EUV lithography:
"Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, mask...
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2018]
|
| Ausgabe: | Second edition |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Zusammenfassung: | "Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"... |
| Beschreibung: | xxxii, 726 pages illustrations |
| ISBN: | 9781510616783 1510616780 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV044907714 | ||
| 003 | DE-604 | ||
| 005 | 20180516 | ||
| 007 | t | ||
| 008 | 180417s2018 xxua||| |||| 00||| eng d | ||
| 010 | |a 017051759 | ||
| 020 | |a 9781510616783 |9 978-1-5106-1678-3 | ||
| 020 | |a 1510616780 |9 1-5106-1678-0 | ||
| 035 | |a (OCoLC)1028980782 | ||
| 035 | |a (DE-599)BVBBV044907714 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu |c US | ||
| 049 | |a DE-29T | ||
| 050 | 0 | |a QC459 | |
| 082 | 0 | |a 621.3815 |2 23 | |
| 245 | 1 | 0 | |a EUV lithography |c Vivek Bakshi, editor |
| 250 | |a Second edition | ||
| 264 | 1 | |a Bellingham, Washington, USA |b SPIE Press |c [2018] | |
| 264 | 4 | |c © 2018 | |
| 300 | |a xxxii, 726 pages |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 520 | |a "Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"... | ||
| 650 | 4 | |a Ultraviolet radiation |x Industrial applications | |
| 650 | 4 | |a Photolithography | |
| 650 | 4 | |a Optical coatings | |
| 650 | 0 | 7 | |a Fotolithografie |0 (DE-588)4274823-9 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Fotolithografie |0 (DE-588)4274823-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Bakshi, Vivek |4 edt | |
| 776 | 0 | 8 | |i Erscheint auch als |n Online-Ausgabe, PDF |z 9781510616790 |
| 776 | 0 | 8 | |i Erscheint auch als |n Online-Ausgabe, EPUB |z 9781510616806 |
| 856 | 4 | 2 | |m LoC Fremddatenuebernahme |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=030301325&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-030301325 | ||
Datensatz im Suchindex
| _version_ | 1804178467362701312 |
|---|---|
| adam_text | EUV LITHOGRAPHY
/
: 2018
TABLE OF CONTENTS / INHALTSVERZEICHNIS
EUV LITHOGRAPHY: A HISTORICAL PERSPECTIVE / HIROO KINOSHITA AND OBERT
WOOD
THE EUV LLC: AN HISTORICAL PERSPECTIVE / STEFAN WURM
EUV SOURCES FOR HIGH-VOLUME MANUFACTURING / IGOR V. FOMENKOV, BRUNO LA
FONTAINE, DAVID C. BRANDT, DAVID W. MYERS, ALEXANDER I. ERSHOV,
ALEXANDER A. SCHAFGANS, YEZHENG TAO, AND GEORGIY O. VASCHENKO
HIGH-POWER EUV SOURCE BY GIGAPHOTON FOR HIGH-VOLUME MANUFACTURING /
HAKARU MIZOGUCHI, TAKU YAMAZAKI, TATSUYA YANAGIDA, KRZYSZTOF M. NOWAK,
AND TAKASHI SAITOU
THE EQ-10 ELECTRODELESS Z-PINCH METROLOGY SOURCE / STEPHEN HORNE,
MATTHEW M. BESEN, PAUL A. BLACKBOROW, RON COLLINS, DEBORAH GUSTAFSON,
MATTHEW J. PARTLOW, AND DONALD K. SMITH
HIGH-RADIANCE LDP SOURCE FOR MASK INSPECTION / YUSUKE TERAMOTO
OPTICAL SYSTEMS FOR EUVL / SASCHA MIGURA, WINFRIED KAISER, JENS TIMO
NEUMANN, AND HARTMUT ENKISCH
OPTICS CONTAMINATION / CHARLES S. TARRIO, ROBERT F. BERG, SHANNON HILL,
AND SASIA BAJT
COLLECTOR CONTAMINATION: NORMAL-INCIDENCE (MULTILAYER) COLLECTORS /
DANIEL T. ELG, SHAILENDRA N. SRIVASTAVA, AND DAVID N. RUZIC
EUV MASK AND MASK METROLOGY / JINHO AHN AND CHAN-UK JEON
PHOTORESISTS FOR EUV LITHOGRAPHY / ROBERT L. BRAINARD, GREGG GALLATIN,
MARK NEISSER, AND AMRIT NARASIMHAN
FUNDAMENTALS OF EUVL SCANNERS / JAN B.P. VAN SCHOOT AND HANS JASPER
EUVL SYSTEM PATTERNING PERFORMANCE / PATRICK NAULLEAU AND GREGG GALLATIN
DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
|
| any_adam_object | 1 |
| author2 | Bakshi, Vivek |
| author2_role | edt |
| author2_variant | v b vb |
| author_facet | Bakshi, Vivek |
| building | Verbundindex |
| bvnumber | BV044907714 |
| callnumber-first | Q - Science |
| callnumber-label | QC459 |
| callnumber-raw | QC459 |
| callnumber-search | QC459 |
| callnumber-sort | QC 3459 |
| callnumber-subject | QC - Physics |
| ctrlnum | (OCoLC)1028980782 (DE-599)BVBBV044907714 |
| dewey-full | 621.3815 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815 |
| dewey-search | 621.3815 |
