Predictive Simulation of Semiconductor Processing: Status and Challenges
Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion,...
Gespeichert in:
| Weitere Verfasser: | , |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Berlin, Heidelberg
Springer Berlin Heidelberg
2004
|
| Schriftenreihe: | Springer Series in MATERIALS SCIENCE
72 |
| Schlagworte: | |
| Online-Zugang: | UBT01 URL des Erstveröffentlichers |
| Zusammenfassung: | Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool |
| Beschreibung: | 1 Online-Ressource (XVII, 490 p. 177 illus., 16 illus. in color) |
| ISBN: | 9783662094327 |
| DOI: | 10.1007/978-3-662-09432-7 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV045152160 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 180828s2004 |||| o||u| ||||||eng d | ||
| 020 | |a 9783662094327 |9 978-3-662-09432-7 | ||
| 024 | 7 | |a 10.1007/978-3-662-09432-7 |2 doi | |
| 035 | |a (ZDB-2-CMS)978-3-662-09432-7 | ||
| 035 | |a (OCoLC)1184484967 | ||
| 035 | |a (DE-599)BVBBV045152160 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-703 | ||
| 082 | 0 | |a 620.115 |2 23 | |
| 245 | 1 | 0 | |a Predictive Simulation of Semiconductor Processing |b Status and Challenges |c edited by Jarek Dabrowski, Eicke R. Weber |
| 264 | 1 | |a Berlin, Heidelberg |b Springer Berlin Heidelberg |c 2004 | |
| 300 | |a 1 Online-Ressource (XVII, 490 p. 177 illus., 16 illus. in color) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a Springer Series in MATERIALS SCIENCE |v 72 | |
| 520 | |a Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool | ||
| 650 | 4 | |a Materials Science | |
| 650 | 4 | |a Nanotechnology | |
| 650 | 4 | |a Characterization and Evaluation of Materials | |
| 650 | 4 | |a Mathematical Methods in Physics | |
| 650 | 4 | |a Engineering, general | |
| 650 | 4 | |a Operating Procedures, Materials Treatment | |
| 650 | 4 | |a Materials science | |
| 650 | 4 | |a Physics | |
| 650 | 4 | |a Engineering | |
| 650 | 4 | |a Industrial engineering | |
| 650 | 4 | |a Nanotechnology | |
| 650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Computersimulation |0 (DE-588)4148259-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Transistor |0 (DE-588)4060646-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Atomare Bewegung |0 (DE-588)4527345-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Prozesssimulation |0 (DE-588)4176077-3 |2 gnd |9 rswk-swf |
| 655 | 7 | |8 1\p |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
| 689 | 0 | 0 | |a Transistor |0 (DE-588)4060646-6 |D s |
| 689 | 0 | 1 | |a Atomare Bewegung |0 (DE-588)4527345-5 |D s |
| 689 | 0 | 2 | |a Computersimulation |0 (DE-588)4148259-1 |D s |
| 689 | 0 | |8 2\p |5 DE-604 | |
| 689 | 1 | 0 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |D s |
| 689 | 1 | 1 | |a Prozesssimulation |0 (DE-588)4176077-3 |D s |
| 689 | 1 | |8 3\p |5 DE-604 | |
| 700 | 1 | |a Dabrowski, Jarek |4 edt | |
| 700 | 1 | |a Weber, Eicke R. |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 9783642058042 |
| 856 | 4 | 0 | |u https://doi.org/10.1007/978-3-662-09432-7 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-2-CMS | ||
| 940 | 1 | |q ZDB-2-CMS_2000/2004 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030541828 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 883 | 1 | |8 3\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u https://doi.org/10.1007/978-3-662-09432-7 |l UBT01 |p ZDB-2-CMS |q ZDB-2-CMS_2000/2004 |x Verlag |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804178825079160832 |
|---|---|
| any_adam_object | |
| author2 | Dabrowski, Jarek Weber, Eicke R. |
| author2_role | edt edt |
| author2_variant | j d jd e r w er erw |
| author_facet | Dabrowski, Jarek Weber, Eicke R. |
| building | Verbundindex |
| bvnumber | BV045152160 |
| collection | ZDB-2-CMS |
| ctrlnum | (ZDB-2-CMS)978-3-662-09432-7 (OCoLC)1184484967 (DE-599)BVBBV045152160 |
| dewey-full | 620.115 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 620 - Engineering and allied operations |
| dewey-raw | 620.115 |
| dewey-search | 620.115 |
| dewey-sort | 3620.115 |
| dewey-tens | 620 - Engineering and allied operations |
