBUT, AND A. TOROSSIAN 217
VACUUM PROBLEMS ASSOCIATED WITH THE CONCEPTIONAL DESIGN OF TOKAMAK
FUSION REACTORS G. LEWIN AND F. H. TENNEY 221
*VACUUM PROBLEMS IN PLASMA PHYSICS AND CONTROLLED NUCLEAR FUSION F.
PRSVOT 225
*THE VACUUM TECHNIQUE OF NUCLEAR-FUSION INSTALLATIONS YU. M. PUSTOVOIT
233
VACUUM SYSTEMS AND APPLICATIONS
*VACUUM INDUSTRY IN JAPAN C. HAYASHI 241
A NEW VACUUM SYSTEM FOR AN ELECTRON MICROSCOPE N. YOSHIMURA, S. OHMORI,
Y. NAGAHAMA, AND H. OIKAWA 249
A NEW COLD SPUTTERING SYSTEM USING A TRAPPING ELECTRODE S. AOSHIMA AND
T. ASAMAKI 253
APPLICABILITY AND LIMITS OF AUTOMATIC LEAK DETECTION BELOW 10~8 TON-
LITER/S
U. BEECK AND G. REICH 257
ATTAINMENT OF OULGASSING RATES BELOW 10 13 TORR- LITERS/SEC CM2 FOR
ALUMINUM AND STAINLESS STEEL AFTER BAKEOUT AT MODERATE TEMPERATURES G.
MORAW AND R. DOBROZEMSKY 261
ELECTRIC DISCHARGE ABLATION OF PLASTICS IN VACUUM M. HIRATA AND K.
NAKAYAMA 265
SURFACE PHENOMENA (I)
INTERACTION OF LIGHT IONS WITH SURFACES G. M. MCCRACKEN 269
ELECTRON EMISSION FROM VACUUM EVAPORATED TIN-OXIDE FILMS T. HANASAKA, T.
SATAKE, M. HASHIBA, AND T. YAMASHINA 277
THIN FILM CATHODE OF LANTHANUM HEXABORIDE (LAB6) C. OSHIMA, S. HORIUCHI,
AND S. KAWAI 281
SURFACE CONDITION AND THERMIONIC EMISSION OF LAB6 S. HOSOKI, S.
YAMAMOLO, K. HAYAKAWA, AND H. OKANO 285
FIELD EMISSION STUDIES OF TIC SINGLE CRYSTAL K. SENZAKI AND Y. KUMASHIRO
289
A NOVEL EVALUATION METHOD OF RAPIDLY VARYING WORK FUNCTION VALUES IN
FIELD EMISSION MICROSCOPY R. R. MALY 293
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CONTENTS XIII
SURFACEPHENOMENA (II)
ADHESION, FRICTION, WEAR AND LUBRICATION IN VACUUM D. H. BUCKLEY 297
FRICTIONAL BEHAVIOR OF MOLYBDENUM DISULFIDE IN HIGH VACUUM M. MATSUNAGA
AND K. HOSHIMOTO 305
CONCENTRATION CHANGE OFSN IN THE SURFACE LAYERS OF CU-SN ALLOY SYSTEM
DUE TO FRICTION K. NAKAJIMA, A. ISOGAI, AND Y. TAGA 309
MICROADHESION BETWEEN HARD SOLIDS CAUSED BY VERY LIGHT LOADS A. KOHNO
AND S. HYODO 313
THE RELATIONSHIP OF SOLID SURFACES TO VACUUM SCIENCE AND TECHNOLOGY J.
P. HOBSON 317
ADSORPTION STUDIES OF OIL MOLECULES ON BOROSILICATE GLASS SURFACE USING
MOLECULAR BEAM
TECHNIQUES K. SHIMADA, M. KOBAYASHI, AND G. TOMINAGA 327
SIMULTANEOUS ADSORPTION OF NITROGEN AND MERCURY ON A PYREX GLASS SURFACE
M. KOBAYASHI,. Y. TUZI, AND K. ASAO 331
MEASUREMENT OF THERMAL ACCOMMODATION COEFFICIENTS OF NOBLE GASES ON
TUNGSTEN WITH DIFFERENT SURFACE STRUCTURES BETWEEN 300 AND 370K
J. BIERHALS, G. GROSSE, AND G. MESSER 335
SURFACE STUDIES OF SINTERED AND SINGLE CRYSTAL U02 BY LOW ENERGY ION
BOMBARDMENT A. CAVALERU AND F. VASILIU 339
SURFACE ANALYSIS
A HIGH RESOLUTION ELECTRON SPECTROMETER FOR AUGER-ELECTRON-SPECTROSCOPY
(AES) H. G. NOLLER, H. D. POLASCHEGG, AND H. SCHILLALIES 343.
