Verfügbarkeit: Hafnium : :: THWS Bibkatalog

Hafnium :: chemical characteristics, production. and applications /

Hafnium is a chemical element with the symbol Hf and atomic number 72. This book brings together contributions from experts in their related fields to illustrate the significance and importance of hafnium in different forms. This book is composed of six chapters written by experts in their respectiv...

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Bibliographische Detailangaben
Weitere Verfasser:	Yu, Hongyu, 1976- (HerausgeberIn)
Format:	Elektronisch E-Book
Sprache:	English
Veröffentlicht:	Hauppauge, New York : Nova Science Publishers, Inc., [2014]
Schriftenreihe:	Chemistry research and applications series.
Schlagworte:	Hafnium. Transition metals. Thin films. Hafnium Métaux de transition. Couches minces. TECHNOLOGY & ENGINEERING > Chemical & Biochemical. Thin films Transition metals
Online-Zugang:	Volltext
Zusammenfassung:	Hafnium is a chemical element with the symbol Hf and atomic number 72. This book brings together contributions from experts in their related fields to illustrate the significance and importance of hafnium in different forms. This book is composed of six chapters written by experts in their respective fields making this book valuable to the group-IV materials science communities. The subjects presented in the book offer a general overview of the important issues of various hafnium compounds, e.g. Hafnium nitride/Hafnium carbide application as a coating material, and Hafnium oxide application as.
Beschreibung:	1 online resource
Bibliographie:	Includes bibliographical references and index.
ISBN:	9781634631969 163463196X

Internformat

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505	0		\|a HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; Library of Congress Cataloging-in-Publication Data; CONTENTS; PREFACE; Chapter 1: A Review on Hafnium: Synthesis, Properties and Applications of Variety of Hafnium Compounds ; ABSTRACT; INTRODUCTION; PROPERTIES OF HAFNIUM; APPLICATIONS AND EFFECTS OF HAFNIUM; HAFNIUM COMPOUNDS; HAFNIUM COMPLEXES; HAFNIUM NANOCOMPOSITES; CONCLUSION; REFERENCES; Chapter 2: Mechanical Engineering of Hafnium with Metal Transition Multilayers; ABSTRACT; INTRODUCTION
505	8		\|a EXPERIMENTAL DETAILS OF MECHANICAL ENGINEERING OF HAFNIUM WITH METAL TRANSITION MULTILAYERSRESULTS AND DISCUSSION; ADHESION BEHAVIOR OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; CONCLUSION OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; ACKNOWLEDGMENTS; REFERENCES; Chapter 3: Hafnium Carbide Coating: Properties of Bulk, Surface and Metal/HfC Interfaces; ABSTRACT; INTRODUCTION; BULK PROPERTIES; ELECTRONIC PROPERTIES AND BONDING; PHYSICAL AND MECHANICAL PROPERTIES; HfC SURFACE PROPERTIES; METAL/HfC INTERFACES; CONCLUSION; REFERENCES
505	8		\|a Chapter 4: Stabilization of Higher Symmetry Hfo2 Polymorphs As Thin Films and NanoparticlesABSTRACT; INTRODUCTION; HfO2 COMPOUND; HfO2 THIN FILMS; HfO2 NANOPOWDER; CONCLUSION; PARTICIPANTS; ACKNOWLEDGMENTS; REFERENCES; Chapter 5: Hafnium-Based Thin Oxides: Versatile Insulators for Microelectronics ; ABSTRACT; INTRODUCTION; RESISTIVE SWITCHING IN HIGH-K THIN FILMS; NANOSCALE ELECTRICAL CHARACTERIZATION; NANOSCALE ELECTRICAL PROPERTIES HAFNIUM OXIDES; PHYSICAL ORIGIN OF RESISTIVE SWITCHINGIN HAFNIUM OXIDES; CONCLUSION; REFERENCES
505	8		\|a Chapter 6: Ultrathin Hafnium-Based High-K Dielectrics for High-K-Last/Gate-Last CMOS Integration Scheme ABSTRACT; INTRODUCTION; EXPERIMENTAL; PHYSICAL CHARACTERIZATION OF HFO2/SIO2/SI STACK; REMOTE SCAVENGING TECHNOLOGY USING A TI SCAVENGING LAYER AND A TIN BARRIER LAYER ON HFO2 DIELECTRIC; HIGH-K PERFORMANCE IMPROVEMENT THROUGH MULTI-DPOSITION-MULTI-ANNEALING(MDMA) TECHNIQUE; CONCLUSION; REFERENCES; Blank Page; INDEX
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546			\|a English.
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650		0	\|a Transition metals. \|0 http://id.loc.gov/authorities/subjects/sh85136954
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Datensatz im Suchindex

