Molecular theory of lithography:
This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithograph...
Gespeichert in:
1. Verfasser: | |
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Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Bellingham, Washington
SPIE
2015
|
Schriftenreihe: | SPIE Press monograph
PM255 SPIE Digital Library |
Schlagworte: | |
Online-Zugang: | FHD01 Volltext |
Zusammenfassung: | This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics |
Beschreibung: | 1 online resource (xix, 469 pages) |
ISBN: | 9781628415520 |
DOI: | 10.1117/3.2179925 |
Internformat
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Datensatz im Suchindex
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any_adam_object | |
author | Okoroanyanwu, Uzodinma |
author_facet | Okoroanyanwu, Uzodinma |
author_role | aut |
author_sort | Okoroanyanwu, Uzodinma |
author_variant | u o uo |
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bvnumber | BV044242014 |
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dewey-full | 621.3815/31 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/31 |
dewey-search | 621.3815/31 |
dewey-sort | 3621.3815 231 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
doi_str_mv | 10.1117/3.2179925 |
format | Electronic eBook |
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id | DE-604.BV044242014 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T07:47:32Z |
institution | BVB |
isbn | 9781628415520 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029647341 |
oclc_num | 979543008 |
open_access_boolean | |
owner | DE-1050 |
owner_facet | DE-1050 |
physical | 1 online resource (xix, 469 pages) |
psigel | ZDB-50-SPI |
publishDate | 2015 |
publishDateSearch | 2015 |
publishDateSort | 2015 |
publisher | SPIE |
record_format | marc |
series2 | SPIE Press monograph SPIE Digital Library |
spelling | Okoroanyanwu, Uzodinma Verfasser aut Molecular theory of lithography by Uzodinma Okoroanyanwu Bellingham, Washington SPIE 2015 1 online resource (xix, 469 pages) txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM255 SPIE Digital Library This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks Electronic books Erscheint auch als Druck-Ausgabe 978-1-6284-1551-3 https://doi.org/10.1117/3.2179925 Verlag URL des Erstveröffentlichers Volltext |
spellingShingle | Okoroanyanwu, Uzodinma Molecular theory of lithography Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks |
title | Molecular theory of lithography |
title_auth | Molecular theory of lithography |
title_exact_search | Molecular theory of lithography |
title_full | Molecular theory of lithography by Uzodinma Okoroanyanwu |
title_fullStr | Molecular theory of lithography by Uzodinma Okoroanyanwu |
title_full_unstemmed | Molecular theory of lithography by Uzodinma Okoroanyanwu |
title_short | Molecular theory of lithography |
title_sort | molecular theory of lithography |
topic | Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks |
topic_facet | Microlithography / Industrial applications Molecular theory Molecular electronics Integrated circuits / Masks |
url | https://doi.org/10.1117/3.2179925 |
work_keys_str_mv | AT okoroanyanwuuzodinma moleculartheoryoflithography |