ANALYSIS OF CHROMATE CONVERSION COATINGS ON ALUMINUM R. J. SUNDERLAND
347
SURFACE AND GRAIN BOUNDARY SEGREGATION OF STEEL IMPURITIES H. SHIMIZU,
M. ONO, K. NAKAYAMA, AND M. YAMADA 351
FIELD-ION MICROSCOPE OBSERVATIONS OF SPUTTERED TUNGSTEN SURFACES J. M.
WALLS, E. BRAUN, AND H. N. SOUTHWORTH 355
INSTRUMENTAL PROBLEMS OF ELECTRON MICROPROBE AUGER SPECTROSCOPY
M. ONO, H. SHIMIZU, AND K. NAKAYAMA 359
COMPOSITION PROFILES OF SEVERAL CONTAMINATED AND CLEANED SURFACES OF
GOLD THICK FILMS
ON COPPER PLATES BY AUGER ELECTRON AND SECONDARY ION MASS SPECTROSCOPIES
S. KOMIYA, M. MIZUNO, T. NARUSAWA, H. MAEDA, AND M. YOSHIKAWA 363
ABSOLUTE ATOMIC DENSITIES DETERMINED BY AUGER ELECTRON SPECTROSCOPY
P. STAIB AND J. KIRSCHNER A-856
ION MICROPROBE ANALYSIS
SECONDARY ION MASS SPECTROMETRY AND ITS APPLICATION IN THIN FILM AND
SURFACE LAYER
RESEARCH H.W.WERNER 367
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XIV CONTENTS
SURFACE OBSERVATION OF INSULATING MATERIALS WITH ION MICROPROBE ANALYZER
K. NAKAMURA, A. SHIBATA, K. KONDO, AND H. TAMURA 375
IN DEPTH ANALYSIS IN SELECTED AREA WITH ION MICROPROBE ANALYZER H.
TAMURA, T. KONDO, I. KANOMATA, K. NAKAMURA, AND Y. NAKAJIMA 379
RESULT ON A UHV-ION MICROPROBE FOR SURFACE AND TRACE ANALYSIS F. G.
RUDENAUER AND W. STCIGER 383
ION MICROPROBE MASS ANALYSIS FOR IRON AND STEEL RESEARCH R. MATSUMOTO,
K. SATO, AND K. SUZUKI 387
APPLICATION OF THE ION MICROPROBE MASS ANALYZER TO PROBLEMS IN STEELS K.
TSURUOKA, K. TSUNOYAMA, Y. OOHASHI, AND T. SUZUKI 391
ON IMPROVEMENTS OF THE MEASUREMENT ACCURACY IN DIFFUSION PROFILES OF
DOPED ELEMENTS IN SEMICONDUCTORS BY IMMA K. NAGAI AND M, YAMAGUCHI 395
ISOTOPE ANALYSIS IN IRON METEORITES WITH ION PROBE MASS SPECTROMETER H.
NISHIMURA AND J. OKANO 399
IONTECHNOLOGY
MULTIPLE IONIZATION BY SEQUENTIAL ELECTRON IMPACT P. A. REDHEAD 403
DESIGN AND OPERATING CHARACTERISTICS OF A LOW PRESSURE ION SOURCE R. K.
FITCH, A. M. GHANDER, G. J. RUSHTON, AND R. SINGH 411
PRODUCTION AND MEASUREMENT OF DENSE METAL IONS FOR PHYSICAL VAPOR
DEPOSITION BY A HOLLOW CATHODE DISCHARGE S. KOMIYA AND K. TSURUOKA 415
A TRAPPED ION SOURCE WITH IMPROVED IONIZING EFFICIENCY FOR THE
PRODUCTION OF MULTIPLY CHARGED IONS C. P. GOPALARAMAN 419
BEAM-PLASMA TYPE ION SOURCE FOR HIGH-INTENSITY ION BEAM AND ITS
APPLICATION TO SURFACE MICRO-ANALYZER T. TAKAGI, I. YAMADA, J. ISHIKAWA,
F. SANO, AND T. KISHI 423
VAPOURIZED METAL CLUSTER ION SOURCE FOR ION PLATING T. TAKAGI, I.
