Plasma processing and processing science /:
Gespeichert in:
Körperschaften: | , , |
---|---|
Weitere Verfasser: | |
Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Washington, D.C. :
National Academy Press,
1995.
|
Schriftenreihe: | NRL strategic series.
|
Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | Committee chair: Francis F. Chen. This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124. |
Beschreibung: | 1 online resource (x, 35 pages) |
ISBN: | 0309575168 9780309575164 |
Internformat
MARC
LEADER | 00000cam a2200000 a 4500 | ||
---|---|---|---|
001 | ZDB-4-EBA-ocm58567010 | ||
003 | OCoLC | ||
005 | 20241004212047.0 | ||
006 | m o d | ||
007 | cr cnu|||unuuu | ||
008 | 050323s1995 dcu o 000 0 eng d | ||
040 | |a N$T |b eng |e pn |c N$T |d OCLCQ |d YDXCP |d OCLCG |d OCLCQ |d CUS |d OCLCQ |d DKDLA |d ADU |d E7B |d OCLCQ |d NTE |d OCLCQ |d GAT |d ORU |d OCLCO |d ORU |d OCLCQ |d OCLCA |d OCLCF |d OCLCQ |d EBLCP |d OCLCQ |d AZK |d LOA |d AGLDB |d PIFBR |d ZCU |d MERUC |d OCLCQ |d U3W |d STF |d WRM |d OCLCQ |d VTS |d COCUF |d NRAMU |d ICG |d OCLCQ |d WYU |d TKN |d G3B |d DKC |d OCLCQ |d K6U |d OCLCQ |d HS0 |d OCLCO |d OCLCQ |d OCLCO |d OCLCQ |d OCLCL |d OCLCQ | ||
019 | |a 325461980 |a 473582520 |a 475481383 |a 614454685 |a 646727504 |a 888829131 |a 923270352 |a 961531223 |a 962664382 |a 1227635376 | ||
020 | |a 0309575168 |q (electronic bk.) | ||
020 | |a 9780309575164 |q (electronic bk.) | ||
035 | |a (OCoLC)58567010 |z (OCoLC)325461980 |z (OCoLC)473582520 |z (OCoLC)475481383 |z (OCoLC)614454685 |z (OCoLC)646727504 |z (OCoLC)888829131 |z (OCoLC)923270352 |z (OCoLC)961531223 |z (OCoLC)962664382 |z (OCoLC)1227635376 | ||
050 | 4 | |a TA2020 |b .P5 1995eb | |
072 | 7 | |a TEC |x 009070 |2 bisacsh | |
082 | 7 | |a 621.044 |2 22 | |
049 | |a MAIN | ||
245 | 0 | 0 | |a Plasma processing and processing science / |c Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
260 | |a Washington, D.C. : |b National Academy Press, |c 1995. | ||
300 | |a 1 online resource (x, 35 pages) | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
347 | |a data file |2 rda | ||
490 | 1 | |a NRL strategic series | |
500 | |a Committee chair: Francis F. Chen. | ||
500 | |a This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124. | ||
588 | 0 | |a Print version record. | |
505 | 0 | |a Plasma Processing and Processing Science -- Copyright -- Preface -- Contents -- Chapter 1 Introduction and Summary -- Chapter 2 Modeling and Simulation of Plasma Processing -- RESEARCH OPPORTUNITIES -- Requirements of the Microelectronics Fabrication Industry -- Multidimensional Models -- Plasma Chemistry -- Surface Chemistry -- Electromagnetics -- Current Status of Modeling and Simulation -- Particle-in-Cell Simulations -- Kinetic Models -- Fluid or Hydrodynamic Models -- Hybrid Models -- A ROLE FOR NRL -- Chapter 3 Semiconductor Processing | |
505 | 8 | |a RESEARCH OPPORTUNITIESA ROLE FOR NRL -- Development and Characterization of Precompetitive Materials and Processes -- Comparative Analysis and Characterization of Tools and Processes in Development -- Sensor Development for Control and Fingerprinting of Manufacturing Processes -- Chapter 4 Plasma Deposition and Polymerization -- RESEARCH OPPORTUNITIES -- Semiconductor Fabrication -- Barrier Coatings -- Fibrous Materials -- Optical Coatings and Photonics -- Plasma Polymerization -- A ROLE FOR NRL -- Chapter 5 Ion Implantation and Surface Modification | |
