Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon:
Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in sil...
Gespeichert in:
1. Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Vienna
Springer Vienna
2004
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Schriftenreihe: | Computational Microelectronics
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Schlagworte: | |
Online-Zugang: | FHI01 BTU01 URL des Erstveröffentlichers |
Zusammenfassung: | Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes |
Beschreibung: | 1 Online-Ressource (XXI, 554 p. 40 illus) |
ISBN: | 9783709105979 |
DOI: | 10.1007/978-3-7091-0597-9 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV045149473 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 180827s2004 |||| o||u| ||||||eng d | ||
020 | |a 9783709105979 |9 978-3-7091-0597-9 | ||
024 | 7 | |a 10.1007/978-3-7091-0597-9 |2 doi | |
035 | |a (ZDB-2-ENG)978-3-7091-0597-9 | ||
035 | |a (OCoLC)1184300085 | ||
035 | |a (DE-599)BVBBV045149473 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-573 |a DE-634 | ||
082 | 0 | |a 621.381 |2 23 | |
100 | 1 | |a Pichler, Peter |e Verfasser |4 aut | |
245 | 1 | 0 | |a Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon |c by Peter Pichler |
264 | 1 | |a Vienna |b Springer Vienna |c 2004 | |
300 | |a 1 Online-Ressource (XXI, 554 p. 40 illus) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a Computational Microelectronics | |
520 | |a Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes | ||
650 | 4 | |a Engineering | |
650 | 4 | |a Electronics and Microelectronics, Instrumentation | |
650 | 4 | |a Solid State Physics | |
650 | 4 | |a Spectroscopy and Microscopy | |
650 | 4 | |a Optical and Electronic Materials | |
650 | 4 | |a Engineering | |
650 | 4 | |a Solid state physics | |
650 | 4 | |a Spectroscopy | |
650 | 4 | |a Microscopy | |
650 | 4 | |a Electronics | |
650 | 4 | |a Microelectronics | |
650 | 4 | |a Optical materials | |
650 | 4 | |a Electronic materials | |
650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Störstelle |0 (DE-588)4193400-3 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Diffusion |0 (DE-588)4012277-3 |2 gnd |9 rswk-swf |
655 | 7 | |8 1\p |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
689 | 0 | 0 | |a Silicium |0 (DE-588)4077445-4 |D s |
689 | 0 | 1 | |a Störstelle |0 (DE-588)4193400-3 |D s |
689 | 0 | 2 | |a Diffusion |0 (DE-588)4012277-3 |D s |
689 | 0 | |8 2\p |5 DE-604 | |
776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 9783709172049 |
856 | 4 | 0 | |u https://doi.org/10.1007/978-3-7091-0597-9 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
912 | |a ZDB-2-ENG | ||
940 | 1 | |q ZDB-2-ENG_2000/2004 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-030539171 | ||
883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
883 | 1 | |8 2\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
966 | e | |u https://doi.org/10.1007/978-3-7091-0597-9 |l FHI01 |p ZDB-2-ENG |q ZDB-2-ENG_2000/2004 |x Verlag |3 Volltext | |
966 | e | |u https://doi.org/10.1007/978-3-7091-0597-9 |l BTU01 |p ZDB-2-ENG |q ZDB-2-ENG_Archiv |x Verlag |3 Volltext |
Datensatz im Suchindex
_version_ | 1804178821264441344 |
---|---|
any_adam_object | |
author | Pichler, Peter |
author_facet | Pichler, Peter |
author_role | aut |
author_sort | Pichler, Peter |
author_variant | p p pp |
building | Verbundindex |
bvnumber | BV045149473 |
collection | ZDB-2-ENG |
ctrlnum | (ZDB-2-ENG)978-3-7091-0597-9 (OCoLC)1184300085 (DE-599)BVBBV045149473 |
dewey-full | 621.381 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.381 |
dewey-search | 621.381 |
dewey-sort | 3621.381 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
doi_str_mv | 10.1007/978-3-7091-0597-9 |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>03496nmm a2200661zc 4500</leader><controlfield tag="001">BV045149473</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">180827s2004 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783709105979</subfield><subfield code="9">978-3-7091-0597-9</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/978-3-7091-0597-9</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-2-ENG)978-3-7091-0597-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1184300085</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV045149473</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-573</subfield><subfield code="a">DE-634</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381</subfield><subfield code="2">23</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Pichler, Peter</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon</subfield><subfield code="c">by Peter Pichler</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Vienna</subfield><subfield code="b">Springer Vienna</subfield><subfield code="c">2004</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (XXI, 554 p. 40 illus)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Computational Microelectronics</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronics and Microelectronics, Instrumentation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Solid State Physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Spectroscopy and Microscopy</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical and Electronic Materials</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Engineering</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Solid