| doi_str_mv | 10.1007/978-3-662-09432-7 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03439nmm a2200709zcb4500</leader><controlfield tag="001">BV045152160</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">180828s2004 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783662094327</subfield><subfield code="9">978-3-662-09432-7</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-3-662-09432-7</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-2-CMS)978-3-662-09432-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1184484967</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV045152160</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">620.115</subfield><subfield code="2">23</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Predictive Simulation of Semiconductor Processing</subfield><subfield code="b">Status and Challenges</subfield><subfield code="c">edited by Jarek Dabrowski, Eicke R. Weber</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Berlin, Heidelberg</subfield><subfield code="b">Springer Berlin Heidelberg</subfield><subfield code="c">2004</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (XVII, 490 p. 177 illus., 16 illus. in color)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Springer Series in MATERIALS SCIENCE</subfield><subfield code="v">72</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Materials Science</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanotechnology</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Characterization and Evaluation of Materials</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Mathematical Methods in Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering, general</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Operating Procedures, Materials Treatment</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Materials science</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Industrial engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Nanotechnology</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Computersimulation</subfield><subfield code="0">(DE-588)4148259-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Transistor</subfield><subfield code="0">(DE-588)4060646-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Atomare Bewegung</subfield><subfield code="0">(DE-588)4527345-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Prozesssimulation</subfield><subfield code="0">(DE-588)4176077-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="8">1\p</subfield><subfield code="0">(DE-588)4143413-4</subfield><subfield code="a">Aufsatzsammlung</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Transistor</subfield><subfield code="0">(DE-588)4060646-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Atomare Bewegung</subfield><subfield code="0">(DE-588)4527345-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Computersimulation</subfield><subfield code="0">(DE-588)4148259-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Prozesssimulation</subfield><subfield code="0">(DE-588)4176077-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="8">3\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Dabrowski, Jarek</subfield><subfield code="4">edt</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Weber, Eicke R.</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">9783642058042</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-3-662-09432-7</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-CMS</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-CMS_2000/2004</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030541828</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">3\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-662-09432-7</subfield><subfield code="l">UBT01</subfield><subfield code="p">ZDB-2-CMS</subfield><subfield code="q">ZDB-2-CMS_2000/2004</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| genre | 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV045152160 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:10:07Z |
| institution | BVB |
| isbn | 9783662094327 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030541828 |
| oclc_num | 1184484967 |
| open_access_boolean | |
| owner | DE-703 |