505 | 8 | |a RESEARCH OPPORTUNITIESIntroduction -- Plasma and Ion Beam Implantation Technology -- Ion Beam Implantation -- Plasma Source Ion Implantation -- Applications -- Implantation of Metals -- Implantation of Nonmetals -- A ROLE FOR NRL -- Chapter 6 Thermal Plasmas -- RESEARCH OPPORTUNITIES -- Introduction -- Plasma Spraying -- Plasma Chemical Vapor Deposition -- Plasma Waste Destruction -- Plasma Metallurgy -- Thermal Plasma Synthesis -- Plasma Consolidation -- A ROLE FOR NRL -- Thermal Plasma Waste Destruction -- Plasma Chemical Vapor Deposition | |
505 | 8 | |a Diamond FilmsCubic Boron Nitride Films -- Carbon Nitride -- Chapter 7 Flat Panel Displays -- RESEARCH OPPORTUNITIES -- Introduction -- Passive Matrix Liquid Crystal Display -- Active Matrix Liquid Crystal Display -- Amorphous Silicon -- Polycrystalline Silicon -- Transfer Silicon -- Thin Film Electroluminescent Displays -- Digital Micromirror Devices -- Plasma Displays -- Field Emission Displays -- A ROLE FOR NRL -- Chapter 8 Low-Temperature Plasma Physics -- RESEARCH OPPORTUNITIES -- A ROLE FOR NRL -- Chapter 9 Conclusions and Recommendations | |
546 | |a English. | ||
650 | 0 | |a Plasma engineering. |0 http://id.loc.gov/authorities/subjects/sh85103069 | |
650 | 0 | |a Semiconductors |x Etching. |0 http://id.loc.gov/authorities/subjects/sh85119910 | |
650 | 0 | |a Plasma etching. |0 http://id.loc.gov/authorities/subjects/sh85103070 | |
650 | 6 | |a Technique des plasmas. | |
650 | 6 | |a Semi-conducteurs |x Attaque chimique. | |
650 | 6 | |a Gravure par plasma. | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Mechanical. |2 bisacsh | |
650 | 7 | |a Plasma engineering |2 fast | |
650 | 7 | |a Plasma etching |2 fast | |
650 | 7 | |a Semiconductors |x Etching |2 fast | |
700 | 1 | |a Chen, Francis F., |d 1929- |1 https://id.oclc.org/worldcat/entity/E39PBJkXBcj499jTbVTK73V6Kd |0 http://id.loc.gov/authorities/names/n83193109 | |
710 | 2 | |a National Research Council (U.S.). |b Panel on Plasma Processing. |0 http://id.loc.gov/authorities/names/no2012105425 | |
710 | 2 | |a National Research Council (U.S.). |b Naval Studies Board. |0 http://id.loc.gov/authorities/names/n92118836 | |
710 | 2 | |a National Research Council (U.S.). |b Commission on Physical Sciences, Mathematics, and Applications. |0 http://id.loc.gov/authorities/names/n90636483 | |
776 | 0 | 8 | |i Print version: |t Plasma processing and processing science. |d Washington, D.C. : National Academy Press, 1995 |w (OCoLC)32785090 |
830 | 0 | |a NRL strategic series. |0 http://id.loc.gov/authorities/names/n97111290 | |
856 | 4 | 0 | |l FWS01 |p ZDB-4-EBA |q FWS_PDA_EBA |u https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=123670 |3 Volltext |
938 | |a EBL - Ebook Library |b EBLB |n EBL3377403 | ||
938 | |a ebrary |b EBRY |n ebr10071430 | ||
938 | |a EBSCOhost |b EBSC |n 123670 | ||
938 | |a YBP Library Services |b YANK |n 2293895 | ||
994 | |a 92 |b GEBAY | ||
912 | |a ZDB-4-EBA | ||
049 | |a DE-863 |
Datensatz im Suchindex
DE-BY-FWS_katkey | ZDB-4-EBA-ocm58567010 |
---|---|
_version_ | 1816881625727762432 |
adam_text | |
any_adam_object | |
author2 | Chen, Francis F., 1929- |
author2_role | |
author2_variant | f f c ff ffc |
author_GND | http://id.loc.gov/authorities/names/n83193109 |
author_corporate | National Research Council (U.S.). Panel on Plasma Processing National Research Council (U.S.). Naval Studies Board National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications |
author_corporate_role | |
author_facet | Chen, Francis F., 1929- National Research Council (U.S.). Panel on Plasma Processing National Research Council (U.S.). Naval Studies Board National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications |
author_sort | Chen, Francis F., 1929- |
building | Verbundindex |
bvnumber | localFWS |
callnumber-first | T - Technology |
callnumber-label | TA2020 |
callnumber-raw | TA2020 .P5 1995eb |
callnumber-search | TA2020 .P5 1995eb |
callnumber-sort | TA 42020 P5 41995EB |
