High density plasma sources: design, physics, and performance

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: Park Ridge, N.J. Noyes Publications © 1995
Schriftenreihe:Materials science and process technology series
Schlagworte:
Online-Zugang:FLA01
URL des Erstveröffentlichers
Zusammenfassung:This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing
Beschreibung:Includes bibliographical references and index
Beschreibung:1 online resource (xx, 445 pages) illustrations
ISBN:1591240638
9781591240631
9780815513773
0815513771
9780080946160
008094616X
9780815517887
0815517882