Optical lithography: here is why
"This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, lear...
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Washington, USA
SPIE Press
[2021]
|
| Edition: | Second edition |
| Subjects: | |
| Online Access: | FHD01 UER01 Volltext |
| Summary: | "This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. This second edition has brand new material on proximity printing, as well as updated and expanded material on: exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies"-- |
| Physical Description: | 1 Online-Ressource (xvii, 560 Seiten) |
| ISBN: | 9781510639966 |
| DOI: | 10.1117/3.2586123 |
Staff View
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| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Semiconductors / Etching | |
| 650 | 4 | |a Lasers / Industrial applications | |
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| id | DE-604.BV047449212 |
| illustrated | Not Illustrated |
| index_date | 2024-07-03T18:03:08Z |
| indexdate | 2024-07-10T09:12:26Z |
| institution | BVB |
| isbn | 9781510639966 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-032851218 |
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| physical | 1 Online-Ressource (xvii, 560 Seiten) |
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| publishDate | 2021 |
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| publishDateSort | 2021 |
| publisher | SPIE Press |
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| spelling | Lin, Burn Jeng 1942- Verfasser (DE-588)143761455 aut Optical lithography here is why Burn J. Lin Second edition Bellingham, Washington, USA SPIE Press [2021] 1 Online-Ressource (xvii, 560 Seiten) txt rdacontent c rdamedia cr rdacarrier "This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. This second edition has brand new material on proximity printing, as well as updated and expanded material on: exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies"-- Microlithography Semiconductors / Etching Lasers / Industrial applications Erscheint auch als Druck-Ausgabe, hardcover 978-1-5106-3995-9 https://doi.org/10.1117/3.2586123 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Lin, Burn Jeng 1942- Optical lithography here is why Microlithography Semiconductors / Etching Lasers / Industrial applications |
| title | Optical lithography here is why |
| title_auth | Optical lithography here is why |
| title_exact_search | Optical lithography here is why |
| title_exact_search_txtP | Optical lithography here is why |
| title_full | Optical lithography here is why Burn J. Lin |
| title_fullStr | Optical lithography here is why Burn J. Lin |
| title_full_unstemmed | Optical lithography here is why Burn J. Lin |
| title_short | Optical lithography |
| title_sort | optical lithography here is why |
| title_sub | here is why |
| topic | Microlithography Semiconductors / Etching Lasers / Industrial applications |
| topic_facet | Microlithography Semiconductors / Etching Lasers / Industrial applications |
| url | https://doi.org/10.1117/3.2586123 |
| work_keys_str_mv | AT linburnjeng opticallithographyhereiswhy |