YAMADA, K. YANAGAWA, M. KUNORI, AND S. KOBIYAMA 427
ION MILLING BY BEAM SCANNING TECHNIQUES-EFFECT OF BEAM DIAMETER ON
MILLED SURFACE SHAPE H. YASUDA 431
RF SPUTTER-ETCHING BY FLUORO-CHLORO-HYDROCARBON GASES N. HOSOKAWA, R.
MATSUZAKI, AND T. ASAMAKI 435
INTERACTION OF ION BEAMS WITH POLYMER SURFACES LEADING TO ETCHING AND
SPUTTERING PROCESSES
CH. WEISMTIANTEL, M. ROST, 0. FIEDLER, H.-J. ERLER, H. GIEGENGACK, AND
J. HORN 439
DEPOSITION AND PRODUCTION TECHNIQUES
RECENT ADVANCES IN ION PLATING D. M. MALTOX 443
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CONTENTS XV
ON THE APPLICATION OF ION PLATING TECHNIQUE TO TRIBOLOGY N. OHMAE, T.
NAKAI, AND T. TSUKIZOE 451
STUDY OF DEPOSITION PROCESS AND FILM PROPERTY IN ION PLATING K.
MATSUBARA, Y. ENOMOTO, G. YAGUCHI, M. WATANABE, AND R. YAMAZAKI 455
STRUCTURES OF GOLD THIN FILMS FORMED BY ION-PLATING Y. MURAYAMA 459
ON THE INFLUENCE OF OXYGEN AND WATER VAPOUR ON THE REACTIVE CONDENSATION
OF METAL OXIDES
K, O. J. KERNER : 463
INVESTIGATION OF THE REACTION OF COMPOUND FORMATION IN THE REACTIVE
EVAPORATION PROCESS A. ITOH AND S. MISAWA 467
LARGE AREA THIN FILMS OF HIGHLY UNIFORM THICKNESS VACUUM DEPOSITED IN A
STATIONARY SYSTEM H. J. SCHWARZ, R. C. MCCORD, AND A. NERKEN 471
PRODUCTION AND PROPERTIES OF TRANSPARENT ELECTROCONDUCTIVE COATING ON
POLYESTER FILM S. SOBAJIMA, H. OKANIWA, N. TAKAGI, I. SUGIYAMA, AND K.
CHIBA 475
THE PRODUCTION OF CONDUCTIVE AND TRANSPARENT THIN FILMS G. KIENEL AND G.
GALLUS 479
MULTI-CHANNEL CLOSED LOOP RATE MONITOR FOR MULTIPLE EVAPORATION SOURCES
J. L. TERRY AND J. D. MICHAELSEN 483
THIN-FILM TUNGSTEN FOR SILICON INTEGRATED CIRCUIT APPLICATIONS A. K.
SINHA 487
PREPARATION AND PROPERTIES OF ULTRA FINE METAL POWDERS
S. KASHU, M. NAGASE, C. HAYASHI, R. UYEDA, N. WADA, AND A. TASAKI 491
INORGANIC THIN FILM BY GLOW DISCHARGE TECHNIQUE
K. HORIGUCHI, A. SENDA, AND K. KURATA A-856
THIN FILM METALLIZATION AND PATTERN GENERATION TECHNIQUES A. PFAHNL
A-857
THEORETICAL DISTRIBUTION OF DEPOSITED FILM THICKNESS ON ROTATING
SUBSTRATES Y. KAWASHIMO A-857
LIAL AND LILN THIN FILMS BY SANDWICH-TYPE EVAPORATION METHOD H. KEZUKA
AND K. IWAMURA A-858
SPUTTERING
SPUTTERING IN THIN FILM ANALYSIS METHODS G. K. WEHNER 495
A STUDY OF THE NEUTRAL SPECIES RF SPUTTERED FROM OXIDE TARGETS J. W.
COBURN, E. TAGLAUER, AND E. KAY 501
MASS SPECTROMETRY ANALYSIS IN RF REACTIVE SPUTTERING DISCHARGE F.