| owner_facet | DE-703 |
| physical | 1 Online-Ressource (XVII, 490 p. 177 illus., 16 illus. in color) |
| psigel | ZDB-2-CMS ZDB-2-CMS_2000/2004 ZDB-2-CMS ZDB-2-CMS_2000/2004 |
| publishDate | 2004 |
| publishDateSearch | 2004 |
| publishDateSort | 2004 |
| publisher | Springer Berlin Heidelberg |
| record_format | marc |
| series2 | Springer Series in MATERIALS SCIENCE |
| spelling | Predictive Simulation of Semiconductor Processing Status and Challenges edited by Jarek Dabrowski, Eicke R. Weber Berlin, Heidelberg Springer Berlin Heidelberg 2004 1 Online-Ressource (XVII, 490 p. 177 illus., 16 illus. in color) txt rdacontent c rdamedia cr rdacarrier Springer Series in MATERIALS SCIENCE 72 Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool Materials Science Nanotechnology Characterization and Evaluation of Materials Mathematical Methods in Physics Engineering, general Operating Procedures, Materials Treatment Materials science Physics Engineering Industrial engineering Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Computersimulation (DE-588)4148259-1 gnd rswk-swf Transistor (DE-588)4060646-6 gnd rswk-swf Atomare Bewegung (DE-588)4527345-5 gnd rswk-swf Prozesssimulation (DE-588)4176077-3 gnd rswk-swf 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content Transistor (DE-588)4060646-6 s Atomare Bewegung (DE-588)4527345-5 s Computersimulation (DE-588)4148259-1 s 2\p DE-604 Halbleitertechnologie (DE-588)4158814-9 s Prozesssimulation (DE-588)4176077-3 s 3\p DE-604 Dabrowski, Jarek edt Weber, Eicke R. edt Erscheint auch als Druck-Ausgabe 9783642058042 https://doi.org/10.1007/978-3-662-09432-7 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Predictive Simulation of Semiconductor Processing Status and Challenges Materials Science Nanotechnology Characterization and Evaluation of Materials Mathematical Methods in Physics Engineering, general Operating Procedures, Materials Treatment Materials science Physics Engineering Industrial engineering Halbleitertechnologie (DE-588)4158814-9 gnd Computersimulation (DE-588)4148259-1 gnd Transistor (DE-588)4060646-6 gnd Atomare Bewegung (DE-588)4527345-5 gnd Prozesssimulation (DE-588)4176077-3 gnd |
| subject_GND | (DE-588)4158814-9 (DE-588)4148259-1 (DE-588)4060646-6 (DE-588)4527345-5 (DE-588)4176077-3 (DE-588)4143413-4 |
| title | Predictive Simulation of Semiconductor Processing Status and Challenges |
| title_auth | Predictive Simulation of Semiconductor Processing Status and Challenges |
| title_exact_search | Predictive Simulation of Semiconductor Processing Status and Challenges |
| title_full | Predictive Simulation of Semiconductor Processing Status and Challenges edited by Jarek Dabrowski, Eicke R. Weber |
| title_fullStr | Predictive Simulation of Semiconductor Processing Status and Challenges edited by Jarek Dabrowski, Eicke R. Weber |
| title_full_unstemmed | Predictive Simulation of Semiconductor Processing Status and Challenges edited by Jarek Dabrowski, Eicke R. Weber |
| title_short | Predictive Simulation of Semiconductor Processing |
| title_sort | predictive simulation of semiconductor processing status and challenges |
| title_sub | Status and Challenges |
| topic | Materials Science Nanotechnology Characterization and Evaluation of Materials Mathematical Methods in Physics Engineering, general Operating Procedures, Materials Treatment Materials science Physics Engineering Industrial engineering Halbleitertechnologie (DE-588)4158814-9 gnd Computersimulation (DE-588)4148259-1 gnd Transistor (DE-588)4060646-6 gnd Atomare Bewegung (DE-588)4527345-5 gnd Prozesssimulation (DE-588)4176077-3 gnd |
| topic_facet | Materials Science Nanotechnology Characterization and Evaluation of Materials Mathematical Methods in Physics Engineering, general Operating Procedures, Materials Treatment Materials science Physics Engineering Industrial engineering Halbleitertechnologie Computersimulation Transistor Atomare Bewegung Prozesssimulation Aufsatzsammlung |
| url | https://doi.org/10.1007/978-3-662-09432-7 |
| work_keys_str_mv | AT dabrowskijarek predictivesimulationofsemiconductorprocessingstatusandchallenges AT webereicker predictivesimulationofsemiconductorprocessingstatusandchallenges |