Holdings: Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor

Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor:

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Bibliographic Details
Main Authors:	Bilgilisoy, Elif (Author), Yu, Jo-Chi (Author), Preischl, Christian (Author), McElwee-White, Lisa (Author), Steinrück, Hans-Peter (Author), Marbach, Hubertus (Author)
Format:	Electronic eBook
Language:	English
Published:	Erlangen ; Nürnberg Friedrich-Alexander-Universität Erlangen-Nürnberg 2022
Edition:	Postprint
Online Access:	Volltext Volltext Volltext
Item Description:	Aus: ACS Applied Nano Materials 5.3 (2022): 3855–3865. <https://pubs.acs.org/doi/10.1021/acsanm.1c04481>
Physical Description:	1 Online-Ressource PDF

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Record in the Search Index

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index_date	2024-07-03T20:23:27Z
indexdate	2024-07-10T09:37:10Z
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spelling	Bilgilisoy, Elif Verfasser aut Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor Elif Bilgilisoy, Jo-Chi Yu, Christian Preischl, Lisa McElwee-White, Hans-Peter Steinrück, Hubertus Marbach Postprint Erlangen ; Nürnberg Friedrich-Alexander-Universität Erlangen-Nürnberg 2022 1 Online-Ressource PDF txt rdacontent c rdamedia cr rdacarrier Aus: ACS Applied Nano Materials 5.3 (2022): 3855–3865. <https://pubs.acs.org/doi/10.1021/acsanm.1c04481> Archivierung/Langzeitarchivierung gewährleistet DE-101 pdager Yu, Jo-Chi Verfasser aut Preischl, Christian Verfasser aut McElwee-White, Lisa Verfasser aut Steinrück, Hans-Peter Verfasser aut Marbach, Hubertus Verfasser aut Sonderdruck aus ACS Applied Nano Materials Vol. 5 (2022), Seite 3855 - 3865 10.1021/acsanm.1c04481 https://nbn-resolving.org/urn:nbn:de:bvb:29-opus4-197739 Resolving-System kostenfrei Volltext https://d-nb.info/1262567947/34 Langzeitarchivierung Nationalbibliothek kostenfrei Volltext application/pdf https://open.fau.de/handle/openfau/19773 Verlag kostenfrei Volltext 1\p aepkn 0,98409 20220716 DE-101 https://d-nb.info/provenance/plan#aepkn 2\p emasg 0,07910 20220716 DE-101 https://d-nb.info/provenance/plan#emasg 3\p npi 20220715 DE-101 https://d-nb.info/provenance/plan#npi
spellingShingle	Bilgilisoy, Elif Yu, Jo-Chi Preischl, Christian McElwee-White, Lisa Steinrück, Hans-Peter Marbach, Hubertus Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor
title	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor
title_auth	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor
title_exact_search	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor
title_exact_search_txtP	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor
title_full	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor Elif Bilgilisoy, Jo-Chi Yu, Christian Preischl, Lisa McElwee-White, Hans-Peter Steinrück, Hubertus Marbach
title_fullStr	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor Elif Bilgilisoy, Jo-Chi Yu, Christian Preischl, Lisa McElwee-White, Hans-Peter Steinrück, Hubertus Marbach
title_full_unstemmed	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor Elif Bilgilisoy, Jo-Chi Yu, Christian Preischl, Lisa McElwee-White, Hans-Peter Steinrück, Hubertus Marbach
title_short	Simultaneous Focused Electron Beam Induced Deposition and Etching in UHV with Ru(CO)4I2 as Precursor
title_sort	simultaneous focused electron beam induced deposition and etching in uhv with ru co 4i2 as precursor
url	https://nbn-resolving.org/urn:nbn:de:bvb:29-opus4-197739 https://d-nb.info/1262567947/34 https://open.fau.de/handle/openfau/19773
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