SHINOKI AND A. ITOH 505
NEW DEVELOPMENTS IN ION BEAM SPUTTERING AND ETCHING TECHNIQUES CH.
WEISSMANIEL, 0. FIEDLER, G. REISSE, H.-J. ERLER, J. HERBERGER, U,
SCHEIT, AND
M. ROST 509
THE EFFECT OF THE LIGHT ELEMENTS NITROGEN, CARBON AND OXYGEN ON THE
PHYSICAL PROPERTIES OF SPUTTERED TANTALUM FILMS R. D. HUTTEMANN, J. M.
MORABITO, C. A. STEIDEL, AND D. GERSTENBERG 513
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XVI CONTENTS
STRUCTURE AND PROPERTIES OF CD^HG^TE FILMS G. COHEN-SOLAL, C. SELLA, D.
IMHOFF, AND A. ZOZIME 517
FILM RESISTORS OF TUBULAR TYPE PREPARED BY ASYMMETRIC AC SPUTTERING T.
MITSUOKA, Y. ONODERA, AND T. ENDO 521
MASS SPECTROSCOPY OF SPUTTERED NEUTRALS AND ITS APPLICATION FOR SURFACE
ANALYSIS H. OECHSNER AND W. GERHARD A-858
PRODUCTION OF THIN OXIDES FILMS BY SPUTTERING IN A RING DISCHARGE M.
HECQ AND J. VAN CAKENBERGHE A-859
FILM GROWTH
*IN SITU ELECTRON MICROSCOPY OF THIN FILM GROWTH J. F. POCZA, A. BARNA,
P. B. BARNA, I. POZSGAI, AND G. RADNOCZI 525
IN SITU ELECTRON MICROSCOPY OF THIN FILM GROWTH ON CLEAN SUBSTRATE IN
CLEAN VACUUM I. TECHNIQUE
K. TAKAYANAGI, K. YAGI, K, KOBAYASHI, AND G. HONJO 533
IN SITU ELECTRON MICROSCOPY OF THIN FILM GROWTH ON CLEAN SUBSTRATE IN
CLEAN VACUUM II. APPLICATIONS
G.-HONJO, K. TAKAYANAGI, K. KOBAYASHI, AND K. YAGI 537
AN UHV EVAPORATOR FOR THIN FILM GROWTH STUDY G, TOMINAGA, C. HAYASHI, K.
TAKEUCHI, G. SHINOHARA, AND K. KINOSITA 541
RECENT DEVELOPMENTS IN THE THEORY OFTHIN FILM CONDENSATION G.
ZINSMEISTER 545
DEPENDENCE OF GROWTH AND PHYSICAL PROPERTIES OF FILMS ON THE STATE OF
THE SUBSTRATE O, S. HEAVENS 551
EVIDENCE OF THE EFFECT OF NUCLEUS SPATIAL DISTRIBUTIONS ON THIN FILM
GROWTH KINETICS J. L. ROBINS, A. J. DONOHOE, AND B. F. USHER 559
HETEROGENEOUS NUCLEATION AND GROWTH OF GOLD ON SUBSTRATES R. ANTON, M,
HARSDORIT, M, PAUNOV, AND H. SCHMEISSER 563
GROWTH MODE DISCRIMINATION OF THIN FILMS BY AUGER ELECTRON SPECTROSCOPY
Y. MATSUSHITA, K. YAGI, T. NARUSAWA, AND G. HONJO 567
SURFACE DIFFUSION DISTANCES OF BISMUTH ADATOMS ON MICA SURFACE H.
TERAJIMA AND S. FUJIWARA 571
STRESS IN EPITAXED AND RANDOMLY ORIENTED FILMS OF AG, CU AND AU ON MICA
Y. NAKAJIMA AND K. KINOSITA 575
INTERNAL STRESS AND GROWTH OF GOLD EVAPORATED FILMS IN U.H.V.
F. SHOJI AND S. NAGATA
579
THE SIGNIFICANCE OF CERTAIN CRYSTAL PARAMETERS IN EPITAXIAL GROWTH J. H.
VAN DER MERWE AND F. D. AURET 583
GROWTH OF AU FILM ON GAAS (110) OBSERVED BY LEED AND AES K. TAKEDA, T.