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contents	HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; Library of Congress Cataloging-in-Publication Data; CONTENTS; PREFACE; Chapter 1: A Review on Hafnium: Synthesis, Properties and Applications of Variety of Hafnium Compounds ; ABSTRACT; INTRODUCTION; PROPERTIES OF HAFNIUM; APPLICATIONS AND EFFECTS OF HAFNIUM; HAFNIUM COMPOUNDS; HAFNIUM COMPLEXES; HAFNIUM NANOCOMPOSITES; CONCLUSION; REFERENCES; Chapter 2: Mechanical Engineering of Hafnium with Metal Transition Multilayers; ABSTRACT; INTRODUCTION EXPERIMENTAL DETAILS OF MECHANICAL ENGINEERING OF HAFNIUM WITH METAL TRANSITION MULTILAYERSRESULTS AND DISCUSSION; ADHESION BEHAVIOR OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; CONCLUSION OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; ACKNOWLEDGMENTS; REFERENCES; Chapter 3: Hafnium Carbide Coating: Properties of Bulk, Surface and Metal/HfC Interfaces; ABSTRACT; INTRODUCTION; BULK PROPERTIES; ELECTRONIC PROPERTIES AND BONDING; PHYSICAL AND MECHANICAL PROPERTIES; HfC SURFACE PROPERTIES; METAL/HfC INTERFACES; CONCLUSION; REFERENCES Chapter 4: Stabilization of Higher Symmetry Hfo2 Polymorphs As Thin Films and NanoparticlesABSTRACT; INTRODUCTION; HfO2 COMPOUND; HfO2 THIN FILMS; HfO2 NANOPOWDER; CONCLUSION; PARTICIPANTS; ACKNOWLEDGMENTS; REFERENCES; Chapter 5: Hafnium-Based Thin Oxides: Versatile Insulators for Microelectronics ; ABSTRACT; INTRODUCTION; RESISTIVE SWITCHING IN HIGH-K THIN FILMS; NANOSCALE ELECTRICAL CHARACTERIZATION; NANOSCALE ELECTRICAL PROPERTIES HAFNIUM OXIDES; PHYSICAL ORIGIN OF RESISTIVE SWITCHINGIN HAFNIUM OXIDES; CONCLUSION; REFERENCES Chapter 6: Ultrathin Hafnium-Based High-K Dielectrics for High-K-Last/Gate-Last CMOS Integration Scheme ABSTRACT; INTRODUCTION; EXPERIMENTAL; PHYSICAL CHARACTERIZATION OF HFO2/SIO2/SI STACK; REMOTE SCAVENGING TECHNOLOGY USING A TI SCAVENGING LAYER AND A TIN BARRIER LAYER ON HFO2 DIELECTRIC; HIGH-K PERFORMANCE IMPROVEMENT THROUGH MULTI-DPOSITION-MULTI-ANNEALING(MDMA) TECHNIQUE; CONCLUSION; REFERENCES; Blank Page; INDEX
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discipline	Chemie / Pharmazie
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series	Chemistry research and applications series.
series2	Chemistry research and applications
spelling	Hafnium : chemical characteristics, production. and applications / editor, HongYu Yu (South University of Science, Technology of China, Shenzhen, China). Hauppauge, New York : Nova Science Publishers, Inc., [2014] 1 online resource text txt rdacontent computer c rdamedia online resource cr rdacarrier Chemistry research and applications Includes bibliographical references and index. Print version record. HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; Library of Congress Cataloging-in-Publication Data; CONTENTS; PREFACE; Chapter 1: A Review on Hafnium: Synthesis, Properties and Applications of Variety of Hafnium Compounds ; ABSTRACT; INTRODUCTION; PROPERTIES OF HAFNIUM; APPLICATIONS AND EFFECTS OF HAFNIUM; HAFNIUM COMPOUNDS; HAFNIUM COMPLEXES; HAFNIUM NANOCOMPOSITES; CONCLUSION; REFERENCES; Chapter 2: Mechanical Engineering of Hafnium with Metal Transition Multilayers; ABSTRACT; INTRODUCTION EXPERIMENTAL DETAILS OF MECHANICAL ENGINEERING OF HAFNIUM WITH METAL TRANSITION MULTILAYERSRESULTS AND DISCUSSION; ADHESION BEHAVIOR OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; CONCLUSION OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; ACKNOWLEDGMENTS; REFERENCES; Chapter 3: Hafnium Carbide Coating: Properties of Bulk, Surface