Directed self-assembly of block copolymers for nano-manufacturing:

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...

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Bibliographic Details
Other Authors: Gronheid, Roel (Editor), Nealey, Paul (Editor)
Format: Electronic eBook
Language:English
Published: Cambridge Woodhead Publishing [2015]
Series:Woodhead Publishing series in electronic and optical materials no. 83
Subjects:
Online Access:FAW01
FLA01
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Summary:The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new
Item Description:Includes bibliographical references and index
Physical Description:1 online resource
ISBN:9780081002612
0081002610
9780081002506

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