HANAWA, AND T. SHIMOJO 589
LF.HD STUDY OF THE GROWTH OF SILVER FILM ON GAP SURFACE N. MIYATA AND T.
HANAWA
593
GEOMETRIC FACTORS INFLUENCING EPITAXY IN THE NICKEL-SILVER AND
SILVER-NICKEL SYSTEMS H. JAEGER AND R. G. SHERWOOD 597
IMAGE 10
CONTENTS XVII
CRYSTALLINITY AND EPITAXY OF EVAPORATED GERMANIUM FILMS ON SODIUM
CHLORIDE SUBSTRATES
S. C. CHANG AND G. SHIMAOKA 601
ELECTRONMICROSCOPICAL STUDIES OF U02 THIN FILMS EVAPORATED ON NACL
SUBSTRATES WITH COLLOIDAL CONTRES
F. VASILIU, V. TOPA, N. G. POPESCU-POGRION, AND M. I. BIRJEGA 605
HOMOEPITAXIAL GROWTH OF SILICON FILMS BY ION SPUTTERING L. N.
ALEKSANDROV AND R. N. LOVYAGIN 609
EPITAXIAL DEPOSITION OF NIOBIUM NITRIDE BY SPUTTERING
S. KOSAKA AND Y. ONODERA 613
BROWNIAN MOTION OF CRYSTALLITES ON A SURFACE IN ITS RELATION TO EPITAXY
A. MASSON A-859
NUCLEUS GROWTH RATE OF VACUUM-DEPOSITED THIN FILMS S. FUJIWARA, H.
TERAJIMA, AND S. OZAWA
A-860
LEED-AES STUDY ON CLEAN (001) IRON SURFACE T. KANAJI, J. MAMEDA, AND S.
NAGATA
A-860
DIFFUSION AND PHASE TRANSITION
MISFIT DISLOCATION ENERGY IN A CRYSTAL WITH LATTICE PARAMETER GRADIENT
G. G. CILLI6 AND J. H. VAN DER MERWE
... 617
INTERDIFFUSION IN NI/AU AND NI-FE/AU THIN FILM DIFFUSION COUPLES A.
GANGULEE 621
ELECTROMIGRATION AND DIFFUSION IN NI~FE THIN FILMS A. GANGULEE AND F. M.
D HEURLE 625
CRITICAL THICKNESS FOR LOSS OF COHERENCY IN EPITAXIAL BIMETALS
K. SHINOHARAAND J. P. HIRTH 629
ROOM TEMPERATURE INTERACTION IN BIMETALLIC THIN FILM COUPLES K. N. TU
AND R. ROSENBERG 633
ION BACKSCATTERING ANALYSIS OFMIXING IN AU-CU AND AU-AL THIN FILMS S. U.
CAMPISANO, G. FOTI, F. GRASSO, AND E. RIMINI 637
ELECTROTRANSPORT OF SN-RICH LIQUID ZONES IN THIN METAL FILMS
J. K. HOWARD
641
RECOVERY PROCESS AND METASTABLE CRYSTALS IN VACUUM CO-DEPOSITED MN-AL
FILMS
K. YOSHIDA, S. KAWAGUCHI, AND S. NAGATA
645
CHANGE IN ELECTRICAL RESISTIVITY DURING AMORPHOUS-CRYSTALLINE PHASE
TRANSITION OF
ANTIMONY FILMS K. MAKI
649
STUDY OF PHASE TRANSFORMATION OF TITANIUM IN THE FORM OF NEEDLES AND
EVAPORATED FILMS
USING A FIELD EMISSION MICROSCOPE D. RAMANATHAN, N. VENKATRAMANI, AND P.
VIJENDRAN
653
EFFECT OF GRAIN BOUNDARIES AND LOCAL VARIATION INFLUENCE OF CURRENT
DENSITY AND
TEMPERATURE ON THE ELECTROMIGRATION DAMAGE IN GOLD THIN FILMS
J. C. ROUAIS, G. LORMAND, AND M. CHEVRETON A-861
ANALYSIS OF FILMS
MASS TRANSPORT BETWEEN TWO METAL LAYERS AS STUDIED BY ION SCATTERING S.
