Low energy ion assisted film growth /:
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low en...
Gespeichert in:
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| Weitere Verfasser: | , |
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
London : Singapore :
Imperial College Press ; World Scientific [distributor],
©2003.
|
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Zusammenfassung: | This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book. |
| Beschreibung: | 1 online resource (xiv, 283 pages) : illustrations |
| Bibliographie: | Includes bibliographical references and index. |
| ISBN: | 9781848161320 1848161328 1281865931 9781281865939 9781860943515 1860943519 |
Internformat
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| 245 | 1 | 0 | |a Low energy ion assisted film growth / |c A.R. González-Elipe, F. Yubero, J.M. Sanz. |
| 260 | |a London : |b Imperial College Press ; |a Singapore : |b World Scientific [distributor], |c ©2003. | ||
| 300 | |a 1 online resource (xiv, 283 pages) : |b illustrations | ||
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| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a Cover -- Contents -- Foreword -- CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS -- 1.1. Introduction -- 1.2. Interatomic interaction -- 1.3. Basic concepts in classical dynamics of binary elastic collisions -- 1.4. Range of energetic ions in solids -- 1.5. Spatial distribution of deposited energy -- 1.6. Damage induced by ion bombardment -- 1.7. Sputtering -- 1.8. Experimental parameters in IAD thin film growth -- References -- CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS -- 2.1. Assistance of film growth with independent ion sources -- 2.2. Ion assisted deposition of thin films without independent ion sources -- 2.3. Plasma immersion ion implantation -- 2.4. Broad beam ion sources -- References -- CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH -- 3.1. Ion beam effects during film growth -- 3.2. Nucleation and growth of thin films under ion bombardment & | |
| 588 | 0 | |a Print version record. | |
| 520 | |a This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book. | ||
| 546 | |a English. | ||
| 650 | 0 | |a Thin films |x Design and construction. | |
| 650 | 0 | |a Thin films |x Effect of radiation on. | |
| 650 | 0 | |a Ion bombardment. |0 http://id.loc.gov/authorities/subjects/sh85067792 | |
| 650 | 6 | |a Couches minces |x Effets du rayonnement sur. | |
| 650 | 6 | |a Bombardement ionique. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Solid State. |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Semiconductors. |2 bisacsh | |
| 650 | 7 | |a Ion bombardment |2 fast | |
| 650 | 7 | |a Thin films |x Design and construction |2 fast | |
| 650 | 7 | |a Thin films |x Effect of radiation on |2 fast | |
| 700 | 1 | |a Yubero, F. |1 https://id.oclc.org/worldcat/entity/E39PCjxw8RWJDr7YTPJ43h9rG3 |0 http://id.loc.gov/authorities/names/nr2003023958 | |
| 700 | 1 | |a Sanz, J. M. |q (José María) |1 https://id.oclc.org/worldcat/entity/E39PCjF3QtCPkVPvf8T7w49MT3 |0 http://id.loc.gov/authorities/names/no2001002757 | |
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| 776 | 0 | 8 | |i Print version: |a González-Elipe, A.R. |t Low energy ion assisted film growth. |d London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003 |z 1860943519 |z 9781860943515 |w (OCoLC)52597381 |
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Datensatz im Suchindex
| DE-BY-FWS_katkey | ZDB-4-EBA-ocn261114897 |
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| _version_ | 1816881678544535552 |
| adam_text | |
| any_adam_object | |
| author | González-Elipe, A. R. |
| author2 | Yubero, F. Sanz, J. M. (José María) |
| author2_role | |
| author2_variant | f y fy j m s jm jms |
| author_GND | http://id.loc.gov/authorities/names/n96029361 http://id.loc.gov/authorities/names/nr2003023958 http://id.loc.gov/authorities/names/no2001002757 |