callnumber-subject | TA - General and Civil Engineering |
collection | ZDB-4-EBA |
contents | Plasma Processing and Processing Science -- Copyright -- Preface -- Contents -- Chapter 1 Introduction and Summary -- Chapter 2 Modeling and Simulation of Plasma Processing -- RESEARCH OPPORTUNITIES -- Requirements of the Microelectronics Fabrication Industry -- Multidimensional Models -- Plasma Chemistry -- Surface Chemistry -- Electromagnetics -- Current Status of Modeling and Simulation -- Particle-in-Cell Simulations -- Kinetic Models -- Fluid or Hydrodynamic Models -- Hybrid Models -- A ROLE FOR NRL -- Chapter 3 Semiconductor Processing RESEARCH OPPORTUNITIESA ROLE FOR NRL -- Development and Characterization of Precompetitive Materials and Processes -- Comparative Analysis and Characterization of Tools and Processes in Development -- Sensor Development for Control and Fingerprinting of Manufacturing Processes -- Chapter 4 Plasma Deposition and Polymerization -- RESEARCH OPPORTUNITIES -- Semiconductor Fabrication -- Barrier Coatings -- Fibrous Materials -- Optical Coatings and Photonics -- Plasma Polymerization -- A ROLE FOR NRL -- Chapter 5 Ion Implantation and Surface Modification RESEARCH OPPORTUNITIESIntroduction -- Plasma and Ion Beam Implantation Technology -- Ion Beam Implantation -- Plasma Source Ion Implantation -- Applications -- Implantation of Metals -- Implantation of Nonmetals -- A ROLE FOR NRL -- Chapter 6 Thermal Plasmas -- RESEARCH OPPORTUNITIES -- Introduction -- Plasma Spraying -- Plasma Chemical Vapor Deposition -- Plasma Waste Destruction -- Plasma Metallurgy -- Thermal Plasma Synthesis -- Plasma Consolidation -- A ROLE FOR NRL -- Thermal Plasma Waste Destruction -- Plasma Chemical Vapor Deposition Diamond FilmsCubic Boron Nitride Films -- Carbon Nitride -- Chapter 7 Flat Panel Displays -- RESEARCH OPPORTUNITIES -- Introduction -- Passive Matrix Liquid Crystal Display -- Active Matrix Liquid Crystal Display -- Amorphous Silicon -- Polycrystalline Silicon -- Transfer Silicon -- Thin Film Electroluminescent Displays -- Digital Micromirror Devices -- Plasma Displays -- Field Emission Displays -- A ROLE FOR NRL -- Chapter 8 Low-Temperature Plasma Physics -- RESEARCH OPPORTUNITIES -- A ROLE FOR NRL -- Chapter 9 Conclusions and Recommendations |
ctrlnum | (OCoLC)58567010 |
dewey-full | 621.044 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.044 |
dewey-search | 621.044 |
dewey-sort | 3621.044 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Werkstoffwissenschaften / Fertigungstechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>05845cam a2200661 a 4500</leader><controlfield tag="001">ZDB-4-EBA-ocm58567010 </controlfield><controlfield tag="003">OCoLC</controlfield><controlfield tag="005">20241004212047.0</controlfield><controlfield tag="006">m o d </controlfield><controlfield tag="007">cr cnu|||unuuu</controlfield><controlfield tag="008">050323s1995 dcu o 000 0 eng d</controlfield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">N$T</subfield><subfield code="b">eng</subfield><subfield code="e">pn</subfield><subfield code="c">N$T</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">YDXCP</subfield><subfield code="d">OCLCG</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">CUS</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">DKDLA</subfield><subfield code="d">ADU</subfield><subfield code="d">E7B</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">NTE</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">GAT</subfield><subfield code="d">ORU</subfield><subfield code="d">OCLCO</subfield><subfield code="d">ORU</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCA</subfield><subfield