T. PICRAUX 657
IMAGE 11
XVIII CONTENTS
THE COMBINATION OF SIMS AND AES FOR THE ANALYSIS OF THIN FILMS R. BUHL,
W. K. HUBER, AND E. LOBACH 665
EPITAXIAL GROWTH OF NICKEL SILICIDE NISI2 ON SILICON
K. N. TU, E. I. ALESSANDRINI, W. K. CHU, H. KRAUTLE AND J. W. MAYER 669
AUGER AND ELLIPSOMETRIC STUDY OF PHOSPHORUS SEGREGATION IN OXIDIZED
DEGENERATE SILICON N.J. CHOU, Y. J. VAN DER MEULEN, R. HAMMER, AND J.
CAHILL A-861
OPTICAL FILMS AND OPTICAL PROPERTIES
ANALYSIS OF THIN FILMS BY INLCRFCROMETRIC ELLIPSOMETRY H. F. HAZEBROEK
AND A. A. HOLSEHCR 673
OPTICAL EFFECT OF THE SUBSTRATE ON THE PLASMA RESONANCE ABSORPTION OF AN
AGGREGATED
SILVER FILM
T. YAMAGUCHI AND A, KINBARA 677
OPTICAL PROPERTIES OF RF TRIODE-SPUTTERED THIN GOLD FILMS
R. COMELY AND N. FUSCHILLO 681
VARIABLE AND GRADIENT REFRACTIVE INDEX MULTILAYER FILMS OF DIFFERENT
MATERIALS S. K. SHARMA, V. N. YUDAVA, AND K. L. CHOPRA 685
MEASUREMENTS OF SPECTRAL CHARACTERISTICS OF OPTICAL THIN-FILM BY RAPID
SCANNING SPECTROPHOTOMETER R. HIRAGA, N. SUGAWARA, S. OGURA, AND S.
AMANO 689
MODERN INSTRUMENTATION FOR THE OPTICAL CONTROL OF THIN FILM FABRICATION
IN HIGH VACUUM I. WILMANNS 693
FABRICATION OF LITHIUM NIOBATE LIGHT GUIDING FILMS L. M. REIBER, D. B.
OSTROWSKY, J. Y. ROBIC, AND M. PAPUEHON 697
OPTICAL CHARACTERISTICS OF CORNING 7059 GLASS FILMS DEPOSITED BY RF
SPUTTERING
Y. SHIMOMOLO, H. MATSUMARU, AND T. NISHIMURA 701
MINIMIZING INTERACTIONS OF GASES IN CONTAMINATING THIN FILMS DURING
CHARGED PARTICLE BOMBARDMENT R. R. BROWN 705
*PLASMA OSCILLATIONS IN METAL FILMS E. KRETSCHMANN A 862
ULTRA-MICROHARDNESS OF SOME VACUUM-DEPOSITED FILMS M. NISHIBORIAND K.
KINOSITA A 862
ELECTRICAL PROPERTIES
NITROGEN DOPED TA AL THIN FILMS BY DC SPUTTERING J. YAMA*/AKI, T. KAMA,
AND M. NAKAMURA 709
RCACTIVCLY SPUTTERED PLATINUM OXIDE FILMS W. I). WESTWOOD AND C. D.
IKNNEWIT/ 713
ON THE SWITCHING PHENOMENA OF DISCONTINUOUS GOLD FILMS S. K. DEY AND CJ.
D. DICK 717
ELECTRICAL AND GALVANOMAGNELIC PROPERTIES OF BISMUTH-12 ATOMIC PERCENT
ANTIMONY
POLYCRYSTULLINE THIN FILMS
R. P. AGARWALA V. C. GEORGE, AND A. K DIM 721
IMAGE 12
CONTENTS XIX
UTILIZATION OF CHANGE IN BARRIER HEIGHT FOR DETERMINATION OF THE
ENERGY-MOMENTUM
RELATIONSHIP IN TUNNEL JUNCTIONS
K. H. GUNDLACH AND J. KADLEC 725
ELECTRICAL AND MAGNETIC PROPERTIES OF PURE AMORPHOUS COBALT FILMS M. L.
