Atomic layer deposition of metal oxides and chalcogenides for high performance transistors:
Saved in:
Main Author: | |
---|---|
Format: | Electronic eBook |
Language: | English |
Published: |
Berlin
Humboldt-Universität zu Berlin
2022
|
Edition: | [Zweitveröffentlichung] |
Online Access: | Volltext |
Physical Description: | 1 Online-Ressource |
DOI: | 10.18452/25753 |
Staff View
MARC
LEADER | 00000nmm a2200000 c 4500 | ||
---|---|---|---|
001 | BV048520403 | ||
003 | DE-604 | ||
005 | 20230126 | ||
007 | cr|uuu---uuuuu | ||
008 | 221019s2022 |||| o||u| ||||||eng d | ||
024 | 7 | |a 10.18452/25753 |2 doi | |
024 | 7 | |a urn:nbn:de:kobv:11-110-18452/26426-2 |2 urn | |
035 | |a (OCoLC)1369548673 | ||
035 | |a (DE-599)BVBBV048520403 | ||
040 | |a DE-604 |b ger |e rda | ||
041 | 0 | |a eng | |
049 | |a DE-11 | ||
100 | 1 | |a Pinna, Nicola |e Verfasser |4 aut | |
245 | 1 | 0 | |a Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |c Chengxu Shen, Zhigang Yin, Fionn Collins, Nicola Pinna |
250 | |a [Zweitveröffentlichung] | ||
264 | 1 | |a Berlin |b Humboldt-Universität zu Berlin |c 2022 | |
300 | |a 1 Online-Ressource | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
787 | 0 | 8 | |i Sonderdruck aus |t Advanced Science |g 9, (2022), 23, 2104599 |o 10.1002/advs.202104599 |
856 | 4 | 0 | |u https://doi.org/10.18452/25753 |x Verlag |z kostenfrei |3 Volltext |
912 | |a ebook | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-033897300 |
Record in the Search Index
_version_ | 1804184506341523456 |
---|---|
adam_txt | |
any_adam_object | |
any_adam_object_boolean | |
author | Pinna, Nicola |
author_facet | Pinna, Nicola |
author_role | aut |
author_sort | Pinna, Nicola |
author_variant | n p np |
building | Verbundindex |
bvnumber | BV048520403 |
collection | ebook |
ctrlnum | (OCoLC)1369548673 (DE-599)BVBBV048520403 |
doi_str_mv | 10.18452/25753 |
edition | [Zweitveröffentlichung] |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01108nmm a2200313 c 4500</leader><controlfield tag="001">BV048520403</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20230126 </controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">221019s2022 |||| o||u| ||||||eng d</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.18452/25753</subfield><subfield code="2">doi</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">urn:nbn:de:kobv:11-110-18452/26426-2</subfield><subfield code="2">urn</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1369548673</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV048520403</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-11</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Pinna, Nicola</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Atomic layer deposition of metal oxides and chalcogenides for high performance transistors</subfield><subfield code="c">Chengxu Shen, Zhigang Yin, Fionn Collins, Nicola Pinna</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">[Zweitveröffentlichung]</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Berlin</subfield><subfield code="b">Humboldt-Universität zu Berlin</subfield><subfield code="c">2022</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="787" ind1="0" ind2="8"><subfield code="i">Sonderdruck aus</subfield><subfield code="t">Advanced Science</subfield><subfield code="g">9, (2022), 23, 2104599</subfield><subfield code="o">10.1002/advs.202104599</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.18452/25753</subfield><subfield code="x">Verlag</subfield><subfield code="z">kostenfrei</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ebook</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-033897300</subfield></datafield></record></collection> |
id | DE-604.BV048520403 |
illustrated | Not Illustrated |
index_date | 2024-07-03T20:49:45Z |
indexdate | 2024-07-10T09:40:25Z |
institution | BVB |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-033897300 |
oclc_num | 1369548673 |
open_access_boolean | 1 |
owner | DE-11 |
owner_facet | DE-11 |
physical | 1 Online-Ressource |
psigel | ebook |
publishDate | 2022 |
publishDateSearch | 2022 |
publishDateSort | 2022 |
publisher | Humboldt-Universität zu Berlin |
record_format | marc |
spelling | Pinna, Nicola Verfasser aut Atomic layer deposition of metal oxides and chalcogenides for high performance transistors Chengxu Shen, Zhigang Yin, Fionn Collins, Nicola Pinna [Zweitveröffentlichung] Berlin Humboldt-Universität zu Berlin 2022 1 Online-Ressource txt rdacontent c rdamedia cr rdacarrier Sonderdruck aus Advanced Science 9, (2022), 23, 2104599 10.1002/advs.202104599 https://doi.org/10.18452/25753 Verlag kostenfrei Volltext |
spellingShingle | Pinna, Nicola Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
title | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
title_auth | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
title_exact_search | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
title_exact_search_txtP | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
title_full | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors Chengxu Shen, Zhigang Yin, Fionn Collins, Nicola Pinna |
title_fullStr | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors Chengxu Shen, Zhigang Yin, Fionn Collins, Nicola Pinna |
title_full_unstemmed | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors Chengxu Shen, Zhigang Yin, Fionn Collins, Nicola Pinna |
title_short | Atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
title_sort | atomic layer deposition of metal oxides and chalcogenides for high performance transistors |
url | https://doi.org/10.18452/25753 |
work_keys_str_mv | AT pinnanicola atomiclayerdepositionofmetaloxidesandchalcogenidesforhighperformancetransistors |