Physical Design and Mask Synthesis for Directed Self-Assembly Lithography:
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Cham
Springer International Publishing
2018
|
| Series: | NanoScience and Technology
|
| Subjects: | |
| Online Access: | BTU01 TUM01 Volltext |
| Physical Description: | 1 Online-Ressource (XIV, 138 p. 92 illus., 54 illus. in color) |
| ISBN: | 9783319762944 |
| ISSN: | 1434-4904 |
| DOI: | 10.1007/978-3-319-76294-4 |
Staff View
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Record in the Search Index
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| author_facet | Shim, Seongbo |
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| dewey-full | 620.115 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
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| discipline | Chemie |
| doi_str_mv | 10.1007/978-3-319-76294-4 |
| format | Electronic eBook |
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| id | DE-604.BV044888384 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T08:03:53Z |
| institution | BVB |
| isbn | 9783319762944 |
| issn | 1434-4904 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030282441 |
| oclc_num | 1030597216 |
| open_access_boolean | |
| owner | DE-634 DE-91 DE-BY-TUM |
| owner_facet | DE-634 DE-91 DE-BY-TUM |
| physical | 1 Online-Ressource (XIV, 138 p. 92 illus., 54 illus. in color) |
| psigel | ZDB-2-CMS ZDB-2-CMS_2018 |
| publishDate | 2018 |
| publishDateSearch | 2018 |
| publishDateSort | 2018 |
| publisher | Springer International Publishing |
| record_format | marc |
| series2 | NanoScience and Technology |
| spelling | Shim, Seongbo Verfasser aut Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by Seongbo Shim, Youngsoo Shin Cham Springer International Publishing 2018 1 Online-Ressource (XIV, 138 p. 92 illus., 54 illus. in color) txt rdacontent c rdamedia cr rdacarrier NanoScience and Technology 1434-4904 Materials science Nanoscale science Nanoscience Nanostructures Semiconductors Nanotechnology Electronic circuits Optical materials Electronic materials Materials Science Nanotechnology and Microengineering Circuits and Systems Optical and Electronic Materials Nanoscale Science and Technology Shin, Youngsoo Sonstige oth Erscheint auch als Druck-Ausgabe 978-3-319-76293-7 https://doi.org/10.1007/978-3-319-76294-4 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Shim, Seongbo Physical Design and Mask Synthesis for Directed Self-Assembly Lithography Materials science Nanoscale science Nanoscience Nanostructures Semiconductors Nanotechnology Electronic circuits Optical materials Electronic materials Materials Science Nanotechnology and Microengineering Circuits and Systems Optical and Electronic Materials Nanoscale Science and Technology |
| title | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
| title_auth | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
| title_exact_search | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
| title_full | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by Seongbo Shim, Youngsoo Shin |
| title_fullStr | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by Seongbo Shim, Youngsoo Shin |
| title_full_unstemmed | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by Seongbo Shim, Youngsoo Shin |
| title_short | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
| title_sort | physical design and mask synthesis for directed self assembly lithography |
| topic | Materials science Nanoscale science Nanoscience Nanostructures Semiconductors Nanotechnology Electronic circuits Optical materials Electronic materials Materials Science Nanotechnology and Microengineering Circuits and Systems Optical and Electronic Materials Nanoscale Science and Technology |
| topic_facet | Materials science Nanoscale science Nanoscience Nanostructures Semiconductors Nanotechnology Electronic circuits Optical materials Electronic materials Materials Science Nanotechnology and Microengineering Circuits and Systems Optical and Electronic Materials Nanoscale Science and Technology |
| url | https://doi.org/10.1007/978-3-319-76294-4 |
| work_keys_str_mv | AT shimseongbo physicaldesignandmasksynthesisfordirectedselfassemblylithography AT shinyoungsoo physicaldesignandmasksynthesisfordirectedselfassemblylithography |