Molecular theory of lithography:
This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithograph...
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| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Washington
SPIE
2015
|
| Series: | SPIE Press monograph
PM255 SPIE Digital Library |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics |
| Physical Description: | 1 online resource (xix, 469 pages) |
| ISBN: | 9781628415520 |
| DOI: | 10.1117/3.2179925 |
Staff View
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044242014 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170324s2015 |||| o||u| ||||||eng d | ||
| 020 | |a 9781628415520 |9 978-1-6284-1552-0 | ||
| 024 | 7 | |a 10.1117/3.2179925 |2 doi | |
| 035 | |a (ZDB-50-SPI)9781628415520 | ||
| 035 | |a (OCoLC)979543008 | ||
| 035 | |a (DE-599)BVBBV044242014 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815/31 | |
| 100 | 1 | |a Okoroanyanwu, Uzodinma |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Molecular theory of lithography |c by Uzodinma Okoroanyanwu |
| 264 | 1 | |a Bellingham, Washington |b SPIE |c 2015 | |
| 300 | |a 1 online resource (xix, 469 pages) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE Press monograph |v PM255 | |
| 490 | 0 | |a SPIE Digital Library | |
| 520 | |a This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics | ||
| 650 | 4 | |a Microlithography / Industrial applications | |
| 650 | 4 | |a Molecular theory | |
| 650 | 4 | |a Molecular electronics | |
| 650 | 4 | |a Integrated circuits / Masks | |
| 653 | |a Electronic books | ||
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-1-6284-1551-3 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.2179925 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029647341 | ||
| 966 | e | |u https://doi.org/10.1117/3.2179925 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Record in the Search Index
| _version_ | 1804177403973468160 |
|---|---|
| any_adam_object | |
| author | Okoroanyanwu, Uzodinma |
| author_facet | Okoroanyanwu, Uzodinma |
| author_role | aut |
| author_sort | Okoroanyanwu, Uzodinma |
| author_variant | u o uo |
| building | Verbundindex |
| bvnumber | BV044242014 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9781628415520 (OCoLC)979543008 (DE-599)BVBBV044242014 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.2179925 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02321nmm a2200433zcb4500</leader><controlfield tag="001">BV044242014</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170324s2015 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781628415520</subfield><subfield code="9">978-1-6284-1552-0</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.2179925</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9781628415520</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)979543008</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044242014</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Okoroanyanwu, Uzodinma</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Molecular theory of lithography</subfield><subfield code="c">by Uzodinma Okoroanyanwu</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Washington</subfield><subfield code="b">SPIE</subfield><subfield code="c">2015</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xix, 469 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE Press monograph</subfield><subfield code="v">PM255</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE Digital Library</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography / Industrial applications</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Molecular theory</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Molecular electronics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits / Masks</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">Electronic books</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-1-6284-1551-3</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.2179925</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029647341</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.2179925</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044242014 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:47:32Z |
| institution | BVB |
| isbn | 9781628415520 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029647341 |
| oclc_num | 979543008 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xix, 469 pages) |
| psigel | ZDB-50-SPI |
| publishDate | 2015 |
| publishDateSearch | 2015 |
| publishDateSort | 2015 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE Press monograph SPIE Digital Library |
| spelling | Okoroanyanwu, Uzodinma Verfasser aut Molecular theory of lithography by Uzodinma Okoroanyanwu Bellingham, Washington SPIE 2015 1 online resource (xix, 469 pages) txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM255 SPIE Digital Library This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks Electronic books Erscheint auch als Druck-Ausgabe 978-1-6284-1551-3 https://doi.org/10.1117/3.2179925 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Okoroanyanwu, Uzodinma Molecular theory of lithography Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks |
| title | Molecular theory of lithography |
| title_auth | Molecular theory of lithography |
| title_exact_search | Molecular theory of lithography |
| title_full | Molecular theory of lithography by Uzodinma Okoroanyanwu |
| title_fullStr | Molecular theory of lithography by Uzodinma Okoroanyanwu |
| title_full_unstemmed | Molecular theory of lithography by Uzodinma Okoroanyanwu |
| title_short | Molecular theory of lithography |
| title_sort | molecular theory of lithography |
| topic | Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks |
| topic_facet | Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks |
| url | https://doi.org/10.1117/3.2179925 |
| work_keys_str_mv | AT okoroanyanwuuzodinma moleculartheoryoflithography |