A lithographer's guide to patterning CMOS devices with directed self-assembly:
This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2020]
|
| Schriftenreihe: | SPIE spotlight series
vol. SL59 |
| Schlagworte: | |
| Online-Zugang: | FHD01 URL des Erstveröffentlichers |
| Zusammenfassung: | This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and used in these processes are discussed |
| Beschreibung: | 1 Online-Ressource (v, 26 Seiten) |
| ISBN: | 9781510637016 |
| DOI: | 10.1117/3.2567441 |
Internformat
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| 520 | |a This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and used in these processes are discussed | ||
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Datensatz im Suchindex
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| author | Guerrero, Douglas J. |
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| contents | Preface -- 1. Introduction -- 2. Directed self-assembly and block copolymers -- 3. Process flows: 3.1. Graphoepitaxial flows; 3.2. Chemical-epitaxial flows -- 4. Combining grapho- and chemoepitaxial flows -- 5. Combining DSA with EUV lithography -- 6. Material modification for pattern transfer -- 7. Applications for device fabrication -- 8. Defectivity -- 9. Metrology -- 10. Summary -- References |
| ctrlnum | (OCoLC)1164655157 (DE-599)BVBBV046767073 |
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| format | Electronic eBook |
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| illustrated | Not Illustrated |
| index_date | 2024-07-03T14:45:41Z |
| indexdate | 2024-07-10T08:53:14Z |
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| isbn | 9781510637016 |
| language | English |
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| series2 | SPIE spotlight series |
| spelling | Guerrero, Douglas J. Verfasser aut A lithographer's guide to patterning CMOS devices with directed self-assembly by Douglas J. Guerrero Bellingham, Washington, USA SPIE Press [2020] 1 Online-Ressource (v, 26 Seiten) txt rdacontent c rdamedia cr rdacarrier SPIE spotlight series vol. SL59 Preface -- 1. Introduction -- 2. Directed self-assembly and block copolymers -- 3. Process flows: 3.1. Graphoepitaxial flows; 3.2. Chemical-epitaxial flows -- 4. Combining grapho- and chemoepitaxial flows -- 5. Combining DSA with EUV lithography -- 6. Material modification for pattern transfer -- 7. Applications for device fabrication -- 8. Defectivity -- 9. Metrology -- 10. Summary -- References This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and used in these processes are discussed Microlithography Metal oxide semiconductors, Complementary Integrated circuits / Design and construction Self-assembly (Chemistry) https://doi.org/10.1117/3.2567441 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Guerrero, Douglas J. A lithographer's guide to patterning CMOS devices with directed self-assembly Preface -- 1. Introduction -- 2. Directed self-assembly and block copolymers -- 3. Process flows: 3.1. Graphoepitaxial flows; 3.2. Chemical-epitaxial flows -- 4. Combining grapho- and chemoepitaxial flows -- 5. Combining DSA with EUV lithography -- 6. Material modification for pattern transfer -- 7. Applications for device fabrication -- 8. Defectivity -- 9. Metrology -- 10. Summary -- References Microlithography Metal oxide semiconductors, Complementary Integrated circuits / Design and construction Self-assembly (Chemistry) |
| title | A lithographer's guide to patterning CMOS devices with directed self-assembly |
| title_auth | A lithographer's guide to patterning CMOS devices with directed self-assembly |
| title_exact_search | A lithographer's guide to patterning CMOS devices with directed self-assembly |
| title_exact_search_txtP | A lithographer's guide to patterning CMOS devices with directed self-assembly |
| title_full | A lithographer's guide to patterning CMOS devices with directed self-assembly by Douglas J. Guerrero |
| title_fullStr | A lithographer's guide to patterning CMOS devices with directed self-assembly by Douglas J. Guerrero |
| title_full_unstemmed | A lithographer's guide to patterning CMOS devices with directed self-assembly by Douglas J. Guerrero |
| title_short | A lithographer's guide to patterning CMOS devices with directed self-assembly |
| title_sort | a lithographer s guide to patterning cmos devices with directed self assembly |
| topic | Microlithography Metal oxide semiconductors, Complementary Integrated circuits / Design and construction Self-assembly (Chemistry) |
| topic_facet | Microlithography Metal oxide semiconductors, Complementary Integrated circuits / Design and construction Self-assembly (Chemistry) |
| url | https://doi.org/10.1117/3.2567441 |
| work_keys_str_mv | AT guerrerodouglasj alithographersguidetopatterningcmosdeviceswithdirectedselfassembly |