KWAN AND R. W. HOFFMAN 729
INVESTIGATION OF IRON FILMS BY INTERNAL CONVERSION ELECTRONS EMITTED
AFTER THE M6SSBAUER
EXCITATION
T. TORIYAMA, M. KIGAWA, M. FUJIOKA, AND K. HISATAKE 733
QUANTUM SIZE EFFECT IN THIN BISMUTH FILMS AND THEIR STRUCTURE H. ASAHI,
T. HUMOTO, AND A. KAWAZU A-863
THERMOELECTRIC VOLTAGE AND RESISTIVITY OF METALLIC SINGLE CRYSTALLINE
THIN FILM EPITAXIALLY GROWN BY VACUUM DEPOSITION T.OTA A-863
ALUMINUM OXIDE FILMS PREPARED BY ELECTRON BEAM EVAPORATION OF SAPPHIRE
S. OKAZAKI, M. KUSAKA, AND M. KANAKURA A-864
STRESS AND GRAIN STURCTURE OF MAGNETIC THIN FILMS RELATED TO THE
PERPENDICULAR ANISOTROPY H. KONNO A-864
DIELECTRIC FILMS
PHYSICAL STRUCTURE OF DC DIODE SPUTTERED ZNO FILMS AND ITS INFLUENCE ON
THE EFFECTIVE
ELECTROMECHANICAL COUPLING FACTORS N. CHUBACHI, M. MINAKATA, AND Y.
KIKUCHI 737
PREFERRED ORIENTATION IN RF-SPUTTERED ZNO FILMS H. W. LEHMANN AND R.
WIDMER 741
SURFACE WAVE TRANSDUCERS OF ZNO FILMS WITH CONTROLLED DIRECTION OF
C-AXIS
K. WASA, K. OHJI, 0. YAMAZAKI, AND S. HAYAKAWA 745
PROPERTIES OF LINB03 THIN FILMS FABRICATED BY RF SPUTTERING
S. FUKUNISHI, A. KAWANA, N. UCHIDA, AND J. NODA
749
HYDROPHOBIC CONVERSION OF THE CHEMICAL-VAPOR-DEPOSITED SI02 SURFACE H.
YANAZAWA, H. UTSUGI, N. HASHIMOTO, AND M. ASHIKAWA 753
WATER ADSORPTION ON CHEMICALLY VAPOR-DEPOSITED GLASS FILMS E. ARAI, Y.
TERUNUMA, AND C. TADACHI 757
OPTICAL PROPERTIES OF REACTIVELY-EVAPORATED SILICON OXYNITRIDE FILMS
M. MASHITA AND K. MATSUSHIMA 761
THE GROWTH OF POTASSIUM CHLORIDE CRYSTALLITES DURING THE EVAPORATION IN
ARGON ATMOSPHERE H. WASHIDA AND K. KOBAYASHI 765
PROPERTIES OF ZNS FILMS EVAPORATED IN HIGH VACUUM
A. PREISINGER AND H. K. PULKER
769
SEMICONDUCTOR FILMS
IMPEDANCE MEASUREMENTS TO STUDY SEMICONDUCTOR SURFACE AND THIN
INSULATING FILMS ON
ITS SURFACE
J. NISHIZAWA, M. KOYANAGI, AND M. KIMURA
773
IMAGE 13
XX CONTENTS
THERMAL CONDUCTIVITY OF AMORPHOUS VS. CRYSTALLINE GE AND GETE FILMS P.
NATH AND K. L. CHOPRA 781
X-RAY PHOTOEMISSION STUDY OF AMORPHOUS TELLURIUM T. ICHIKAWA 785
PREPARATION OF HIGH MOBILITY TELLURIUM FILMS
K. OKUYAMA AND Y. KUMAGAI 789
MOBILITY-DEPENDENT FIELD-EFFECT CONDUCTION OF VACUUM-DEPOSITED CDSE
LAYERS Y. KUMAGAI AND K. OKUYAMA 793
AN UNUSUAL CURRENT OSCILLATION PHENOMENON IN CDSE FILM EVAPORATED ON
GLASS SUBSTRATE
S. K. DEY 797
INVESTIGATIONS IN POLYCRYSTALLINE CDS-FILMS
R. KASSINGANDW. BAX 801
HEED AND EM STUDY OF OBLIQUELY DEPOSITED CADMIUM TELLURIDE FILMS N. G.