code="d">OCLCF</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">EBLCP</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">AZK</subfield><subfield code="d">LOA</subfield><subfield code="d">AGLDB</subfield><subfield code="d">PIFBR</subfield><subfield code="d">ZCU</subfield><subfield code="d">MERUC</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">U3W</subfield><subfield code="d">STF</subfield><subfield code="d">WRM</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">VTS</subfield><subfield code="d">COCUF</subfield><subfield code="d">NRAMU</subfield><subfield code="d">ICG</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">WYU</subfield><subfield code="d">TKN</subfield><subfield code="d">G3B</subfield><subfield code="d">DKC</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">K6U</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">HS0</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCO</subfield><subfield code="d">OCLCQ</subfield><subfield code="d">OCLCL</subfield><subfield code="d">OCLCQ</subfield></datafield><datafield tag="019" ind1=" " ind2=" "><subfield code="a">325461980</subfield><subfield code="a">473582520</subfield><subfield code="a">475481383</subfield><subfield code="a">614454685</subfield><subfield code="a">646727504</subfield><subfield code="a">888829131</subfield><subfield code="a">923270352</subfield><subfield code="a">961531223</subfield><subfield code="a">962664382</subfield><subfield code="a">1227635376</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0309575168</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780309575164</subfield><subfield code="q">(electronic bk.)</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)58567010</subfield><subfield code="z">(OCoLC)325461980</subfield><subfield code="z">(OCoLC)473582520</subfield><subfield code="z">(OCoLC)475481383</subfield><subfield code="z">(OCoLC)614454685</subfield><subfield code="z">(OCoLC)646727504</subfield><subfield code="z">(OCoLC)888829131</subfield><subfield code="z">(OCoLC)923270352</subfield><subfield code="z">(OCoLC)961531223</subfield><subfield code="z">(OCoLC)962664382</subfield><subfield code="z">(OCoLC)1227635376</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">TA2020</subfield><subfield code="b">.P5 1995eb</subfield></datafield><datafield tag="072" ind1=" " ind2="7"><subfield code="a">TEC</subfield><subfield code="x">009070</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="082" ind1="7" ind2=" "><subfield code="a">621.044</subfield><subfield code="2">22</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">MAIN</subfield></datafield><datafield tag="245" ind1="0" ind2="0"><subfield code="a">Plasma processing and processing science /</subfield><subfield code="c">Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.</subfield></datafield><datafield tag="260" ind1=" " ind2=" "><subfield code="a">Washington, D.C. :</subfield><subfield code="b">National Academy Press,</subfield><subfield code="c">1995.</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (x, 35 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">computer</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">online resource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="347" ind1=" " ind2=" "><subfield code="a">data file</subfield><subfield code="2">rda</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">NRL strategic series</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Committee chair: Francis F. Chen.</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.</subfield></datafield><datafield tag="588" ind1="0" ind2=" "><subfield code="a">Print version record.