and Metal/HfC Interfaces; ABSTRACT; INTRODUCTION; BULK PROPERTIES; ELECTRONIC PROPERTIES AND BONDING; PHYSICAL AND MECHANICAL PROPERTIES; HfC SURFACE PROPERTIES; METAL/HfC INTERFACES; CONCLUSION; REFERENCES Chapter 4: Stabilization of Higher Symmetry Hfo2 Polymorphs As Thin Films and NanoparticlesABSTRACT; INTRODUCTION; HfO2 COMPOUND; HfO2 THIN FILMS; HfO2 NANOPOWDER; CONCLUSION; PARTICIPANTS; ACKNOWLEDGMENTS; REFERENCES; Chapter 5: Hafnium-Based Thin Oxides: Versatile Insulators for Microelectronics ; ABSTRACT; INTRODUCTION; RESISTIVE SWITCHING IN HIGH-K THIN FILMS; NANOSCALE ELECTRICAL CHARACTERIZATION; NANOSCALE ELECTRICAL PROPERTIES HAFNIUM OXIDES; PHYSICAL ORIGIN OF RESISTIVE SWITCHINGIN HAFNIUM OXIDES; CONCLUSION; REFERENCES Chapter 6: Ultrathin Hafnium-Based High-K Dielectrics for High-K-Last/Gate-Last CMOS Integration Scheme ABSTRACT; INTRODUCTION; EXPERIMENTAL; PHYSICAL CHARACTERIZATION OF HFO2/SIO2/SI STACK; REMOTE SCAVENGING TECHNOLOGY USING A TI SCAVENGING LAYER AND A TIN BARRIER LAYER ON HFO2 DIELECTRIC; HIGH-K PERFORMANCE IMPROVEMENT THROUGH MULTI-DPOSITION-MULTI-ANNEALING(MDMA) TECHNIQUE; CONCLUSION; REFERENCES; Blank Page; INDEX Hafnium is a chemical element with the symbol Hf and atomic number 72. This book brings together contributions from experts in their related fields to illustrate the significance and importance of hafnium in different forms. This book is composed of six chapters written by experts in their respective fields making this book valuable to the group-IV materials science communities. The subjects presented in the book offer a general overview of the important issues of various hafnium compounds, e.g. Hafnium nitride/Hafnium carbide application as a coating material, and Hafnium oxide application as. English. Hafnium. http://id.loc.gov/authorities/subjects/sh85058238 Transition metals. http://id.loc.gov/authorities/subjects/sh85136954 Thin films. http://id.loc.gov/authorities/subjects/sh85134864 Hafnium https://id.nlm.nih.gov/mesh/D006195 Hafnium. Métaux de transition. Couches minces. TECHNOLOGY & ENGINEERING Chemical & Biochemical. bisacsh Hafnium fast Thin films fast Transition metals fast Yu, Hongyu, 1976- editor. https://id.oclc.org/worldcat/entity/E39PCjtC7Y96TFjH4P8f8Mmq73 http://id.loc.gov/authorities/names/n2014058837 has work: Hafnium (Text) https://id.oclc.org/worldcat/entity/E39PCFFwH77YjmycxPb6dKbMmq https://id.oclc.org/worldcat/ontology/hasWork Print version: Hafnium 9781634631648 (DLC) 2014037731 (OCoLC)891122334 Chemistry research and applications series. http://id.loc.gov/authorities/names/no2010013392 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=928702 Volltext
spellingShingle	Hafnium : chemical characteristics, production. and applications / Chemistry research and applications series. HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; HAFNIUM: CHEMICAL CHARACTERISTICS, PRODUCTION AND APPLICATIONS; Library of Congress Cataloging-in-Publication Data; CONTENTS; PREFACE; Chapter 1: A Review on Hafnium: Synthesis, Properties and Applications of Variety of Hafnium Compounds ; ABSTRACT; INTRODUCTION; PROPERTIES OF HAFNIUM; APPLICATIONS AND EFFECTS OF HAFNIUM; HAFNIUM COMPOUNDS; HAFNIUM COMPLEXES; HAFNIUM NANOCOMPOSITES; CONCLUSION; REFERENCES; Chapter 2: Mechanical Engineering of Hafnium with Metal Transition Multilayers; ABSTRACT; INTRODUCTION EXPERIMENTAL DETAILS OF MECHANICAL ENGINEERING OF HAFNIUM WITH METAL TRANSITION MULTILAYERSRESULTS AND DISCUSSION; ADHESION BEHAVIOR OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; CONCLUSION OF