| author_facet | González-Elipe, A. R. Yubero, F. Sanz, J. M. (José María) |
| author_role | |
| author_sort | González-Elipe, A. R. |
| author_variant | a r g e arg arge |
| building | Verbundindex |
| bvnumber | localFWS |
| callnumber-first | Q - Science |
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| callnumber-search | QC176.84.R3 G65 2003eb |
| callnumber-sort | QC 3176.84 R3 G65 42003EB |
| callnumber-subject | QC - Physics |
| collection | ZDB-4-EBA |
| contents | Cover -- Contents -- Foreword -- CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS -- 1.1. Introduction -- 1.2. Interatomic interaction -- 1.3. Basic concepts in classical dynamics of binary elastic collisions -- 1.4. Range of energetic ions in solids -- 1.5. Spatial distribution of deposited energy -- 1.6. Damage induced by ion bombardment -- 1.7. Sputtering -- 1.8. Experimental parameters in IAD thin film growth -- References -- CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS -- 2.1. Assistance of film growth with independent ion sources -- 2.2. Ion assisted deposition of thin films without independent ion sources -- 2.3. Plasma immersion ion implantation -- 2.4. Broad beam ion sources -- References -- CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH -- 3.1. Ion beam effects during film growth -- 3.2. Nucleation and growth of thin films under ion bombardment & |
| ctrlnum | (OCoLC)261114897 |
| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
| dewey-sort | 3621.38152 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | ZDB-4-EBA-ocn261114897 |
| illustrated | Illustrated |
| indexdate | 2024-11-27T13:16:32Z |
| institution | BVB |
| isbn | 9781848161320 1848161328 1281865931 9781281865939 9781860943515 1860943519 |
| language | English |
| oclc_num | 261114897 |
| open_access_boolean | |
| owner | MAIN DE-863 DE-BY-FWS |
| owner_facet | MAIN DE-863 DE-BY-FWS |
| physical | 1 online resource (xiv, 283 pages) : illustrations |
| psigel | ZDB-4-EBA |
| publishDate | 2003 |
| publishDateSearch | 2003 |
| publishDateSort | 2003 |
| publisher | Imperial College Press ; World Scientific [distributor], |
| record_format | marc |
| spelling | González-Elipe, A. R. https://id.oclc.org/worldcat/entity/E39PCjFQHCtBB79HmdrhyyrCkP http://id.loc.gov/authorities/names/n96029361 Low energy ion assisted film growth / A.R. González-Elipe, F. Yubero, J.M. Sanz. London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003. 1 online resource (xiv, 283 pages) : illustrations text txt rdacontent computer c rdamedia online resource cr rdacarrier Includes bibliographical references and index. Cover -- Contents -- Foreword -- CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS -- 1.1. Introduction -- 1.2. Interatomic interaction -- 1.3. Basic concepts in classical dynamics of binary elastic collisions -- 1.4. Range of energetic ions in solids -- 1.5. Spatial distribution of deposited energy -- 1.6. Damage induced by ion bombardment -- 1.7. Sputtering -- 1.8. Experimental parameters in IAD thin film growth -- References -- CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS -- 2.1. Assistance of film growth with independent ion sources -- 2.2. Ion assisted deposition of thin films without independent ion sources -- 2.3. Plasma immersion ion implantation -- 2.4. Broad beam ion sources -- References -- CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH -- 3.1. Ion beam effects during film growth -- 3.2. Nucleation and growth of thin films under ion bombardment & Print version record. This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book. English. Thin films Design and construction. Thin films Effect of radiation on. Ion bombardment. http://id.loc.gov/authorities/subjects/sh85067792 Couches minces Effets du rayonnement sur. Bombardement ionique. TECHNOLOGY & ENGINEERING Electronics Solid State. bisacsh TECHNOLOGY & ENGINEERING