</subfield></datafield><datafield tag="505" ind1="0" ind2=" "><subfield code="a">Plasma Processing and Processing Science -- Copyright -- Preface -- Contents -- Chapter 1 Introduction and Summary -- Chapter 2 Modeling and Simulation of Plasma Processing -- RESEARCH OPPORTUNITIES -- Requirements of the Microelectronics Fabrication Industry -- Multidimensional Models -- Plasma Chemistry -- Surface Chemistry -- Electromagnetics -- Current Status of Modeling and Simulation -- Particle-in-Cell Simulations -- Kinetic Models -- Fluid or Hydrodynamic Models -- Hybrid Models -- A ROLE FOR NRL -- Chapter 3 Semiconductor Processing</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">RESEARCH OPPORTUNITIESA ROLE FOR NRL -- Development and Characterization of Precompetitive Materials and Processes -- Comparative Analysis and Characterization of Tools and Processes in Development -- Sensor Development for Control and Fingerprinting of Manufacturing Processes -- Chapter 4 Plasma Deposition and Polymerization -- RESEARCH OPPORTUNITIES -- Semiconductor Fabrication -- Barrier Coatings -- Fibrous Materials -- Optical Coatings and Photonics -- Plasma Polymerization -- A ROLE FOR NRL -- Chapter 5 Ion Implantation and Surface Modification</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">RESEARCH OPPORTUNITIESIntroduction -- Plasma and Ion Beam Implantation Technology -- Ion Beam Implantation -- Plasma Source Ion Implantation -- Applications -- Implantation of Metals -- Implantation of Nonmetals -- A ROLE FOR NRL -- Chapter 6 Thermal Plasmas -- RESEARCH OPPORTUNITIES -- Introduction -- Plasma Spraying -- Plasma Chemical Vapor Deposition -- Plasma Waste Destruction -- Plasma Metallurgy -- Thermal Plasma Synthesis -- Plasma Consolidation -- A ROLE FOR NRL -- Thermal Plasma Waste Destruction -- Plasma Chemical Vapor Deposition</subfield></datafield><datafield tag="505" ind1="8" ind2=" "><subfield code="a">Diamond FilmsCubic Boron Nitride Films -- Carbon Nitride -- Chapter 7 Flat Panel Displays -- RESEARCH OPPORTUNITIES -- Introduction -- Passive Matrix Liquid Crystal Display -- Active Matrix Liquid Crystal Display -- Amorphous Silicon -- Polycrystalline Silicon -- Transfer Silicon -- Thin Film Electroluminescent Displays -- Digital Micromirror Devices -- Plasma Displays -- Field Emission Displays -- A ROLE FOR NRL -- Chapter 8 Low-Temperature Plasma Physics -- RESEARCH OPPORTUNITIES -- A ROLE FOR NRL -- Chapter 9 Conclusions and Recommendations</subfield></datafield><datafield tag="546" ind1=" " ind2=" "><subfield code="a">English.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Plasma engineering.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85103069</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85119910</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Plasma etching.</subfield><subfield code="0">http://id.loc.gov/authorities/subjects/sh85103070</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Technique des plasmas.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Semi-conducteurs</subfield><subfield code="x">Attaque chimique.</subfield></datafield><datafield tag="650" ind1=" " ind2="6"><subfield code="a">Gravure par plasma.</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING</subfield><subfield code="x">Mechanical.</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma engineering</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plasma etching</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield><subfield code="2">fast</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chen, Francis F.,</subfield><subfield code="d">1929-</subfield><subfield code="1">https://id.oclc.org/worldcat/entity/E39PBJkXBcj499jTbVTK73V6Kd</subfield><subfield code="0">http://id.loc.gov/authorities/names/n83193109</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.).