PVD for microelectronics: sputter deposition applied to semiconductor manufacturing
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the dev...
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| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
San Diego
Academic Press
© 1999
|
| Series: | Thin films (San Diego, Calif.)
v. 26 |
| Subjects: | |
| Online Access: | FLA01 Volltext Volltext |
| Summary: | GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts |
| Item Description: | Includes bibliographical references and indexes |
| Physical Description: | 1 online resource (xiii, 419 pages) illustrations |
| ISBN: | 9780125330268 012533026X 9780080542928 0080542921 |
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| language | English |
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| spelling | Powell, Ronald A. Verfasser aut PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel San Diego Academic Press © 1999 1 online resource (xiii, 419 pages) illustrations txt rdacontent c rdamedia cr rdacarrier Thin films (San Diego, Calif.) v. 26 Includes bibliographical references and indexes GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin film devices / Design and construction fast Thin films fast Vapor-plating fast Física geral larpcal Thin film devices Design and construction Vapor-plating Thin films PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf PVD-Verfahren (DE-588)4115673-0 s Mikroelektronik (DE-588)4039207-7 s 1\p DE-604 Rossnagel, Stephen M. Sonstige (DE-588)1158086601 oth http://www.sciencedirect.com/science/book/9780125330268 Verlag URL des Erstveröffentlichers Volltext http://www.sciencedirect.com/science/bookseries/10794050/26 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Powell, Ronald A. PVD for microelectronics sputter deposition applied to semiconductor manufacturing TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin film devices / Design and construction fast Thin films fast Vapor-plating fast Física geral larpcal Thin film devices Design and construction Vapor-plating Thin films PVD-Verfahren (DE-588)4115673-0 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| subject_GND | (DE-588)4115673-0 (DE-588)4039207-7 |
| title | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_auth | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_exact_search | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_full | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel |
| title_fullStr | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel |
| title_full_unstemmed | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell, Stephen M. Rossnagel |
| title_short | PVD for microelectronics |
| title_sort | pvd for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_sub | sputter deposition applied to semiconductor manufacturing |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Thin film devices / Design and construction fast Thin films fast Vapor-plating fast Física geral larpcal Thin film devices Design and construction Vapor-plating Thin films PVD-Verfahren (DE-588)4115673-0 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Thin film devices / Design and construction Thin films Vapor-plating Física geral Thin film devices Design and construction PVD-Verfahren Mikroelektronik |
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