state physics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Spectroscopy</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microscopy</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microelectronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical materials</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronic materials</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Störstelle</subfield><subfield code="0">(DE-588)4193400-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Diffusion</subfield><subfield code="0">(DE-588)4012277-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="8">1\p</subfield><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Störstelle</subfield><subfield code="0">(DE-588)4193400-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Diffusion</subfield><subfield code="0">(DE-588)4012277-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">9783709172049</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1007/978-3-7091-0597-9</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-2-ENG</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">ZDB-2-ENG_2000/2004</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030539171</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-7091-0597-9</subfield><subfield code="l">FHI01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="q">ZDB-2-ENG_2000/2004</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1007/978-3-7091-0597-9</subfield><subfield code="l">BTU01</subfield><subfield code="p">ZDB-2-ENG</subfield><subfield code="q">ZDB-2-ENG_Archiv</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
genre | 1\p (DE-588)4113937-9 Hochschulschrift gnd-content |
genre_facet | Hochschulschrift |
id | DE-604.BV045149473 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T08:10:04Z |
institution | BVB |
isbn | 9783709105979 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030539171 |
oclc_num | 1184300085 |
open_access_boolean | |
owner | DE-573 DE-634 |
owner_facet | DE-573 DE-634 |
physical | 1 Online-Ressource (XXI, 554 p. 40 illus) |
psigel | ZDB-2-ENG ZDB-2-ENG_2000/2004 ZDB-2-ENG ZDB-2-ENG_2000/2004 ZDB-2-ENG ZDB-2-ENG_Archiv |
publishDate | 2004 |
publishDateSearch | 2004 |
publishDateSort | 2004 |
publisher | Springer Vienna |
record_format | marc |
series2 | Computational Microelectronics |
spelling | Pichler, Peter Verfasser aut Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon by Peter Pichler Vienna Springer Vienna 2004 1 Online-Ressource (XXI, 554 p. 40 illus) txt rdacontent c rdamedia cr rdacarrier Computational Microelectronics Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes Engineering Electronics and Microelectronics, Instrumentation Solid State Physics Spectroscopy and Microscopy Optical and Electronic Materials Solid state physics Spectroscopy Microscopy Electronics Microelectronics Optical materials Electronic materials Silicium (DE-588)4077445-4 gnd rswk-swf Störstelle (DE-588)4193400-3 gnd rswk-swf Diffusion (DE-588)4012277-3 gnd rswk-swf 1\p (DE-588)4113937-9 Hochschulschrift gnd-content Silicium (DE-588)4077445-4 s Störstelle (DE-588)4193400-3 s Diffusion (DE-588)4012277-3 s 2\p DE-604 Erscheint auch als Druck-Ausgabe 9783709172049 https://doi.org/10.1007/978-3-7091-0597-9 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
spellingShingle | Pichler, Peter Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon Engineering Electronics and Microelectronics, Instrumentation Solid State Physics Spectroscopy and Microscopy Optical and Electronic Materials Solid state physics Spectroscopy Microscopy Electronics Microelectronics Optical materials Electronic materials Silicium (DE-588)4077445-4 gnd Störstelle (DE-588)4193400-3 gnd Diffusion (DE-588)4012277-3 gnd |
subject_GND | (DE-588)4077445-4 (DE-588)4193400-3 (DE-588)4012277-3 (DE-588)4113937-9 |
title | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon |
title_auth | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon |
title_exact_search | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon |
title_full | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon by Peter Pichler |
title_fullStr | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon by Peter Pichler |
title_full_unstemmed | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon by Peter Pichler |
title_short | Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon |
title_sort | intrinsic point defects impurities and their diffusion in silicon |
topic | Engineering Electronics and Microelectronics, Instrumentation Solid State Physics Spectroscopy and Microscopy Optical and Electronic Materials Solid state physics Spectroscopy Microscopy Electronics Microelectronics Optical materials Electronic materials Silicium (DE-588)4077445-4 gnd Störstelle (DE-588)4193400-3 gnd Diffusion (DE-588)4012277-3 gnd |
topic_facet | Engineering Electronics and Microelectronics, Instrumentation Solid State Physics Spectroscopy and Microscopy Optical and Electronic Materials Solid state physics Spectroscopy Microscopy Electronics Microelectronics Optical materials Electronic materials Silicium Störstelle Diffusion Hochschulschrift |
url | https://doi.org/10.1007/978-3-7091-0597-9 |
work_keys_str_mv | AT pichlerpeter intrinsicpointdefectsimpuritiesandtheirdiffusioninsilicon |