</subfield><subfield code="b">Panel on Plasma Processing.</subfield><subfield code="0">http://id.loc.gov/authorities/names/no2012105425</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.).</subfield><subfield code="b">Naval Studies Board.</subfield><subfield code="0">http://id.loc.gov/authorities/names/n92118836</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">National Research Council (U.S.).</subfield><subfield code="b">Commission on Physical Sciences, Mathematics, and Applications.</subfield><subfield code="0">http://id.loc.gov/authorities/names/n90636483</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Print version:</subfield><subfield code="t">Plasma processing and processing science.</subfield><subfield code="d">Washington, D.C. : National Academy Press, 1995</subfield><subfield code="w">(OCoLC)32785090</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">NRL strategic series.</subfield><subfield code="0">http://id.loc.gov/authorities/names/n97111290</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="l">FWS01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FWS_PDA_EBA</subfield><subfield code="u">https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=123670</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">EBL - Ebook Library</subfield><subfield code="b">EBLB</subfield><subfield code="n">EBL3377403</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">ebrary</subfield><subfield code="b">EBRY</subfield><subfield code="n">ebr10071430</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">EBSCOhost</subfield><subfield code="b">EBSC</subfield><subfield code="n">123670</subfield></datafield><datafield tag="938" ind1=" " ind2=" "><subfield code="a">YBP Library Services</subfield><subfield code="b">YANK</subfield><subfield code="n">2293895</subfield></datafield><datafield tag="994" ind1=" " ind2=" "><subfield code="a">92</subfield><subfield code="b">GEBAY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-863</subfield></datafield></record></collection> |
id | ZDB-4-EBA-ocm58567010 |
illustrated | Not Illustrated |
indexdate | 2024-11-27T13:15:42Z |
institution | BVB |
institution_GND | http://id.loc.gov/authorities/names/no2012105425 http://id.loc.gov/authorities/names/n92118836 http://id.loc.gov/authorities/names/n90636483 |
isbn | 0309575168 9780309575164 |
language | English |
oclc_num | 58567010 |
open_access_boolean | |
owner | MAIN DE-863 DE-BY-FWS |
owner_facet | MAIN DE-863 DE-BY-FWS |
physical | 1 online resource (x, 35 pages) |
psigel | ZDB-4-EBA |
publishDate | 1995 |
publishDateSearch | 1995 |
publishDateSort | 1995 |
publisher | National Academy Press, |
record_format | marc |
series | NRL strategic series. |
series2 | NRL strategic series |
spelling | Plasma processing and processing science / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. Washington, D.C. : National Academy Press, 1995. 1 online resource (x, 35 pages) text txt rdacontent computer c rdamedia online resource cr rdacarrier data file rda NRL strategic series Committee chair: Francis F. Chen. This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124. Print version record. Plasma Processing and Processing Science -- Copyright -- Preface -- Contents -- Chapter 1 Introduction and Summary -- Chapter 2 Modeling and Simulation of Plasma Processing -- RESEARCH OPPORTUNITIES -- Requirements of the Microelectronics Fabrication Industry -- Multidimensional Models -- Plasma Chemistry -- Surface Chemistry -- Electromagnetics -- Current Status of Modeling and Simulation -- Particle-in-Cell Simulations -- Kinetic Models -- Fluid or Hydrodynamic Models -- Hybrid Models -- A ROLE FOR NRL -- Chapter 3 