Electronics Semiconductors. bisacsh Ion bombardment fast Thin films Design and construction fast Thin films Effect of radiation on fast Yubero, F. https://id.oclc.org/worldcat/entity/E39PCjxw8RWJDr7YTPJ43h9rG3 http://id.loc.gov/authorities/names/nr2003023958 Sanz, J. M. (José María) https://id.oclc.org/worldcat/entity/E39PCjF3QtCPkVPvf8T7w49MT3 http://id.loc.gov/authorities/names/no2001002757 has work: Low energy ion assisted film growth (Text) https://id.oclc.org/worldcat/entity/E39PCGHkFPkbkGkJ9Vtt8MrXV3 https://id.oclc.org/worldcat/ontology/hasWork Print version: González-Elipe, A.R. Low energy ion assisted film growth. London : Imperial College Press ; Singapore : World Scientific [distributor], ©2003 1860943519 9781860943515 (OCoLC)52597381 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=235523 Volltext |
| spellingShingle | González-Elipe, A. R. Low energy ion assisted film growth / Cover -- Contents -- Foreword -- CHAPTER 1: BASIC CONCEPTS ON THE INTERACTION OF LOW ENERGY ION BEAMS WITH SOLID TARGETS -- 1.1. Introduction -- 1.2. Interatomic interaction -- 1.3. Basic concepts in classical dynamics of binary elastic collisions -- 1.4. Range of energetic ions in solids -- 1.5. Spatial distribution of deposited energy -- 1.6. Damage induced by ion bombardment -- 1.7. Sputtering -- 1.8. Experimental parameters in IAD thin film growth -- References -- CHAPTER 2: ION ASSISTED METHODS OF PREPARATION OF THIN FILMS -- 2.1. Assistance of film growth with independent ion sources -- 2.2. Ion assisted deposition of thin films without independent ion sources -- 2.3. Plasma immersion ion implantation -- 2.4. Broad beam ion sources -- References -- CHAPTER 3: EFFECTS INDUCED BY THE ION ASSISTANCE OF FILM GROWTH -- 3.1. Ion beam effects during film growth -- 3.2. Nucleation and growth of thin films under ion bombardment & Thin films Design and construction. Thin films Effect of radiation on. Ion bombardment. http://id.loc.gov/authorities/subjects/sh85067792 Couches minces Effets du rayonnement sur. Bombardement ionique. TECHNOLOGY & ENGINEERING Electronics Solid State. bisacsh TECHNOLOGY & ENGINEERING Electronics Semiconductors. bisacsh Ion bombardment fast Thin films Design and construction fast Thin films Effect of radiation on fast |
| subject_GND | http://id.loc.gov/authorities/subjects/sh85067792 |
| title | Low energy ion assisted film growth / |
| title_auth | Low energy ion assisted film growth / |
| title_exact_search | Low energy ion assisted film growth / |
| title_full | Low energy ion assisted film growth / A.R. González-Elipe, F. Yubero, J.M. Sanz. |
| title_fullStr | Low energy ion assisted film growth / A.R. González-Elipe, F. Yubero, J.M. Sanz. |
| title_full_unstemmed | Low energy ion assisted film growth / A.R. González-Elipe, F. Yubero, J.M. Sanz. |
| title_short | Low energy ion assisted film growth / |
| title_sort | low energy ion assisted film growth |
| topic | Thin films Design and construction. Thin films Effect of radiation on. Ion bombardment. http://id.loc.gov/authorities/subjects/sh85067792 Couches minces Effets du rayonnement sur. Bombardement ionique. TECHNOLOGY & ENGINEERING Electronics Solid State. bisacsh TECHNOLOGY & ENGINEERING Electronics Semiconductors. bisacsh Ion bombardment fast Thin films Design and construction fast Thin films Effect of radiation on fast |
| topic_facet | Thin films Design and construction. Thin films Effect of radiation on. Ion bombardment. Couches minces Effets du rayonnement sur. Bombardement ionique. TECHNOLOGY & ENGINEERING Electronics Solid State. TECHNOLOGY & ENGINEERING Electronics Semiconductors. Ion bombardment Thin films Design and construction Thin films Effect of radiation on |
| url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=235523 |
| work_keys_str_mv | AT gonzalezelipear lowenergyionassistedfilmgrowth AT yuberof lowenergyionassistedfilmgrowth AT sanzjm lowenergyionassistedfilmgrowth |