DHERE, R. G. PINHEIRO, AND N. R. PARIKH 805
ELECTROLUMINESCENCE IN ZNS: MNX: CU,, RF-SPUTTERED FILMS J. J. HANAK 809
SWITCHING AND NEGATIVE RESISTANCE BEHAVIOR OF AG/ASI/AG THIN FILM
STRUCTURES L. MEI AND J. E. GREENE 813
NON-LINEAR TRANSPORT AND SWITCHING PROPERTIES OF TRANSITION METAL OXIDES
N. FUSCHILLO AND B. LALEVIC 817
THE PROPERTIES OF THIN EPITAXIAL PBTE FILMS PREPARED UNDER VERY CLEAN
AND CLOSELY MONITORED CONDITIONS E. H. C. PARKER AND D. WILLIAMS A-865
PBISN1_J.TE LAYERS BY R.F. MULTICATHODE SPUTTERING C. CORSI A-865
APPLICATIONS OF FILMS
COMPUTER CONTROLLED MOLECULAR BEAM EPITAXY L. ESAKI 821
MEASUREMENTS OF LOCAL LATTICE STRAINS NEAR INSULATING FILM EDGES IN
SILICON CRYSTALS Y. YUKIMOTO AND T. HIRAO 829
THIN-FILM CRYOGENIC AMPLIFIER G.KRAMER .... 833
EXPERIMENTAL STUDIES IN REGARD TO AN ELECTROSTATIC THIN FILM RELAY R.
CHABICOVSKY AND E. SCIRI 837
RELATIVE THERMAL STABILITIES OF THIN-FILM CONTACTS TO N-GAAS METALLIZED
WITH W, AU AND PT A. K. SINHAAND J. M. POATE 841
» PROCESS IN THE PRODUCTION OF MULTI-LAYER PRINTED CIRCUITS USING VACUUM
DEPOSITION
W. FLEISCHER, K. PETZOLD, H. BOLLINGER, AND E. GORING 845
ON THE READHESION OF ONCE SPLIT FILMS I. B. YOON 849
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| genre_facet | Konferenzschrift 1974 Kioto |
| id | DE-604.BV001954853 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T15:37:51Z |
| institution | BVB |
| institution_GND | (DE-588)5172485-6 |
| language | Undetermined |
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| physical | XX,871 S. |
| publishDate | 1974 |
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| publisher | Physical Soc. of Japan |
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| series2 | [Japanese journal of applied physics / Supplement] |
| spelling | International Vacuum Congress 6 1974 Kyōto Verfasser (DE-588)5172485-6 aut Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan Tokyo Physical Soc. of Japan 1974 XX,871 S. txt rdacontent n rdamedia nc rdacarrier [Japanese journal of applied physics / Supplement] 13,1 Einzelaufnahme eines ZS-Bandes Vakuumtechnik (DE-588)4062270-8 gnd rswk-swf Festkörperoberfläche (DE-588)4127823-9 gnd rswk-swf Oberflächenphysik (DE-588)4134881-3 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1974 Kioto gnd-content Oberflächenphysik (DE-588)4134881-3 s DE-604 Festkörperoberfläche (DE-588)4127823-9 s Vakuumtechnik (DE-588)4062270-8 s Supplement] [Japanese journal of applied physics 13,1 (DE-604)BV001888390 13,1 GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=001274306&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan Vakuumtechnik (DE-588)4062270-8 gnd Festkörperoberfläche (DE-588)4127823-9 gnd Oberflächenphysik (DE-588)4134881-3 gnd |
| subject_GND | (DE-588)4062270-8 (DE-588)4127823-9 (DE-588)4134881-3 (DE-588)1071861417 |
| title | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| title_auth | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| title_exact_search | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| title_full | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| title_fullStr | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| title_full_unstemmed | Proceedings of the sixth International Vacuum Congress March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| title_short | Proceedings of the sixth International Vacuum Congress |
| title_sort | proceedings of the sixth international vacuum congress march 25 29 1974 kyoto international conference hall kyoto japan |
| title_sub | March 25-29,1974 Kyoto International Conference Hall Kyoto, Japan |
| topic | Vakuumtechnik (DE-588)4062270-8 gnd Festkörperoberfläche (DE-588)4127823-9 gnd Oberflächenphysik (DE-588)4134881-3 gnd |
| topic_facet | Vakuumtechnik Festkörperoberfläche Oberflächenphysik Konferenzschrift 1974 Kioto |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=001274306&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV001888390 |
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