Semiconductor Processing RESEARCH OPPORTUNITIESA ROLE FOR NRL -- Development and Characterization of Precompetitive Materials and Processes -- Comparative Analysis and Characterization of Tools and Processes in Development -- Sensor Development for Control and Fingerprinting of Manufacturing Processes -- Chapter 4 Plasma Deposition and Polymerization -- RESEARCH OPPORTUNITIES -- Semiconductor Fabrication -- Barrier Coatings -- Fibrous Materials -- Optical Coatings and Photonics -- Plasma Polymerization -- A ROLE FOR NRL -- Chapter 5 Ion Implantation and Surface Modification RESEARCH OPPORTUNITIESIntroduction -- Plasma and Ion Beam Implantation Technology -- Ion Beam Implantation -- Plasma Source Ion Implantation -- Applications -- Implantation of Metals -- Implantation of Nonmetals -- A ROLE FOR NRL -- Chapter 6 Thermal Plasmas -- RESEARCH OPPORTUNITIES -- Introduction -- Plasma Spraying -- Plasma Chemical Vapor Deposition -- Plasma Waste Destruction -- Plasma Metallurgy -- Thermal Plasma Synthesis -- Plasma Consolidation -- A ROLE FOR NRL -- Thermal Plasma Waste Destruction -- Plasma Chemical Vapor Deposition Diamond FilmsCubic Boron Nitride Films -- Carbon Nitride -- Chapter 7 Flat Panel Displays -- RESEARCH OPPORTUNITIES -- Introduction -- Passive Matrix Liquid Crystal Display -- Active Matrix Liquid Crystal Display -- Amorphous Silicon -- Polycrystalline Silicon -- Transfer Silicon -- Thin Film Electroluminescent Displays -- Digital Micromirror Devices -- Plasma Displays -- Field Emission Displays -- A ROLE FOR NRL -- Chapter 8 Low-Temperature Plasma Physics -- RESEARCH OPPORTUNITIES -- A ROLE FOR NRL -- Chapter 9 Conclusions and Recommendations English. Plasma engineering. http://id.loc.gov/authorities/subjects/sh85103069 Semiconductors Etching. http://id.loc.gov/authorities/subjects/sh85119910 Plasma etching. http://id.loc.gov/authorities/subjects/sh85103070 Technique des plasmas. Semi-conducteurs Attaque chimique. Gravure par plasma. TECHNOLOGY & ENGINEERING Mechanical. bisacsh Plasma engineering fast Plasma etching fast Semiconductors Etching fast Chen, Francis F., 1929- https://id.oclc.org/worldcat/entity/E39PBJkXBcj499jTbVTK73V6Kd http://id.loc.gov/authorities/names/n83193109 National Research Council (U.S.). Panel on Plasma Processing. http://id.loc.gov/authorities/names/no2012105425 National Research Council (U.S.). Naval Studies Board. http://id.loc.gov/authorities/names/n92118836 National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications. http://id.loc.gov/authorities/names/n90636483 Print version: Plasma processing and processing science. Washington, D.C. : National Academy Press, 1995 (OCoLC)32785090 NRL strategic series. http://id.loc.gov/authorities/names/n97111290 FWS01 ZDB-4-EBA FWS_PDA_EBA https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=123670 Volltext |
spellingShingle | Plasma processing and processing science / NRL strategic series. Plasma Processing and Processing Science -- Copyright -- Preface -- Contents -- Chapter 1 Introduction and Summary -- Chapter 2 Modeling and Simulation of Plasma Processing -- RESEARCH OPPORTUNITIES -- Requirements of the Microelectronics Fabrication Industry -- Multidimensional Models -- Plasma Chemistry -- Surface Chemistry -- Electromagnetics -- Current Status of Modeling and Simulation -- Particle-in-Cell Simulations -- Kinetic Models -- Fluid or Hydrodynamic Models -- Hybrid Models -- A ROLE FOR NRL -- Chapter 3 Semiconductor Processing RESEARCH OPPORTUNITIESA ROLE FOR NRL -- Development and Characterization of Precompetitive Materials and Processes -- Comparative Analysis and Characterization of Tools and Processes in Development -- Sensor Development for Control and Fingerprinting