Materials for microlithography: radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | Undetermined |
| Veröffentlicht: |
Washington, DC
1984
|
| Schriftenreihe: | American Chemical Society: ACS symposium series
266 |
| Schlagworte: | |
| Beschreibung: | VIII, 494 S. Ill. |
| ISBN: | 0841208719 |
Internformat
MARC
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| 245 | 1 | 0 | |a Materials for microlithography |b radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 |c L. F. Thompson, ed. ... |
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| genre_facet | Konferenzschrift 1984 Saint Louis Mo. |
| id | DE-604.BV000487121 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T15:14:42Z |
| institution | BVB |
| isbn | 0841208719 |
| language | Undetermined |
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| physical | VIII, 494 S. Ill. |
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| publishDate | 1984 |
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| series | American Chemical Society: ACS symposium series |
| series2 | American Chemical Society: ACS symposium series |
| spelling | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 L. F. Thompson, ed. ... Washington, DC 1984 VIII, 494 S. Ill. txt rdacontent n rdamedia nc rdacarrier American Chemical Society: ACS symposium series 266 Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Material (DE-588)4169078-3 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1984 Saint Louis Mo. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s Material (DE-588)4169078-3 s DE-604 Thompson, Larry F. Sonstige oth American Chemical Society: ACS symposium series 266 (DE-604)BV000003091 266 |
| spellingShingle | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 American Chemical Society: ACS symposium series Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Material (DE-588)4169078-3 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)4169078-3 (DE-588)1071861417 |
| title | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 |
| title_auth | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 |
| title_exact_search | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 |
| title_full | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 L. F. Thompson, ed. ... |
| title_fullStr | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 L. F. Thompson, ed. ... |
| title_full_unstemmed | Materials for microlithography radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 L. F. Thompson, ed. ... |
| title_short | Materials for microlithography |
| title_sort | materials for microlithography radiation sensitive polymers based on a symposium at the 187th meeting of the american chem soc st louis missouri april 8 13 1984 |
| title_sub | radiation-sensitive polymers ; based on a symposium ... at the 187th meeting of the American Chem. Soc., St. Louis, Missouri, April 8 - 13, 1984 |
| topic | Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Material (DE-588)4169078-3 gnd |
| topic_facet | Fotolithografie Halbleitertechnologie Material Konferenzschrift 1984 Saint Louis Mo. |
| volume_link | (DE-604)BV000003091 |
| work_keys_str_mv | AT thompsonlarryf materialsformicrolithographyradiationsensitivepolymersbasedonasymposiumatthe187thmeetingoftheamericanchemsocstlouismissouriapril8131984 |