HAFNIUM WITH METAL TRANSITION MULTILAYERS; ACKNOWLEDGMENTS; REFERENCES; Chapter 3: Hafnium Carbide Coating: Properties of Bulk, Surface and Metal/HfC Interfaces; ABSTRACT; INTRODUCTION; BULK PROPERTIES; ELECTRONIC PROPERTIES AND BONDING; PHYSICAL AND MECHANICAL PROPERTIES; HfC SURFACE PROPERTIES; METAL/HfC INTERFACES; CONCLUSION; REFERENCES Chapter 4: Stabilization of Higher Symmetry Hfo2 Polymorphs As Thin Films and NanoparticlesABSTRACT; INTRODUCTION; HfO2 COMPOUND; HfO2 THIN FILMS; HfO2 NANOPOWDER; CONCLUSION; PARTICIPANTS; ACKNOWLEDGMENTS; REFERENCES; Chapter 5: Hafnium-Based Thin Oxides: Versatile Insulators for Microelectronics ; ABSTRACT; INTRODUCTION; RESISTIVE SWITCHING IN HIGH-K THIN FILMS; NANOSCALE ELECTRICAL CHARACTERIZATION; NANOSCALE ELECTRICAL PROPERTIES HAFNIUM OXIDES; PHYSICAL ORIGIN OF RESISTIVE SWITCHINGIN HAFNIUM OXIDES; CONCLUSION; REFERENCES Chapter 6: Ultrathin Hafnium-Based High-K Dielectrics for High-K-Last/Gate-Last CMOS Integration Scheme ABSTRACT; INTRODUCTION; EXPERIMENTAL; PHYSICAL CHARACTERIZATION OF HFO2/SIO2/SI STACK; REMOTE SCAVENGING TECHNOLOGY USING A TI SCAVENGING LAYER AND A TIN BARRIER LAYER ON HFO2 DIELECTRIC; HIGH-K PERFORMANCE IMPROVEMENT THROUGH MULTI-DPOSITION-MULTI-ANNEALING(MDMA) TECHNIQUE; CONCLUSION; REFERENCES; Blank Page; INDEX Hafnium. http://id.loc.gov/authorities/subjects/sh85058238 Transition metals. http://id.loc.gov/authorities/subjects/sh85136954 Thin films. http://id.loc.gov/authorities/subjects/sh85134864 Hafnium https://id.nlm.nih.gov/mesh/D006195 Hafnium. Métaux de transition. Couches minces. TECHNOLOGY & ENGINEERING Chemical & Biochemical. bisacsh Hafnium fast Thin films fast Transition metals fast
subject_GND	http://id.loc.gov/authorities/subjects/sh85058238 http://id.loc.gov/authorities/subjects/sh85136954 http://id.loc.gov/authorities/subjects/sh85134864 https://id.nlm.nih.gov/mesh/D006195
title	Hafnium : chemical characteristics, production. and applications /
title_auth	Hafnium : chemical characteristics, production. and applications /
title_exact_search	Hafnium : chemical characteristics, production. and applications /
title_full	Hafnium : chemical characteristics, production. and applications / editor, HongYu Yu (South University of Science, Technology of China, Shenzhen, China).
title_fullStr	Hafnium : chemical characteristics, production. and applications / editor, HongYu Yu (South University of Science, Technology of China, Shenzhen, China).
title_full_unstemmed	Hafnium : chemical characteristics, production. and applications / editor, HongYu Yu (South University of Science, Technology of China, Shenzhen, China).
title_short	Hafnium :
title_sort	hafnium chemical characteristics production and applications
title_sub	chemical characteristics, production. and applications /
topic	Hafnium. http://id.loc.gov/authorities/subjects/sh85058238 Transition metals. http://id.loc.gov/authorities/subjects/sh85136954 Thin films. http://id.loc.gov/authorities/subjects/sh85134864 Hafnium https://id.nlm.nih.gov/mesh/D006195 Hafnium. Métaux de transition. Couches minces. TECHNOLOGY & ENGINEERING Chemical & Biochemical. bisacsh Hafnium fast Thin films fast Transition metals fast
topic_facet	Hafnium. Transition metals. Thin films. Hafnium Métaux de transition. Couches minces. TECHNOLOGY & ENGINEERING Chemical & Biochemical. Thin films Transition metals
url	https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=928702
work_keys_str_mv	AT yuhongyu hafniumchemicalcharacteristicsproductionandapplications

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