of Manufacturing Processes -- Chapter 4 Plasma Deposition and Polymerization -- RESEARCH OPPORTUNITIES -- Semiconductor Fabrication -- Barrier Coatings -- Fibrous Materials -- Optical Coatings and Photonics -- Plasma Polymerization -- A ROLE FOR NRL -- Chapter 5 Ion Implantation and Surface Modification RESEARCH OPPORTUNITIESIntroduction -- Plasma and Ion Beam Implantation Technology -- Ion Beam Implantation -- Plasma Source Ion Implantation -- Applications -- Implantation of Metals -- Implantation of Nonmetals -- A ROLE FOR NRL -- Chapter 6 Thermal Plasmas -- RESEARCH OPPORTUNITIES -- Introduction -- Plasma Spraying -- Plasma Chemical Vapor Deposition -- Plasma Waste Destruction -- Plasma Metallurgy -- Thermal Plasma Synthesis -- Plasma Consolidation -- A ROLE FOR NRL -- Thermal Plasma Waste Destruction -- Plasma Chemical Vapor Deposition Diamond FilmsCubic Boron Nitride Films -- Carbon Nitride -- Chapter 7 Flat Panel Displays -- RESEARCH OPPORTUNITIES -- Introduction -- Passive Matrix Liquid Crystal Display -- Active Matrix Liquid Crystal Display -- Amorphous Silicon -- Polycrystalline Silicon -- Transfer Silicon -- Thin Film Electroluminescent Displays -- Digital Micromirror Devices -- Plasma Displays -- Field Emission Displays -- A ROLE FOR NRL -- Chapter 8 Low-Temperature Plasma Physics -- RESEARCH OPPORTUNITIES -- A ROLE FOR NRL -- Chapter 9 Conclusions and Recommendations Plasma engineering. http://id.loc.gov/authorities/subjects/sh85103069 Semiconductors Etching. http://id.loc.gov/authorities/subjects/sh85119910 Plasma etching. http://id.loc.gov/authorities/subjects/sh85103070 Technique des plasmas. Semi-conducteurs Attaque chimique. Gravure par plasma. TECHNOLOGY & ENGINEERING Mechanical. bisacsh Plasma engineering fast Plasma etching fast Semiconductors Etching fast |
subject_GND | http://id.loc.gov/authorities/subjects/sh85103069 http://id.loc.gov/authorities/subjects/sh85119910 http://id.loc.gov/authorities/subjects/sh85103070 |
title | Plasma processing and processing science / |
title_auth | Plasma processing and processing science / |
title_exact_search | Plasma processing and processing science / |
title_full | Plasma processing and processing science / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
title_fullStr | Plasma processing and processing science / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
title_full_unstemmed | Plasma processing and processing science / Panel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council. |
title_short | Plasma processing and processing science / |
title_sort | plasma processing and processing science |
topic | Plasma engineering. http://id.loc.gov/authorities/subjects/sh85103069 Semiconductors Etching. http://id.loc.gov/authorities/subjects/sh85119910 Plasma etching. http://id.loc.gov/authorities/subjects/sh85103070 Technique des plasmas. Semi-conducteurs Attaque chimique. Gravure par plasma. TECHNOLOGY & ENGINEERING Mechanical. bisacsh Plasma engineering fast Plasma etching fast Semiconductors Etching fast |
topic_facet | Plasma engineering. Semiconductors Etching. Plasma etching. Technique des plasmas. Semi-conducteurs Attaque chimique. Gravure par plasma. TECHNOLOGY & ENGINEERING Mechanical. Plasma engineering Plasma etching Semiconductors Etching |
url | https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=123670 |
work_keys_str_mv | AT chenfrancisf plasmaprocessingandprocessingscience AT nationalresearchcounciluspanelonplasmaprocessing plasmaprocessingandprocessingscience AT nationalresearchcouncilusnavalstudiesboard plasmaprocessingandprocessingscience AT nationalresearchcounciluscommissiononphysicalsciencesmathematicsandapplications plasmaprocessingandprocessingscience |