| dewey-sort | 3621.3815 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | Second edition |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02993nam a2200457 c 4500</leader><controlfield tag="001">BV044907714</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180516 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">180417s2018 xxua||| |||| 00||| eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a">017051759</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781510616783</subfield><subfield code="9">978-1-5106-1678-3</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1510616780</subfield><subfield code="9">1-5106-1678-0</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1028980782</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044907714</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">xxu</subfield><subfield code="c">US</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29T</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">QC459</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815</subfield><subfield code="2">23</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">EUV lithography</subfield><subfield code="c">Vivek Bakshi, editor</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">Second edition</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Washington, USA</subfield><subfield code="b">SPIE Press</subfield><subfield code="c">[2018]</subfield></datafield><datafield tag="264" ind1=" " ind2="4"><subfield code="c">© 2018</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">xxxii, 726 pages</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">"Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"...</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ultraviolet radiation</subfield><subfield code="x">Industrial applications</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photolithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical coatings</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="0">(DE-588)4274823-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="0">(DE-588)4274823-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bakshi, Vivek</subfield><subfield code="4">edt</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Online-Ausgabe, PDF</subfield><subfield code="z">9781510616790</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Online-Ausgabe, EPUB</subfield><subfield code="z">9781510616806</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">LoC Fremddatenuebernahme</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=030301325&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-030301325</subfield></datafield></record></collection> |
| id | DE-604.BV044907714 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T08:04:26Z |
| institution | BVB |
| isbn | 9781510616783 1510616780 |
| language | English |
| lccn | 017051759 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030301325 |
| oclc_num | 1028980782 |
| open_access_boolean | |
| owner | DE-29T |
| owner_facet | DE-29T |
| physical | xxxii, 726 pages illustrations |
| publishDate | 2018 |
| publishDateSearch | 2018 |
| publishDateSort | 2018 |
| publisher | SPIE Press |
| record_format | marc |
| spelling | EUV lithography Vivek Bakshi, editor Second edition Bellingham, Washington, USA SPIE Press [2018] © 2018 xxxii, 726 pages illustrations txt rdacontent n rdamedia nc rdacarrier "Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"... Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd rswk-swf Fotolithografie (DE-588)4274823-9 s DE-604 Bakshi, Vivek edt Erscheint auch als Online-Ausgabe, PDF 9781510616790 Erscheint auch als Online-Ausgabe, EPUB 9781510616806 LoC Fremddatenuebernahme application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=030301325&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | EUV lithography Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd |
| subject_GND | (DE-588)4274823-9 |
| title | EUV lithography |
| title_auth | EUV lithography |
| title_exact_search | EUV lithography |
| title_full | EUV lithography Vivek Bakshi, editor |
| title_fullStr | EUV lithography Vivek Bakshi, editor |
| title_full_unstemmed | EUV lithography Vivek Bakshi, editor |
| title_short | EUV lithography |
| title_sort | euv lithography |
| topic | Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd |
| topic_facet | Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=030301325&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT bakshivivek euvlithography |